C30B29/10

COMPOUND OF CESIUM FLUOROOXOBORATE, NONLINEAR OPTICAL CRYSTAL OF CESIUM FLUOROOXOBORATE, AND METHOD OF PREPARATION AND USE THEREOF

A compound of cesium fluorooxoborate, a nonlinear optical crystal of cesium fluorooxoborate, and a method of preparation and use thereof. The compound has a chemical formula of CsB.sub.4O.sub.6F and a molecular weight of 291.15. It has a crystal structure, which is prepared by a solid-state synthesis method or a vacuum encapsulation method. The crystal has a chemical formula of CsB.sub.4O.sub.6F and a molecular weight of 291.15. It belongs to an orthorhombic crystal system, with a space group of Pna2.sub.1, crystal cell parameters of a=7.9241 , b=11.3996 , c=6.6638 , and ===90, and a unit cell volume of 601.95 .sup.3. A melt method, high temperature solution method, vacuum encapsulation method, hydrothermal method or room temperature solution method is used to grow the crystal of CsB.sub.4O.sub.6F.

Passivation of nonlinear optical crystals

A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.

Passivation of nonlinear optical crystals

A laser system includes a nonlinear optical (NLO) crystal, wherein the NLO crystal is annealed within a selected temperature range. The NLO crystal is passivated with at least one of hydrogen, deuterium, a hydrogen-containing compound or a deuterium-containing compound to a selected passivation level. The system further includes at least one light source, wherein at least one light source is configured to generate light of a selected wavelength and at least one light source is configured to transmit light through the NLO crystal. The system further includes a crystal housing unit configured to house the NLO crystal.

Calcium sulfate crystals and methods for making the same

A composition of matter is provided, including anhydrite calcium sulfate whiskers having a mean aspect ratio of at least 30. Another composition of matter is provided, including alpha-derived anhydrite calcium sulfate whiskers. Yet another composition of matter is provided, including fine alpha particle-derived anhydrite calcium sulfate whiskers.

Calcium sulfate crystals and methods for making the same

A composition of matter is provided, including anhydrite calcium sulfate whiskers having a mean aspect ratio of at least 30. Another composition of matter is provided, including alpha-derived anhydrite calcium sulfate whiskers. Yet another composition of matter is provided, including fine alpha particle-derived anhydrite calcium sulfate whiskers.

Nonlinear optical material and methods of fabrication

Disclosed is a nonlinear optical (NLO) material for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula A.sub.qB.sub.yC.sub.z and a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula Ba.sub.3ZnB.sub.5PO.sub.14.

Nonlinear optical material and methods of fabrication

Disclosed is a nonlinear optical (NLO) material for use in deep-UV applications, and methods of fabrication thereof. The NLO is fabricated from a plurality of components according to the formula A.sub.qB.sub.yC.sub.z and a crystallographic non-centrosymmetric (NCS) structure. The NLO material may be fabricated as a polycrystalline or a single crystal material. In an embodiment, the material may be according to a formula Ba.sub.3ZnB.sub.5PO.sub.14.

Method for production and identification of Weyl semimetal

Disclosed is a method for producing and identifying a Weyl semimetal. Identification is enabled via a combination of the vacuum ultraviolet (low-photon energy) and soft X-ray (SX) angle resolved photoemission spectroscopy (ARPES). Production generally requires providing high purity raw materials, creating a mixture, heating the mixture in a container at a temperature sufficient for thermal decomposition of an impurity while preventing the possible reaction between the side walls of the container and the raw materials, depositing the resulting compound and a transfer agent onto the bottom surface of the ampule, differentially heating the ampule, and allowing a chemical vapor transport reaction to complete.

Method for production and identification of Weyl semimetal

Disclosed is a method for producing and identifying a Weyl semimetal. Identification is enabled via a combination of the vacuum ultraviolet (low-photon energy) and soft X-ray (SX) angle resolved photoemission spectroscopy (ARPES). Production generally requires providing high purity raw materials, creating a mixture, heating the mixture in a container at a temperature sufficient for thermal decomposition of an impurity while preventing the possible reaction between the side walls of the container and the raw materials, depositing the resulting compound and a transfer agent onto the bottom surface of the ampule, differentially heating the ampule, and allowing a chemical vapor transport reaction to complete.

Apparatus for depositing a thin film

An apparatus is provided for depositing a thin film. The apparatus includes a chamber, a susceptor disposed in the chamber and supporting a substrate, a reflection housing disposed outside the chamber, a light source unit disposed in the reflection housing and irradiating light to the susceptor, and a light controlling unit blocking at least a portion of an irradiation path of the light to control an irradiation area of the light on the susceptor. At least a portion of the light controlling unit is disposed in the reflection housing.