Disclosed herein are chlorodisazanes; silicon-heteroatom compounds synthesized therefrom; devices containing the silicon-heteroatom compounds; methods of making the chlorodisilazanes, the silicon-heteroatom compounds, and the devices; and uses of the chlorodisilazanes, silicon-heteroatom compounds, and devices.

A window module includes: a window; a first anti-reflection layer disposed on the window; and a second anti-reflection layer disposed on the first anti-reflection layer, including magnesium fluoride and having a refractive index smaller than a refractive index of the first anti-reflection layer.

A window module includes: a window; a first anti-reflection layer disposed on the window; and a second anti-reflection layer disposed on the first anti-reflection layer, including magnesium fluoride and having a refractive index smaller than a refractive index of the first anti-reflection layer.

A method of manufacturing silicon nano-powders and a manufacturing equipment implementing such method. The method according to the invention utilizes a plurality of aluminum powders to react with a silicon tetrahalide into a plurality of silicon nano-powders and an aluminum trihalide to obtain the silicon nano-powders.

A method of manufacturing silicon nano-powders and a manufacturing equipment implementing such method. The method according to the invention utilizes a plurality of aluminum powders to react with a silicon tetrahalide into a plurality of silicon nano-powders and an aluminum trihalide to obtain the silicon nano-powders.

Provided are a method for producing a ceramic sintered body having improved light emission intensity, a ceramic sintered body, and a light emitting device. The method for producing a ceramic sintered body comprises preparing a molded body that contains a nitride fluorescent material having a composition containing: at least one alkaline earth metal element M.sup.1 selected from the group consisting of Ba, Sr, Ca, and Mg; at least one metal element M.sup.2 selected from the group consisting of Eu, Ce, Tb, and Mn; Si; and N, wherein a total molar ratio of the alkaline earth metal element M.sup.1 and the metal element M.sup.2 in 1 mol of the composition is 2, a molar ratio of the metal element M.sup.2 is a product of 2 and a parameter y and wherein y is in a range of 0.001 or more and less than 0.5, a molar ratio of Si is 5, and a molar ratio of N is 8, and wherein the nitride fluorescent material has a crystallite size, as calculated by X-ray diffraction measurement using the Halder-Wagner method, of 550 Å or less, and calcining the molded body at a temperature in a range of 1,600° C. or more and 2,200° C. or less to obtain a sintered body.

Disclosed is a composition having nanoparticles or particles of a refractory metal, a refractory metal hydride, a refractory metal carbide, a refractory metal nitride, or a refractory metal boride, an organic compound consisting of carbon and hydrogen, and a nitrogenous compound consisting of carbon, nitrogen, and hydrogen. The composition, optionally containing the nitrogenous compound, is milled, cured to form a thermoset, compacted into a geometric shape, and heated in a nitrogen atmosphere at a temperature that forms a nanoparticle composition comprising nanoparticles of metal nitride and optionally metal carbide. The nanoparticles have a uniform distribution of the nitride or carbide.

A trisilylamine preparation apparatus includes: a reactor in which a trisilylamine synthesis reaction occurs; a reactant supply pipe for supplying reactants to the reactor; a trisilylamine discharge pipe for discharging trisilylamine from the reactor; a reactor heating means for heating the reaction space of the reactor; and a gaseous by-product discharge pipe for discharging a gaseous by-product from the reactor. The reaction space of the reactor is maintained at a temperature that is lower than the decomposition temperature of a reaction by-product generated during the synthesis reaction, the reactor heating means heats the reaction space of the reactor to a temperature that is higher than or equal to the decomposition temperature after trisilylamine is discharged through the trisilylamine discharge pipe, and the gaseous by-product discharge pipe discharges a gaseous by-product comprising a pyrolysate of the reaction by-product, generated through pyrolysis by means of the reactor heating means.

A trisilylamine preparation apparatus includes: a reactor in which a trisilylamine synthesis reaction occurs; a reactant supply pipe for supplying reactants to the reactor; a trisilylamine discharge pipe for discharging trisilylamine from the reactor; a reactor heating means for heating the reaction space of the reactor; and a gaseous by-product discharge pipe for discharging a gaseous by-product from the reactor. The reaction space of the reactor is maintained at a temperature that is lower than the decomposition temperature of a reaction by-product generated during the synthesis reaction, the reactor heating means heats the reaction space of the reactor to a temperature that is higher than or equal to the decomposition temperature after trisilylamine is discharged through the trisilylamine discharge pipe, and the gaseous by-product discharge pipe discharges a gaseous by-product comprising a pyrolysate of the reaction by-product, generated through pyrolysis by means of the reactor heating means.

A 1,1,1-tris(organoamino)disilane compound and a method of preparing the 1,1,1-tris(organoamino)disilane compound are disclosed. The method comprises aminating a 1,1,1-trihalodisilane with an aminating agent comprising an organoamine compound to give a reaction product comprising the 1,1,1-tris(organoamino)disilane compound, thereby preparing the 1,1,1-tris(organoamino)disilane compound. A film-forming composition is also disclosed. The film-forming composition comprises the 1,1,1-tris(organoamino)disilane compound. A film formed with the film-forming composition, and a method of forming the film, are also disclosed. The method of forming the film comprises subjecting the film-forming composition comprising the 1,1,1-tris(organoamino)disilane compound to a deposition condition in the presence of a substrate, thereby forming the film on the substrate.