Aluminum chloride is separated from a silane mixture containing aluminum chloride by reacting the aluminum chloride with a compound reactive therewith which forms an ionic liquid or solid, and separating the ionic liquid or solid from the now-purified silane.

A system for purifying trichlorosilane that can prevent re-contamination by the dissociation of an adduct occurring in association with the conversion of high boiling point compounds or the remaining of impurities due to an equilibrium constraint is provided. Trichlorosilane containing impurities serving as a donor or an acceptor in silicon crystals is supplied to a multistage impurity conversion step. These impurities in the trichlorosilane are converted into high boiling point compounds in the presence of a distillation aid. A plurality of impurity conversion step sections (10.sup.1 to 10.sup.n) are connected in series, and any of the impurity conversion step sections comprises a reception section a for the trichlorosilane from the preceding stage section, an introduction section b for the distillation aid, a transmission section c for the trichlorosilane to the subsequent stage section, and a drain section d that discharges a remainder out of the impurity conversion step section.

A method for treatment of a hexachlorodisilane and its hydrolyzed product is disclosed. It comprises adding a hexachlorodisilane or its hydrolyzed product into a sulfuric acid solution for reaction.

A method for treatment of a hexachlorodisilane and its hydrolyzed product is disclosed. It comprises adding a hexachlorodisilane or its hydrolyzed product into a sulfuric acid solution for reaction.

Yield of products of increased purity from a fluidized bed reactor where silicon is produced or consumed is enhanced by purging with inert gas, purging with hydrogen gas, and purging with a chlorosilane-containing gas. The purging with hydrogen is conducted at an elevated temperature.

Provided is methodology for the preparation of highly-desired iodosilanes such as H.sub.2SiI.sub.2 and HSi.sub.3, via a reaction of alkylaminosilanes with certain substituted acid iodides. In one embodiment, bis(diethylamino)silane is reacted with benzoyl iodide to provide diiodosilane.

Provided is methodology for the preparation of highly-desired iodosilanes such as H.sub.2SiI.sub.2 and HSi.sub.3, via a reaction of alkylaminosilanes with certain substituted acid iodides. In one embodiment, bis(diethylamino)silane is reacted with benzoyl iodide to provide diiodosilane.

A production system, production method and application of general-purpose high-purity chemicals are disclosed. The production system includes a raw material tank, and an adsorption system, a crystallizer, a first light-impurity removal tower, a first heavy-impurity removal tower, a second light-impurity removal tower, a motorized tower, a second heavy-impurity removal tower, a vapor permeation device, a membrane separation system and a filling system connected with the raw material tank in sequence. The high-purity chemicals produced by the above system have high purity and excellent quality. Compared with the prior art, the system and method designed by the present disclosure have more pertinence, integrity, progressiveness, energy-saving, precision, high safety coefficient and great industrial promotion value. And the products produced are of excellent quality, which can meet the standards applied to the manufacturing of integrated circuit electronic components and meet the high-end needs of the semiconductor industry market.

The present disclosure discloses a method for graded utilization of fluorine and silicon resources in a phosphate ore. While the phosphate ore reacts with sulfuric acid, a fluorine-containing and silicon-containing tail gas is produced. SiO.sub.2 and H.sub.2SiF.sub.6 solution with a high concentration are obtained by concentrating and filtering a solution containing HF and H.sub.2SiF.sub.6 formed after tail gas is absorbed by water. Crude SiF.sub.4 and a solution containing HF and H.sub.2SO.sub.4 are obtained by extracting, adsorbing, and dehydrating the H.sub.2SiF.sub.6 solution. SiF.sub.4 with a 5N purity is obtained after the crude SiF.sub.4 is adsorbed and distilled, at the same time, an impurity-enriched SiF.sub.4 is returned to operations of concentration and filtration to react with the solution containing HF and H.sub.2SiF.sub.6 to generate the H.sub.2SiF.sub.6 and SiO.sub.2. High-purity HF and waste sulfuric acid are obtained after the H.sub.2SO.sub.4 solution containing HF is separated by steam stripping and distillation.

A method for treatment of a hexachlorodisilane and its hydrolyzed product is disclosed. It comprises adding a hexachlorodisilane or its hydrolyzed product into a sulfuric acid solution for reaction.