An ultrapure water (UPW) production facility includes a polisher filled with an ion exchange resin, an inflow line, an inflow valve connected to the inflow line and upstream of the polisher, an outflow line, an outflow valve connected to the outflow line and downstream of the polisher, a first drain line connected to the polisher, a first drain valve connected to the first drain line and downstream of the polisher, a second drain line branched from the outflow line, a second drain valve connected to the second drain line, a discharge line branched from the second drain line, a discharge valve connected to the discharge line, wherein the inflow valve, the outflow valve, the first drain valve, the second drain valve, and the outflow valve are automatic valves.

An ultrapure water manufacturing facility includes: a supply line connected to a pure water storage tank and in which a plurality of pure water treatment devices are sequentially arranged; a branch line branched downstream of the supply line and connected to the pure water storage tank; and a first automatic valve connected to the branch line and configured to be actuated by a double-acting actuator.

An ultrapure water manufacturing facility includes: a first tank; a plurality of reverse osmosis membranes sequentially arranged downstream of the first tank; an electrodeionization device arranged downstream of the plurality of reverse osmosis membranes; an ion exchange resin tower arranged downstream of the electrodeionization device and filled with a boron selective resin; and a chemical supplier arranged between the plurality of reverse osmosis membranes and configured to supply a pH regulator to treatment-target water.

The present invention relates to a hydrophilic separation membrane polymer composition containing a sulfonated graphene oxide and a sulfonated carbon nanotube, and a hydrophilic separation membrane fabricated therefrom. A hydrophilic separation membrane according to the present invention has the advantage of being very high in water permeability and excellent in anti-fouling properties.

The inventive device efficiently cools, with a simple construction, heat generated from an ultraviolet light-emitting diode (UV-LED). The UV-LED is accommodated in a housing that has an open end and an ultraviolet-transparent closing end. A portion of the housing adjacent to the closing end contacts to-be-treated liquid, ultraviolet rays generated from the UV-LED are irradiated to the to-be-treated liquid, and the housing is cooled by the to-be-treated liquid. In this way, the heat generated from the UV-LED can be cooled with a simple construction without use of arrangements for introducing dedicated cooling fluid for cooling the UV-LED. A heat discharge block for discharging to the outside the heat generated from the UV-LED may be provided at or adjacent to the open end of the housing. Further, the present invention may be constructed in such a manner that a portion of the discharge section directly contacts the to-be-treated liquid.

A diluted chemical liquid production apparatus has a structure that has a platinum group metal carrying resin column, a membrane-type deaeration apparatus and a gas dissolving membrane apparatus, which are sequentially provided in a supply line of ultrapure water; and has a pH adjuster injection device and an oxidation-reduction potential adjuster injection device, which are provided between the platinum group metal carrying resin column and the membrane-type deaeration apparatus. An inert gas source is connected to a gaseous phase side of the membrane-type deaeration apparatus, and an inert gas source is also connected to the gaseous phase side of the gas dissolving membrane apparatus; and a discharge line communicates with the gas dissolving membrane apparatus. A pH meter and an ORP meter are provided in the discharge line. Such a diluted chemical liquid production apparatus can control a pH and an oxidation-reduction potential.

A water dispenser which is connected to a pure water source and used for dispensing pure water includes: an arm mounting unit; a water dispensing gun including a nozzle for discharging pure water; a holding unit for holding the water dispensing gun; and at least two arms connecting the holding unit to the arm mounting unit. The at least two arms constitute a parallel link mechanism in which a trajectory of each arm when the at least two arms move is within the same vertical plane.

The present invention relates to systems and methods whereby contaminants or pollutants are removed from a fluid using a combination of electrochemical treatment and sorption. The systems and methods described herein may be used to remove pollutants from water or other fluids. The systems and methods described herein apply an electric current to a contaminated fluid such as water. The target contaminants are consequently ionized and are forced through a reactive sorbent media by use of an electrical gradient or polarization. The sorbent chemically binds the contaminants.

A cleaning water supply device includes an ultrapure water line through which ultrapure water flows by a fixed amount, a production unit that produces cleaning water by adding a solute to the ultrapure water line by a fixed amount, a cleaning water line for causing the cleaning water to flow, cleaning machines to which the cleaning water is supplied from the cleaning water line, a solute removal unit into which excess cleaning water is introduced from the cleaning water line, and a collecting line for returning collected water from which the solute is removed to a tank and the like.

A hydrogen peroxide removing apparatus for removing hydrogen peroxide contained in water to be processed includes: anode and cathode; and hydrogen peroxide removal chamber provided between anode and cathode and at least partially filled with a metal catalyst with hydrogen peroxide decomposition ability, wherein a DC voltage is applied between anode and cathode.