C01B33/046

TRIPHENYLGERMYLSILANE AND TRICHLOROSILYL-TRICHLOROGERMANE FOR THE PRODUCTION OF GERMANIUM-SILICON LAYERS, AND METHOD FOR THE PRODUCTION THEREOF FROM TRICHLOROSILYL-TRIPHENYLGERMANE

Triphenylgermylsilane (Ph.sub.3GeSiH.sub.3) is useful for the production of germanium-silicon layers (GeSi) or as transfer agent of silane groups (SiH.sub.3). Further, a method describes the production of triphenylgermylsilane (Ph.sub.3GeSiH.sub.3) by reducing trichlorosilyltriphenylgermane (Ph.sub.3GeSiCl.sub.3) with a hydride in solution, and another method describes the production of trichlorosilyltrichlorogermane (C.sub.3GeSiCl.sub.3) by reacting trichlorosilyltriphenylgermane (Ph.sub.3GeSiCl.sub.3) with hydrogen chloride (HCl) in the presence of AlCl.sub.3 in solution. In addition, trichlorosilyltrichlorogermane is also used for the production of germanium-silicon layers (GeSi).

High efficiency synthesis and purification recycling system of higher silane

The high-efficiency synthesis and purification recycling system of higher silane has a liquid nitrogen cooling system. The liquid nitrogen cooling system has a liquid nitrogen storage tank for being configured to distribute 196 C. liquid nitrogen via a first cooling tube to the hydrogen column and the mono-silane column for a first cooling process; a second cooling tube is configured to distribute 160 C. nitrogen after the first cooling process into the first distillation column, the second distillation column, the third distillation column and the recycling drum for a second cooling process, a third cooling tube is configured to distribute 30 C. nitrogen after the second cooling process into the disilane drum for a third cooling process, and a fourth cooling tube is configured to distribute 25 C. nitrogen after the third cooling process into the silicon particle disposal system for a blowback regeneration process and to generate an anaerobic environment.

PROCESS FOR PRODUCING LIQUID POLYSILANES AND ISOMER ENRICHED HIGHER SILANES
20200115240 · 2020-04-16 ·

Synthesis of silanes with more than three silicon atoms are disclosed (i.e., (Si.sub.nH.sub.(2n+2) with n=4-100). More particularly, the disclosed synthesis methods tune and optimize the isomer ratio by selection of process parameters such as temperature, residence time, and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of silanes containing more than three silicon atoms and particularly, the silanes containing preferably one major isomer. The pure isomers and isomer enriched mixtures are prepared by catalytic transformation of silane (SiH.sub.4), disilane (Si.sub.2H.sub.6), trisilane (Si.sub.3H.sub.8), and mixtures thereof.

PROCESS FOR PRODUCING ISOMER ENRICHED HIGHER SILANES
20200115242 · 2020-04-16 ·

Methods of selectively synthesizing n-tetrasilane are disclosed. N-tetrasilane is prepared by pyrolysis of silane (SiH.sub.4), disilane (Si.sub.2H.sub.6), trisilane (Si.sub.3H.sub.8), or mixtures thereof. More particularly, the disclosed synthesis methods tune and optimize the n-tetrasilane:i-tetrasilane isomer ratio. The isomer ratio may be optimized by selection of process parameters, such as temperature, residence time, and the relative amount of starting compounds. The disclosed synthesis methods allow facile preparation of n-tetrasilane.

PROCESS FOR PRODUCING ISOMER ENRICHED HIGHER SILANES
20200115241 · 2020-04-16 ·

Methods of selectively synthesizing n-tetrasilane are disclosed. N-tetrasilane is prepared by pyrolysis of silane (SiH.sub.4), disilane (Si.sub.2H.sub.6), trisilane (Si.sub.3H.sub.8), or mixtures thereof. More particularly, the disclosed synthesis methods tune and optimize the n-tetrasilane:i-tetrasilane isomer ratio. The isomer ratio may be optimized by selection of process parameters, such as temperature, residence time, and the relative amount of starting compounds. The disclosed synthesis methods allow facile preparation of n-tetrasilane.

PROCESS FOR PRODUCING ISOMER ENRICHED HIGHER SILANES
20200115243 · 2020-04-16 ·

Methods of selectively synthesizing n-tetrasilane are disclosed. N-tetrasilane is prepared by catalysis of silane (SiH.sub.4), disilane (Si.sub.2H.sub.6), trisilane (Si.sub.3H.sub.8), or mixtures thereof. More particularly, the disclosed synthesis methods tune and optimize the n-tetrasilane:i-tetrasilane isomer ratio. The isomer ratio may be optimized by selection of process parameters, such as temperature and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of n-tetrasilane.

PROCESS FOR PRODUCING ISOMER ENRICHED HIGHER SILANES
20200115238 · 2020-04-16 ·

Methods of selectively synthesizing n-tetrasilane are disclosed. N-tetrasilane is prepared by catalysis of silane (SiH.sub.4), disilane (Si.sub.2H.sub.6), trisilane (Si.sub.3H.sub.8), or mixtures thereof. More particularly, the disclosed synthesis methods tune and optimize the n-tetrasilane:i-tetrasilane isomer ratio. The isomer ratio may be optimized by selection of process parameters, such as temperature and the relative amount of starting compounds, as well as selection of proper catalyst. The disclosed synthesis methods allow facile preparation of n-tetrasilane.

METHOD FOR PRODUCING OLIGOSILANE AND APPARATUS FOR PRODUCING OLIGOSILANE
20190276321 · 2019-09-12 · ·

Provided is an oligosilane production method with which a target oligosilane can be selectively produced. A reaction-produced mixture fluid which contains an oligosilane obtained by the dehydrogenative coupling of a hydrosilane is supplied to a membrane separator under specific conditions and/or brought into contact with an adsorbent under specific conditions.

Column and process for disproportionation of chlorosilanes into monosilane and tetrachlorosilane and plant for production of monosilane

A column includes a column head, a column sump and a tube-shaped column shell disposed therebetween, two or more reaction zones lying above each other which each accommodate a catalyst bed, in which catalyst beds chlorosilanes disproportionate into low-boiling silanes, which form an ascending stream of gas, and also into high-boiling silanes which form a downwardly directed stream of liquid, within the column shell and along the column axis, two or more rectificative separation zones, the reaction zones and the separation zones alternate along the column axis, the separation zones are configured such that the stream of gas and the stream of liquid meet in the separation zones, and the reaction zones are configured such that the downwardly directed stream of liquid is led through the catalyst beds, whereas the upwardly directed stream of gas passes the catalyst beds in spatial separation from the stream of liquid.

METHOD OF MAKING ALUMINUM-FREE NEOPENTASILANE
20180370807 · 2018-12-27 · ·

A method of making neopentasilane, the method comprising: contacting perchloroneopentasilane with a reductive effective amount of an alkali metal aluminum hydride in an alkylaluminum compound of formula R.sub.xAlCl.sub.3-x, where R is alkyl having from at least 5 carbon atoms, x is an integer from 1 to 3, and the alkylaluminum compound has a boiling point of at least 250 C., at conditions sufficient to reduce the perchloroneopentasilane, to form a reaction product mixture comprising neopentasilane, and separating the neopentasilane from the product mixture to form a neopentasilane isolate.