Described is a system and corresponding method for remediating liquid waste streams. The system includes an electro-oxidation (EO) chamber, an electro-deposition (ED) chamber, and an electro-adsorption (EA) chamber. In the method, a waste stream is subjected to electro-oxidation, followed by electro-deposition and/or electro-adsorption. The method removes both organic and inorganic pollutants, as well as metals present as free ions or bound into organic or inorganic complexes.

An ultrapure water production system to produce an ultrapure water, includes a pre-treatment unit 2; a primary pure water production unit 3; a secondary pure water production unit 4; a storage unit 5 provided to precede the pre-treatment unit 2 or between the pre-treatment unit 2 and the primary pure water production unit 3, the storage unit 5 being capable of storing raw water or treatable water; a recovery treatment unit 6 to remove impurities mixed in a used ultrapure water obtained after use of the ultrapure water and containing hydrogen peroxide with passing a part or the whole of the hydrogen peroxide therethrough, to make a recovered water; and a circulator 7 to circulate the recovered water obtained from the recovery treatment unit 6 to feed the recovered water back to the storage unit 5.

An ultrapure water supply apparatus includes a first filtering device, a second filtering device, a first tank between the first and second filtering devices, a third filtering device, a second tank between the second and third filtering devices, a fourth filtering device, a third tank between the third and fourth filtering devices, and a gas supply device connected to each of the first to third tanks and configured to supply an inert gas. Each of the first to third tanks includes a tank body and a breather valve coupled to the tank body and connected to a storage space in the tank body. Each of the first to fourth filtering devices includes at least one selected from an activated carbon filter device, an ion exchange resin device, a reverse osmosis membrane device, and a hollow fiber membrane device.

Ultrapure water supply apparatuses, substrate processing systems, and substrate processing methods are provided. An ultrapure water supply apparatus includes: a first supply device that produces first ultrapure water; a second supply device that produces second ultrapure water; a first reserved supply device that provides the second supply device with a portion of fluid in the first supply device; and a second reserved supply device that provides the first supply device with a portion of fluid in the second supply device. The first supply device includes a first front-side filtering part, a first rear-side filtering part, and a first connection part. The second supply device includes a second front-side filtering part, a second rear-side filtering part, and a second connection part. Each of the first and second reserved supply devices connects the first connection part and the second connection part to each other.

Systems and methods for producing ultrapure water (UPW) for use in semiconductor fabrication include an ABA module that performs an advanced oxidation process (AOP) pre-treatment step, a bioremediation step, and an advanced oxidation process post-treatment step. Raw water flows through the ABA module, which is part of a water treatment system for producing ultrapure water. The ultrapure water is then used in a semiconductor fabrication process.

A semiconductor process wastewater treatment system and a semiconductor process wastewater treatment method using the same are disclosed. The disclosed semiconductor process wastewater treatment system may comprises: a processing unit configured to receive semiconductor process wastewater and treats the semiconductor process wastewater through a plurality of operations; and a membrane filtration tank arranged separately from the processing unit, the membrane filtration tank having a ceramic nano-membrane for filtering the semiconductor process wastewater which has passed through the processing unit, wherein the ceramic nano-membrane may include a carbon-based nano-material. The ceramic nano-membrane may include a graphene-based nano-material as the carbon-based nano-material.

A pure water production system includes a filter unit, a clear water storage tank, an ultraviolet light irradiation unit, and an ion exchange resin unit. The filter unit filters water. The clear water storage tank stores water filtered by the filtration unit. The ultraviolet light irradiation unit irradiates ultraviolet light to water delivered from the clear water storage tank. The ion exchange resin unit produces pure water from water delivered from the ultraviolet light irradiation unit. The ultraviolet light irradiation unit includes an ultraviolet fluorescent lamp, and an outer tube configured to allow the water to flow through surroundings of the ultraviolet fluorescent lamp. The outer tube includes an inflow port through which the water flows in, and an outflow port through which the water irradiated with ultraviolet light from the ultraviolet fluorescent lamp flows out.

The invention relates to a method for the precipitation of arsenic and heavy metals from acidic, in particular sulphuric acid, process water (12), containing both arsenic and heavy metals, comprising a precipitation method phase (II) with a precipitation stage (D) in which arsenic and at least one primary heavy metal are precipitated together, wherein a sulphide precipitating agent (20) is added to the process water (12) such that arsenic is precipitated as arsenic sulphide and the at least one primary heavy metal is precipitated as metal sulphide. The precipitation method phase (II) comprises a conditioning stage (C) which is carried out before the precipitation stage (D) and in which a conditioning agent (16) is added to the acidic process water (12), which has an effect on the character, in particular the filtering properties, at least of the precipitated arsenic sulphide.

A method for producing an ion exchange resin. The method comprises steps of: (a) providing a basic ion exchange resin in the acidic form which comprises amino polyol groups and has a volume % swell from 15 to 30% upon conversion from the basic form to the acidic form, and (b) washing the resin with water or aqueous acid.

A system for treating printed circuit board wastewater (PCB) includes a production system, a pretreatment system, a biochemical system, a recovery system and a concentrated water treatment system. The production system is configured for producing process water and auxiliary water from tap water. The pretreatment system is configured to pretreat different wastewater samples separately. The biochemical system is configured to decompose the pretreated wastewater. The recovery system is configured to treat wastewater from the pretreatment system and the biochemical system to obtain process water and feed concentrated water to the concentrated water treatment system. The concentrated water treatment system is configured to treat the concentrated water to meet a discharge standard. A treatment method for the PCB wastewater is also provided.