A production method for a glass particulate deposit which includes a deposition step in which, at least two liquid source material ejecting ports 31a for a glass source material 23 jetting out from a burner 22 are provided per one burner 22, the area of at least one liquid source material port 31a is 2.2510.sup.4 or less of the area of the flame forming part of the burner 22, the glass source material 23 is, in the form of a liquid thereof, supplied to each liquid material source port 31a, jetting gas ports 31b are arranged in such a manner that the inner periphery of the jetting gas port is positioned outside by 1.0 mm or less from the outer periphery of each liquid source material port 31a, and a gas is jetted out from each gas jetting port 31b.

In the method for manufacturing a glass-fine-particle-deposited body according to the present invention, at least a part of a gas supplying pipe 25 from a temperature controlled booth 24 to a burner 18 for cladding is temperature-controlled so that the temperature at the burner side becomes high and temperature gradient becomes 5 C./m or more. The temperature control is performed so that the temperature gradient becomes preferably 15 C./m or more, more preferably 25 C./m or more. Specifically, the part is controlled to the predetermined temperature gradient by winding a tape heater 26 that is a heating element on the outer circumference of the gas supplying pipe 25 from the temperature controlled booth 24 to the burner 18 for cladding and temperature-controlling the tape heater 26.

Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400 C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm.sup.3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.

A soot glass deposit body is manufactured by placing a starting rod and a burner 22 for producing glass particulates in a reaction container, introducing a source material gas to the burner 22 through a supplying pipe 26, producing glass particulates by a pyrolytic oxidation reaction of the source material gas in a flame formed by the burner 22, and depositing the produced glass particulates on the starting rod. At the time, the source material gas to be supplied to the burner 22 is a siloxane, the burner 22 is heated so that temperature of the burner 22 falls within the range of from 30 C. to +30 C. relative to the boiling point of the siloxane, and also temperature of the supplying pipe is controlled within the range of from the boiling point of the siloxane to the boiling point plus 30 C.

Provided is a glass particulate deposit manufacturing method for manufacturing a glass particulate deposit comprising mounting a fixing jig on an outer periphery of an outermost pipe of a burner; inserting a burner cover from a tip end of the outermost pipe of the burner; and sandwiching and compressing a part of the fixing jig between the burner cover and the outermost pipe of the burner to fix the burner cover to the burner, wherein an outer diameter of a part of the fixing jig that is not compressed is greater than an inner diameter of a part of the burner cover inserted to the tip end of the outermost pipe of the burner.

A method of manufacturing synthetic quartz glass through an outside vapor deposition (OVD) process with improved deposition efficiency. When a hollow cylindrical synthetic quartz glass product is manufactured through an OVD method or the like, it is environmentally friendly in view of using a smaller amount of chlorine and is economical in view of requiring no separate treatment equipment, as compared to a conventional technique using silicon chloride (SiCl.sub.4). Also, the method, in which octamethylcyclotetrasiloxane is supplied to a deposition burner while being sprayed in the form of a droplet along with a high-pressure carrier gas and vaporized by the deposition burner, can effectively address the high-temperature heating and slow decomposition involved when octamethylcyclotetrasiloxane ([(CH.sub.3).sub.2SiO].sub.4) is used as a source for depositing silicon dioxide particles.

A process for producing a glass body, the process including flowing oxygen gas from a burner in a furnace at a flow rate of greater than 12.0 standard liters per minute and flowing a precursor gas mixture from the burner. The process further including oxidizing the precursor gas mixture with the oxygen gas to form glass particles and depositing the glass particles on a collection cup to form the glass body.