A system and method for sintering a thin, high purity fused silica glass sheet having a thickness of 500 μm or less, includes a step of rastering a beam of a laser across a sheet of high purity fused silica soot; wherein a pattern of the rastering includes tightly spacing target locations on the sheet such that the laser sinters the soot and simultaneously forms tiny notches on a first major surface of the sheet when viewed in cross-section, wherein the tiny notches are crenellated such that at least some of the notches have generally flat bottom surfaces and at least some respective adjoining caps have generally plateau top surfaces offset from the bottom surfaces by steeply-angled sidewalls.

A method for forming an optical quality glass is provided. The method includes contacting silica soot particles with a basic additive, forming a silica soot compact, and removing the basic additive from the silica soot compact. A method of forming a cladding portion of an optical fiber preform is also provided.

Provided is a silica glass member for hermetic sealing of an ultraviolet SMD LED element to be suitably used for hermetic sealing of, and as a transmission window material for, a surface mount-type package (SMD) having an ultraviolet LED mounted thereon and configured to emit ultraviolet light in a wavelength range of from 200 nm to 350 nm. The silica glass member for hermetic sealing includes a silica glass substrate, which is homogeneously and integrally formed without an internal boundary, wherein the silica glass substrate has: a first surface on an inside opposed to an SMD LED element; and a second surface on an outside corresponding to the first surface, wherein an outer peripheral portion of the first surface has formed therein a substrate joining plain surface for joining to the container outer periphery joining plain surface, and wherein the second surface on the outside corresponding to the first surface has formed therein a lens-like convex portion configured to process emitted light from the ultraviolet SMD LED element.

The present invention relates to a composition and a process for the production of a molding made of high-purity transparent quartz glass, by means of additive manufacturing.

The present disclosure provides a method for fabrication of a glass preform. The method includes production of soot particles in a combustion chamber using a precursor material. The heating of the precursor material produces the soot particles along with one or more impurities. In addition, the method includes agglomeration of the soot particles. Further, the method includes separation of the soot particles from the one or more impurities. Also, the separation of the soot particles is performed in a cyclone separator. Furthermore, the method includes collection of the soot particles. Also, the soot particles are compacted with facilitation of a preform compaction chamber. Also, the compacted preform is sintered with facilitation of a sintering furnace. The compaction of the soot particles followed by sintering results in formation of the glass preform.

The present invention relates to a black quartz glass comprising Si of 0.5 to 10 mass %, SiO of 0.1 to 5 mass % and SiO.sub.2 of the residue, wherein the SCE reflectance at a wavelength of 350 nm to 750 nm is 10% or less; a method for producing the black quartz glass, comprising: pressure-molding a powder obtained by mixing and consolidating (1) fumed silica, or (2) a mixture powder of fumed silica and a synthetic silica powder, or (3) a mixture powder of fumed silica, spherical silica and a synthetic silica powder, with a Si powder of 0.5 to 10 mass % and a SiO powder of 0.1 to 5 mass %, and heating and sintering the pressure-molded product in the atmosphere; and a product comprising a black quartz glass member made of the black quartz glass. The present invention allows to provide a black quartz glass which has an excellent light-shielding property, has no risk of causing contamination in a step of using it, has sufficient color uniformity when the size is enlarged, and is capable of producing a large ingot, and to provide a method for producing the black quartz glass with excellent productivity even in the large ingot, and to provide a black quartz glass product made of the black quartz glass.

A synthetic quartz glass lid for use in optical device packages is prepared by furnishing a synthetic quartz glass lid precursor comprising a synthetic quartz glass substrate (1) and a metal or metal compound film (2), and forming a metal base adhesive layer (3) on the metal or metal compound film (2). The metal or metal compound film contains Ag, Bi, and at least one element selected from P, Sb, Sn and In.

A method for producing a component with portions of a rare earth metal-doped quartz glass, an intermediate product containing voids and consisting of a SiO.sub.2 raw material doped with rare earth metal is introduced into a sinter mold the interior of which is bordered by a carbonaceous mold wall, and is melted therein into the component by gas pressure sintering at a maximum temperature above 1500 C. A shield is arranged between the mold wall and the intermediate product. In order to indicate a modified gas pressure sintering method that ensures the production of rare earth metal-doped quartz glass with reproducible properties, a bulk material of amorphous SiO.sub.2 particles with a layer thickness of at least 2 mm is used as the shield, the softening temperature thereof being at least 20 C. higher than the softening temperature of the doped SiO.sub.2 raw material, and the bulk material being gas-permeable at the beginning of the melting of the intermediate product, and the bulk material sintering during melting into an outer layer that is gas-tight to a pressure gas.

Provided is a method for producing a synthetic opaque quartz glass where flame processing can be performed in high purity with a simple way and even a large sized one can be produced, and the synthetic opaque quartz glass. A method for producing a synthetic opaque quartz glass which comprises the step of heating and burning a quartz glass porous body under a pressure of from 0.15 MPa to 1000 MPa at a temperature of from 1200 C. The quartz glass porous body is prepared by depositing quartz glass particles which are produced by hydrolyzing a silicon compound with an oxyhydrogen flame.

In one method for producing opaque quartz glass, a green body is produced from a slip containing fine, amorphous SiO.sub.2 particles and coarse SiO.sub.2 reinforcement bodies and the green body is sintered by way of a sintering treatment into a blank made from the opaque quartz glass. The reinforcement bodies with a specific density D.sub.K1 are here embedded in a SiO.sub.2 matrix with a specific glass density D.sub.M. Starting from this, in order to provide a blank of opaque quartz glass that is less susceptible to cracking and illustrates homogeneous transmission even in the case of small wall thicknesses, in one aspect sinterable reinforcement bodies are used, the specific density D.sub.K0 of which prior to the sintering treatment is lower than the specific glass density D.sub.M, and which due to the sintering treatment reach the specific density D.sub.K1 which differs from the specific glass density D.sub.M by less than 10%.