Patent classifications
C03B19/095
QUARTZ GLASS CRUCIBLE FOR PULLING SINGLE CRYSTAL SILICON AND METHOD FOR PRODUCING THE SAME
The present invention is a method for producing a quartz glass crucible for pulling a single crystal silicon from a silicon melt held therein, including the steps of: producing a quartz glass crucible having an outer layer including an opaque quartz glass containing bubbles therein and an inner layer including a transparent quartz glass containing substantially no bubbles; roughening a region of an inner surface of the produced quartz glass crucible, the region being in contact with the silicon melt when holding the silicon melt; and heating the quartz glass crucible having the roughened inner surface to crystallize a surface of the roughened region. This can produce a quartz glass crucible for pulling a single crystal silicon which can suppress generation of a brown ring on the inner surface of the crucible during pulling the single crystal silicon and can suppress crystallinity disorder of the single crystal silicon.
Vitreous silica crucible and method of manufacturing the same
A method of manufacturing a vitreous silica crucible includes: a taking-out process of taking out the vitreous silica crucible from the mold, a honing process of removing the unfused silica powder layer on the outer surface of the vitreous silica crucible, and further comprising, after the taking-out process and before the honing process, a marking process of marking an identifier comprised of one or more groove line on the outer surface of the vitreous silica crucible, wherein the groove line after the honing process has a cross-sectional shape of an inverse trapezoid and a depth of 0.2 to 0.5 mm, and a width of 0.8 mm or more at the opening of the groove line. The groove line is formed by repeating shifting a focal point of a laser.
Evaluation method of suitable silica powder in manufacturing vitreous silica crucible for pulling of silicon single crystal
An evaluation method of suitable silica powder for forming a bubble-free layer of a vitreous silica crucible for pulling of a silicon single crystal, includes: a process of measuring a porosity between silica particles in the silica powder, a process of melting the silica powder, a process of measuring a bubble content rate of a vitreous silica block obtained by cooling to harden the melted silica powder, and a process of determining whether the silica powder is suitable from the porosity of the silica powder and the bubble content rate of the vitreous silica block.
VITREOUS SILICA CRUCIBLE AND METHOD OF MANUFACTURING THE SAME
A method of manufacturing a vitreous silica crucible includes: a taking-out process of taking out the vitreous silica crucible from the mold, a honing process of removing the unfused silica powder layer on the outer surface of the vitreous silica crucible, and further comprising, after the taking-out process and before the honing process, a marking process of marking an identifier comprised of one or more groove line on the outer surface of the vitreous silica crucible, wherein the groove line after the honing process has a cross-sectional shape of an inverse trapezoid and a depth of 0.2 to 0.5 mm, and a width of 0.8 mm or more at the opening of the groove line. The groove line is formed by repeating shifting a focal point of a laser.
Vitreous silica crucible and method of manufacturing the same
The present invention provides a method of manufacturing a vitreous silica crucible including: a taking-out process of taking out the vitreous silica crucible from the mold, a honing process of removing the unfused silica powder layer on the outer surface of the vitreous silica crucible, and further comprising, after the taking-out process and before the honing process, a marking process of marking an identifier comprised of one or more groove line on the outer surface of the vitreous silica crucible, wherein the groove line after the honing process has a depth of 0.2 to 0.5 mm, and a width of 0.8 mm or more at the opening of the groove line.
Systems and method for producing hollow quartz cylinders
This disclosure relates to fabrication of quartz hollow cylinder with reduced bubbles using atmospheric control. An example horizontal rotating arc furnace includes a housing, supports, and a rotary union. The housing defines an interior configured to receive silica particles and electrodes that generate a plasma arc and includes a plurality of first ports on an exterior of the housing fluidly connected to the interior and supply pipes fluidly coupled to the first ports. The supports mechanically couple the housing to a drive system to provide rotational motion to the housing. The rotary union is coupled to the housing includes second ports to fluidly connect to a vacuum supply. The second ports are fluidly connected to the first ports via the supply pipes. The horizontal rotating arc furnace is configured to apply a vacuum to the interior of the housing via the first ports when the housing is spinning.
Quartz container manufacturing method and forming apparatus
A quartz container manufacturing method and a forming apparatus, relating to the solar photovoltaic technical field, and providing a mold comprising a top cylinder and a mold bottom; during formation of a container blank, when the mold forms a first included angle with a horizontal plane and the mold is rotated at a first rotation speed, the source material forms a first blank on the inner wall of the top cylinder; when the mold forms a second included angle with the horizontal plane and the mold is rotated at a second rotation speed, the source material forms a second blank on the inner wall of the mold bottom; a quartz container is manufactured from a container blank composed of the first blank and the second blank.
Infrared transmissivity measurement method of quartz glass crucible
An infrared transmissivity measurement method is for measuring an infrared transmissivity of a quartz glass crucible which includes a transparent layer made of quartz glass that does not contain bubbles, a bubble layer formed outside the transparent layer and made of quartz glass containing bubbles, and a semi-molten layer formed outside the bubble layer and made of raw material silica powder solidified in a semi-molten state. The infrared transmissivity measurement method includes processing an outer surface of the quartz glass crucible formed by the semi-molten layer to lower a surface roughness of the outer surface; and measuring an infrared transmissivity of the quartz glass crucible based on infrared light passing through the outer surface after processing the outer surface.
QUARTZ GLASS CRUCIBLE FOR PULLING SINGLE CRYSTAL SILICON INGOT
A quartz glass crucible having a crucible shape including straight body portion, curved portion, and bottom portion. The crucible includes: an outer layer made of an opaque quartz glass containing bubbles; and an inner layer made of a transparent quartz glass and having a thickness of greater than or equal to 1.5 mm. Concentrations of Na, K, and Li in the inner layer at 1 mm from an inner surface of the quartz glass crucible are less than 5 ppb by mass for Na, less than 5 ppb by mass for K, and less than 100 ppb by mass for Li. Average concentrations of Na, K, and Li in a thickness direction at the curved portion and the bottom portion in the outer layer are less than 10 ppb by mass for Na, less than 50 ppb by mass for K, and less than 180 ppb by mass for Li.
MANUFACTURING METHOD OF QUARTZ GLASS CRUCIBLE
A manufacturing method of a quartz glass crucible includes: producing a quartz glass crucible by arc-melting raw material quartz powder deposited on an inner surface of a rotating mold; washing an inner surface of the quartz glass crucible with pure water thereby reducing a total concentration of Na, K, and Ca contained in a silica glass around the inner surface as compared to that before washing; and etching the inner surface with washing liquid containing hydrofluoric acid.