An optical fiber with large effective area, low bending loss and low attenuation. The optical fiber includes a core, an inner cladding region, and an outer cladding region. The core region includes a spatially uniform updopant to minimize low Rayleigh scattering and a relative refractive index and radius configured to provide large effective area. The inner cladding region features a large trench volume to minimize bending loss. The core may be doped with Cl and the inner cladding region may be doped with F.

Described is a process for the production of synthetic fused silica in which the deposition surface is located for a period of at least 50% of the build-up time of the soot body at a burner distance in which the horizontally integrated luminous intensity of the flame of the burner used in the targetless state is still at least of the maximum horizontally integrated luminous intensity of the flame.

An optical fiber with large effective area, low bending loss and low attenuation. The optical fiber includes a core, an inner cladding region, and an outer cladding region. The core region includes a spatially uniform updopant to minimize low Rayleigh scattering and a relative refractive index and radius configured to provide large effective area. The inner cladding region features a large trench volume to minimize bending loss. The core may be doped with Cl and the inner cladding region may be doped with F.

A method of manufacturing synthetic quartz glass through an outside vapor deposition (OVD) process with improved deposition efficiency. When a hollow cylindrical synthetic quartz glass product is manufactured through an OVD method or the like, it is environmentally friendly in view of using a smaller amount of chlorine and is economical in view of requiring no separate treatment equipment, as compared to a conventional technique using silicon chloride (SiCl.sub.4). Also, the method, in which octamethylcyclotetrasiloxane is supplied to a deposition burner while being sprayed in the form of a droplet along with a high-pressure carrier gas and vaporized by the deposition burner, can effectively address the high-temperature heating and slow decomposition involved when octamethylcyclotetrasiloxane ([(CH.sub.3).sub.2SiO].sub.4) is used as a source for depositing silicon dioxide particles.

A process for producing a glass body, the process including flowing oxygen gas from a burner in a furnace at a flow rate of greater than 12.0 standard liters per minute and flowing a precursor gas mixture from the burner. The process further including oxidizing the precursor gas mixture with the oxygen gas to form glass particles and depositing the glass particles on a collection cup to form the glass body.

A process for producing a glass body, the process including flowing oxygen gas from a burner in a furnace at a flow rate of greater than 12.0 standard liters per minute and flowing a precursor gas mixture from the burner. The process further including oxidizing the precursor gas mixture with the oxygen gas to form glass particles and depositing the glass particles on a collection cup to form the glass body.