Patent classifications
C01B21/087
Si-containing film forming precursors and methods of using the same
Mono-substituted TSA precursor Si-containing film forming compositions are disclosed. The precursors have the formula: (SiH.sub.3).sub.2N—SiH.sub.2—X, wherein X is selected from a halogen atom; an isocyanato group; an amino group; an N-containing C.sub.4-C.sub.10 saturated or unsaturated heterocycle; or an alkoxy group. Methods for forming the Si-containing film using the disclosed mono-substituted TSA precursor are also disclosed.
INORGANIC POLYSILAZANE RESIN
An inorganic polysilazane resin of the present invention has a Si/N ratio (i.e. a ratio of contained silicon atoms to contained nitrogen atoms) of 1.30 or more. The inorganic polysilazane resin having such a high Si content can be produced by, for example, a method in which an inorganic polysilazane compound containing both Si—NH and Si—Cl is heated to react NH with Cl, a method in which a silazane oligomer (polymer) that leaves no Si—Cl bond is synthesized and a dihalosilane is added to the synthesized silazane oligomer (polymer) to perform a thermal reaction, and the like. A siliceous film can be formed by, for example, applying a coating composition containing the inorganic polysilazane resin onto a base plate and then dried and the dried product is then oxidized by bringing the dried product into contact with water vapor or hydrogen peroxide vapor and water vapor under heated conditions.
INORGANIC POLYSILAZANE RESIN
An inorganic polysilazane resin of the present invention has a Si/N ratio (i.e. a ratio of contained silicon atoms to contained nitrogen atoms) of 1.30 or more. The inorganic polysilazane resin having such a high Si content can be produced by, for example, a method in which an inorganic polysilazane compound containing both Si—NH and Si—Cl is heated to react NH with Cl, a method in which a silazane oligomer (polymer) that leaves no Si—Cl bond is synthesized and a dihalosilane is added to the synthesized silazane oligomer (polymer) to perform a thermal reaction, and the like. A siliceous film can be formed by, for example, applying a coating composition containing the inorganic polysilazane resin onto a base plate and then dried and the dried product is then oxidized by bringing the dried product into contact with water vapor or hydrogen peroxide vapor and water vapor under heated conditions.
SYNTHESIS OF AMMONIUM DINITRAMIDE (ADN)
The invention concerns a method for making ammonium dinitramide from guanylurea dinitramide in one single process step. Guanylurea dinitramide is reacted with an ammonium sulfate in a reaction solution comprising water and acetone and an ion exchange gives ammonium dinitramide. By using acetone the yield is increased compared to known processes as formed guanylurea sulfate is poorly soluable in a water-acetone solution and precipitates, while guanylurea dinitramide has higher solubility in the solution than in only water. The guanylurea sulfate precipitate formed in the reaction solution that contains acetone is less sticky than if formed in water or in a water-alcohol solution and therefore easier to filter off. The use of acetone also allows lower process temperatures to be used than in previously known methods for producing guanylurea dinitramide. Conclusively, the method gives a higher yield, demands considerable smaller amounts of solvent and allows lower process temperatures to be used than in any formerly known process.
SYNTHESIS OF AMMONIUM DINITRAMIDE (ADN)
The invention concerns a method for making ammonium dinitramide from guanylurea dinitramide in one single process step. Guanylurea dinitramide is reacted with an ammonium sulfate in a reaction solution comprising water and acetone and an ion exchange gives ammonium dinitramide. By using acetone the yield is increased compared to known processes as formed guanylurea sulfate is poorly soluable in a water-acetone solution and precipitates, while guanylurea dinitramide has higher solubility in the solution than in only water. The guanylurea sulfate precipitate formed in the reaction solution that contains acetone is less sticky than if formed in water or in a water-alcohol solution and therefore easier to filter off. The use of acetone also allows lower process temperatures to be used than in previously known methods for producing guanylurea dinitramide. Conclusively, the method gives a higher yield, demands considerable smaller amounts of solvent and allows lower process temperatures to be used than in any formerly known process.
Process for co-producing commercially valuable products from byproducts of heavy oil and bitumen upgrading process
The present invention is directed to modifications of bitumen and heavy oil upgrading and refining processes to synthesize synthetic crude oil and other valuable synthesized hydrocarbon products in an efficient manner along with the production of commercially valuable co-products from by-products formed by the upgrading process.
Process for co-producing commercially valuable products from byproducts of heavy oil and bitumen upgrading process
The present invention is directed to modifications of bitumen and heavy oil upgrading and refining processes to synthesize synthetic crude oil and other valuable synthesized hydrocarbon products in an efficient manner along with the production of commercially valuable co-products from by-products formed by the upgrading process.
SI-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
Methods for producing halosilazane comprise halogenating a hydrosilazane with a halogenating agent to produce the halosilazane, the halosilazane having a formula
(SiH.sub.a(NR.sub.2).sub.bX.sub.c).sub.(n+2)N.sub.n(SiH.sub.(2−d)X.sub.d).sub.(n−1),
wherein each a, b, c is independently 0 to 3; a+b+c=3; d is 0 to 2 and n≥1; wherein X is selected from a halogen atom selected from F, Cl, Br or I; each R is selected from H, a C.sub.1-C.sub.6 linear or branched, saturated or unsaturated hydrocarbyl group, or a silyl group [SiR′.sub.3]; further wherein each R′ of the [SiR′.sub.3] is independently selected from H, a halogen atom selected from F, Cl, Br or I, a C.sub.1-C.sub.4 saturated or unsaturated hydrocarbyl group, a C.sub.1-C.sub.4 saturated or unsaturated alkoxy group, or an amino group [—NR.sup.1R.sup.2] with each R.sup.1 and R.sup.2 being further selected from H or a C.sub.1-C.sub.6 linear or branched, saturated or unsaturated hydrocarbyl group, provided that when c=0, d≠0; or d=0, c≠0.
SI-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME
Methods for producing halosilazane comprise halogenating a hydrosilazane with a halogenating agent to produce the halosilazane, the halosilazane having a formula
(SiH.sub.a(NR.sub.2).sub.bX.sub.c).sub.(n+2)N.sub.n(SiH.sub.(2−d)X.sub.d).sub.(n−1),
wherein each a, b, c is independently 0 to 3; a+b+c=3; d is 0 to 2 and n≥1; wherein X is selected from a halogen atom selected from F, Cl, Br or I; each R is selected from H, a C.sub.1-C.sub.6 linear or branched, saturated or unsaturated hydrocarbyl group, or a silyl group [SiR′.sub.3]; further wherein each R′ of the [SiR′.sub.3] is independently selected from H, a halogen atom selected from F, Cl, Br or I, a C.sub.1-C.sub.4 saturated or unsaturated hydrocarbyl group, a C.sub.1-C.sub.4 saturated or unsaturated alkoxy group, or an amino group [—NR.sup.1R.sup.2] with each R.sup.1 and R.sup.2 being further selected from H or a C.sub.1-C.sub.6 linear or branched, saturated or unsaturated hydrocarbyl group, provided that when c=0, d≠0; or d=0, c≠0.
N—H free and Si-rich per-hydridopolysilzane compositions, their synthesis, and applications
Solid or liquid N—H free, C-free, and Si-rich perhydropolysilazane compositions comprising units having the following formula [—N(SiH.sub.3).sub.x(SiH.sub.2—).sub.y], wherein x=0, 1, or 2 and y=0, 1, or 2 when x+y=2; and x=0, 1 or 2 and y=1, 2, or 3 when x+y=3 are disclosed. Also disclosed are synthesis methods and applications for the same.