Patent classifications
C30B30/04
HIGH REFRACTIVE INDEX OPTICAL DEVICE FORMED BASED ON SOLID CRYSTAL AND FABRICATION METHOD THEREOF
A method is provided. The method includes providing an alignment structure at least partially defining a predetermined alignment pattern. The method also includes forming a solid crystal on the alignment structure. Crystal molecules of the solid crystal are aligned in the predetermined alignment pattern.
HIGH REFRACTIVE INDEX OPTICAL DEVICE FORMED BASED ON SOLID CRYSTAL AND FABRICATION METHOD THEREOF
A method is provided. The method includes providing an alignment structure at least partially defining a predetermined alignment pattern. The method also includes forming a solid crystal on the alignment structure. Crystal molecules of the solid crystal are aligned in the predetermined alignment pattern.
HIGH REFRACTIVE INDEX OPTICAL DEVICE FORMED BASED ON SOLID CRYSTAL AND FABRICATION METHOD THEREOF
An optical element is provided. The optical element includes a solid crystal including crystal molecules aligned in a predetermined alignment pattern at least partially defined by an alignment structure.
MAGNET COIL FOR MAGNETIC CZOCHRALSKI SINGLE CRYSTAL GROWTH AND MAGNETIC CZOCHRALSKI SINGLE CRYSTAL GROWTH METHOD
A magnet coil for magnetic Czochralski single crystal growth includes: a first coil a second coil, and an auxiliary coil arranged between the first coil and the second coil. A distance between the first coil and a first edge of the auxiliary coil close to the first coil is equal to a distance between the second coil and a second edge of the auxiliary coil close to the second coil. The auxiliary coil, the first coil and the second coil have a common. When being energized, a direction of a current in the first coil is opposite to a direction of a current in the second coil, and a magnetic field generated by a current in the auxiliary coil is used for enhancing the a cusp magnetic field between the first coil and the second coil.
MAGNET COIL FOR MAGNETIC CZOCHRALSKI SINGLE CRYSTAL GROWTH AND MAGNETIC CZOCHRALSKI SINGLE CRYSTAL GROWTH METHOD
A magnet coil for magnetic Czochralski single crystal growth includes: a first coil a second coil, and an auxiliary coil arranged between the first coil and the second coil. A distance between the first coil and a first edge of the auxiliary coil close to the first coil is equal to a distance between the second coil and a second edge of the auxiliary coil close to the second coil. The auxiliary coil, the first coil and the second coil have a common. When being energized, a direction of a current in the first coil is opposite to a direction of a current in the second coil, and a magnetic field generated by a current in the auxiliary coil is used for enhancing the a cusp magnetic field between the first coil and the second coil.
SILICON MONOCRYSTAL MANUFACTURING METHOD AND SILICON MONOCRYSTAL PULLING DEVICE
A method of manufacturing monocrystalline silicon by flowing inert gas in a chamber, applying horizontal magnetic field to a silicon melt in a quartz crucible, and pulling up monocrystalline silicon includes: forming a flow distribution of a flow of the inert gas flowing between a lower end of a heat shield and a surface of the silicon melt in the quartz crucible to be plane asymmetric with respect to a plane defined by a crystal pull-up axis of the pull-up device and an application direction of the horizontal magnetic field and rotationally asymmetric with respect to the crystal pull-up axis: maintaining the formed plane asymmetric and rotationally asymmetric flow distribution in a magnetic-field-free state until a silicon material in the quartz crucible is completely melted; and applying the horizontal magnetic field to the completely melted silicon material and starting pulling up the monocrystalline silicon.
SILICON MONOCRYSTAL MANUFACTURING METHOD AND SILICON MONOCRYSTAL PULLING DEVICE
A method of manufacturing monocrystalline silicon by flowing inert gas in a chamber, applying horizontal magnetic field to a silicon melt in a quartz crucible, and pulling up monocrystalline silicon includes: forming a flow distribution of a flow of the inert gas flowing between a lower end of a heat shield and a surface of the silicon melt in the quartz crucible to be plane asymmetric with respect to a plane defined by a crystal pull-up axis of the pull-up device and an application direction of the horizontal magnetic field and rotationally asymmetric with respect to the crystal pull-up axis: maintaining the formed plane asymmetric and rotationally asymmetric flow distribution in a magnetic-field-free state until a silicon material in the quartz crucible is completely melted; and applying the horizontal magnetic field to the completely melted silicon material and starting pulling up the monocrystalline silicon.
METHOD FOR CONTROLLING CONVECTION PATTERN OF SILICON MELT AND METHOD FOR PRODUCING MONOCRYSTALLINE SILICON
A method of controlling a convection pattern of a silicon melt includes: acquiring a temperature at a first measurement point not overlapping a rotation center of a quartz crucible on a surface of the silicon melt, the quartz crucible rotating in a magnetic-field-free state; determining that the temperature at the first measurement point periodically changes; and fixing a direction of a convection flow to a single direction in a plane orthogonal with an application direction of a horizontal magnetic field in the silicon melt by starting a drive of a magnetic-field applying portion to apply the horizontal magnetic field to the silicon melt when a temperature change at the first measurement point reaches a predetermined state, and subsequently raising the intensity to 0.2 tesla or more.
METHOD FOR CONTROLLING CONVECTION PATTERN OF SILICON MELT AND METHOD FOR PRODUCING MONOCRYSTALLINE SILICON
A method of controlling a convection pattern of a silicon melt includes: acquiring a temperature at a first measurement point not overlapping a rotation center of a quartz crucible on a surface of the silicon melt, the quartz crucible rotating in a magnetic-field-free state; determining that the temperature at the first measurement point periodically changes; and fixing a direction of a convection flow to a single direction in a plane orthogonal with an application direction of a horizontal magnetic field in the silicon melt by starting a drive of a magnetic-field applying portion to apply the horizontal magnetic field to the silicon melt when a temperature change at the first measurement point reaches a predetermined state, and subsequently raising the intensity to 0.2 tesla or more.
Permanent magnet and method of making permanent magnet
A method includes mixing first and second alloys to form a mixture, pressing the mixture within a first magnetic field to form a magnet having anisotropic particles of the first alloy aligned with a magnetic moment of the magnet, and heat treating the magnet within a second magnetic field to form elongated grains from the second alloy and align the elongated grains with the moment.