One aspect relates to a process for the preparation of a quartz glass body. The process includes providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, making a glass melt out of silicon dioxide granulate, and making a quartz glass body out of at least part of the glass melt. The size of the quartz glass body is reduced to obtain a quartz glass grain. The quartz glass body is processed to make a preform and an opaque quartz glass body is made from the preform. One aspect further relates to an opaque quartz glass body which is obtainable by this process. One aspect further relates to a reactor and an arrangement, which are each obtainable by further processing of the opaque quartz glass body.

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing silicon dioxide particles, ii.) Making a glass melt out of the silicon dioxide particles in an oven and iii.) Making a quartz glass body out of at least part of the glass melt, wherein the oven has a gas outlet through which gas is removed from the oven, wherein the dew point of the gas on exiting the oven through the gas outlet is less than 0 C. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

A process of forming a titania-silica glass body, the process including exposing a titania-doped silica soot body to a first thermal treatment by heating the body to a first temperature T1 between about 800? C. and about 1100? C. for a first time duration t1 calculated using the equation:

[00001]$t1>\frac{L_c^2}{4?},$

wherein L.sub.c is the characteristic length (cm) of the body and ? is the thermal diffusivity (cm.sup.2/sec) of the body. The process further including exposing the body to a second thermal treatment by heating the body to a second temperature T2 between about 1050? C. and about 1250? C. wherein, after the second thermal treatment, a peak-to-valley difference of hydroxyl concentration amongst a plurality of segments of the body is about 70 ppm or less.

A manufacturing method for high-quality quartz crucible uses a vacuum arc method to melt, the positioning of the graphite electrode and dwell time at each position meet following requirements in which: taking a position of an upper end surface of a mold opening as a zero point, an end of the graphite electrode is marked as + when above the zero point, marked as ? when below the zero point; a starting position of the graphite electrode is +0.10?0.30 times an outer diameter of the crucible, dwell time ?2 minutes, then the position is descended sequentially in accordance with a stepwise positioning method, staying for a period of time every time descending to a position, the graphite electrode continuously releases a high-temperature arc to melt crucible blank during a corresponding period of time at a corresponding position, and reaches a bottom polishing position after moving at least 3 times.

A crucible assembly for growing a crystal ingot using a Czochralski process includes an outer crucible and an inner crucible. The inner crucible is disposed within the outer crucible and has a channel configured for fluid communication between the outer crucible and the inner crucible. The inner crucible is an arc-fused crucible and the outer crucible is a cast crucible.

One aspect relates to a process for preparing a quartz glass body, including providing a silicon dioxide granulate, making a glass melt from the silicon dioxide granulate in a melting crucible, making a quartz glass body from at least a part of the glass melt, and treating the quartz glass body with at least one procedure selected from the group consisting of chemical, thermal or mechanical treatment to obtain a treated quartz glass body. One aspect also relates to a quartz glass body which is obtainable by this process. One aspect also concerns a light guide, an illuminant and a formed body each obtainable by processing the quartz glass body further.

One aspect relates to a light guide comprising a jacket and one or more cores, wherein the jacket surrounds the cores. Each core has a refractive index profile perpendicular to the maximum extension of the core, wherein at least one refractive index n.sub.K of each refractive index profile is greater than the refractive index n.sub.M1 of the jacket. The jacket is made of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminium content of less than 200 ppb. One aspect also relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminium content of less than 200 ppb, in each case based on the total weight of the silicon dioxide granulate I.

The invention relates to a process for the preparation of a quartz glass body comprising the process steps i.) Providing a silicon dioxide granulate, ii.) Making a glass melt out of the silicon dioxide granulate and iii) Making a quartz glass body out of at least part of the glass melt, wherein the provision comprises the steps I. Providing a silicon dioxide powder with at least two particles made from a silicon-chlorine compound, II. Bringing the silicon dioxide powder into contact with steam to obtain a treated silicon dioxide powder and III. Granulating the treated silicon dioxide powder to obtain a silicon dioxide granulate, and wherein the chorine content of the silicon dioxide powder is greater than the chlorine content of the silicon dioxide granulate. The invention further relates to a quartz glass body which is obtainable by this process. The invention further relates to a process for providing a silicon dioxide granulate. The invention further relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.

One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate composed of a pyrogenic silicon dioxide powder, making a glass melt out of the silicon dioxide granulate and making a quartz glass body out of at least part of the glass melt. The quartz glass body has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm and an aluminium content of less than 200 ppb. One aspect also relates to a quartz glass body which is obtainable by this process. Furthermore, one aspect relates to a formed body and a structure, each of which is obtainable by further processing of the quartz glass body.

A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO.sub.2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm.sup.3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 m.