Provides is low scattering silica glass suitable as a material of an optical communication fiber. Silica glass has a fictive temperature of at least 1,000 C. and a void radius of at most 0.240 nm, as measured by positron annihilation lifetime spectroscopy. A method for heat-treating silica glass is also provided, which comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200 C. and at most 2,000 C. under a pressure of at least 30 MPa, and cooling the silica glass at an average temperature-decreasing rate of at least 40 C./min during cooling within a temperature range of from 1,200 C. to 900 C. A method for heat-treating silica glass also comprises holding silica glass to be heat-treated in an atmosphere at a temperature of at least 1,200 C. and at most 2,000 C. under a pressure of at least 140 MPa, and cooling the silica glass in an atmosphere under a pressure of at least 140 MPa during cooling within a temperature range of from 1,200 C. to 900 C.

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.

Preparation of halogen-doped silica is described. The preparation includes doping silica with high halogen concentration, sintering halogen-doped silica to a closed-pore state, and subjecting the closed-pore silica body to a thermal treatment process and/or a pressure treatment process. The temperature of thermal treatment is sufficiently high to facilitate reaction of unreacted doping precursor trapped in voids or interstices of the glass structure, but is below temperatures conducive to foaming. Core canes or fibers drawn from halogen-doped silica subjected to the thermal treatment and/or pressure treatment show improved optical quality and possess fewer defects. The thermal treatment and/or pressure treatment is particularly advantageous when used for silica doped with high concentrations of halogen.

A device for manufacturing SiO.sub.2TiO.sub.2 based glass by growing a glass ingot upon a target by a direct method. The device includes the target, comprising a thermal storage portion that accumulates heat by being preheated, and a heat insulating portion that suppresses conduction of heat from the thermal storage portion in a direction opposite to the glass ingot.

A process of forming a titania-silica glass body, the process including exposing a titania-doped silica soot body to a first thermal treatment by heating the body to a first temperature T1 between about 800? C. and about 1100? C. for a first time duration t1 calculated using the equation:

[00001]$t1>\frac{L_c^2}{4?},$

wherein L.sub.c is the characteristic length (cm) of the body and ? is the thermal diffusivity (cm.sup.2/sec) of the body. The process further including exposing the body to a second thermal treatment by heating the body to a second temperature T2 between about 1050? C. and about 1250? C. wherein, after the second thermal treatment, a peak-to-valley difference of hydroxyl concentration amongst a plurality of segments of the body is about 70 ppm or less.

Layered glass structures and fabrication methods are described. The methods include depositing soot on a dense glass substrate to form a composite structure and sintering the composite structure to form a layered glass structure. The dense glass substrate may be derived from an optical fiber preform that has been modified to include a planar surface. The composite structure may include one or more soot layers. The layered glass structure may be formed by combining multiple composite structures to form a stack, followed by sintering and fusing the stack. The layered glass structure may further be heated to softening and drawn to control linear dimensions. The layered glass structure or drawn layered glass structure may be configured as a planar waveguide.

Layered glass structures and fabrication methods are described. The methods include depositing soot on a dense glass substrate to form a composite structure and sintering the composite structure to form a layered glass structure. The dense glass substrate may be derived from an optical fiber preform that has been modified to include a planar surface. The composite structure may include one or more soot layers. The layered glass structure may be formed by combining multiple composite structures to form a stack, followed by sintering and fusing the stack. The layered glass structure may further be heated to softening and drawn to control linear dimensions. The layered glass structure or drawn layered glass structure may be configured as a planar waveguide.

An additive manufacturing process includes forming an object material stack using sheet materials without use of binder material between the sheet materials and forming features of the cross-sectional layers of a 3D object in the corresponding sheet materials. Another process involves forming features of the cross-sectional layers of a 3D object in soot layers of a laminated soot sheet. A manufactured article includes three or more glass layers laminated together without any binder material between the glass layers. At least one of the glass layers is composed of silica or doped silica, and at least one feature is formed in at least one of the glass layers.

A system and method for making an edge section of a thin, high purity fused silica glass sheet. The method includes a step of directing a laser to melt through the glass sheet with localized heating of a narrow portion of the glass sheet to form an edge section of the glass sheet, and continuing the edge section to form a closed loop defining a perimeter of the glass sheet. The method further includes rapidly cooling the glass sheet through the glass transition temperature as the melted glass of the edge section contracts and/or solidifies to form an unrefined-bullnose shape extending between first and second major surfaces of the glass sheet.

Disclosed herein are organic light-emitting diodes (OLEDs) comprising an anode, a hole transporting layer, an emitting layer, an electron transporting layer, a cathode, and at least one glass substrate, wherein the at least one glass substrate comprises a first surface, an opposing second surface, and a plurality of voids disposed therebetween, wherein the void fill fraction of the glass substrate is at least about 0.1% by volume. Display devices comprises such OLEDs are also disclosed herein. Methods for making glass substrates are further disclosed herein.