Patent classifications
C03C3/06
LAMINATION MEMBER AND GLASS COMPOSITION
The present invention relates to a laminated member, including: a glass member having a linear transmittance at a wavelength of 850 nm of 80% or more; a bonding layer containing a resin and lying on the glass member; and a Si—SiC member lying on the bonding layer, in which the glass member includes predetermined amounts of SiO.sub.2, Al.sub.2O.sub.3, B.sub.2O.sub.3, and P.sub.2O.sub.5, the Si—SiC member has an average linear expansion coefficient α at 20 to 200° C. of 2.85 to 4.00 ppm/° C., and has an average linear expansion coefficient β at 20 to 200° C. of 1.50 to 5.00 ppm/° C., and the laminated member has an absolute value |α−β|, which is a value obtained by subtracting β from α, of 2.00 ppm/° C. or less.
LAMINATION MEMBER AND GLASS COMPOSITION
The present invention relates to a laminated member, including: a glass member having a linear transmittance at a wavelength of 850 nm of 80% or more; a bonding layer containing a resin and lying on the glass member; and a Si—SiC member lying on the bonding layer, in which the glass member includes predetermined amounts of SiO.sub.2, Al.sub.2O.sub.3, B.sub.2O.sub.3, and P.sub.2O.sub.5, the Si—SiC member has an average linear expansion coefficient α at 20 to 200° C. of 2.85 to 4.00 ppm/° C., and has an average linear expansion coefficient β at 20 to 200° C. of 1.50 to 5.00 ppm/° C., and the laminated member has an absolute value |α−β|, which is a value obtained by subtracting β from α, of 2.00 ppm/° C. or less.
Sapphire coated substrate with a flexible, anti-scratch and multi-layer coating
A method for forming a substrate with a multi-layered, flexible, and anti-scratch metal oxides protective coating being deposited onto the substrate is provided in the present invention, wherein the top most layer of the coating comprises Al.sub.2O.sub.3 or a mixture thereof such that the top most layer acts as an anti-scratching layer. The multi-layered, flexible and anti-scratch metal oxides protective coating also retains the flexibility of the underlying substrate.
Sapphire coated substrate with a flexible, anti-scratch and multi-layer coating
A method for forming a substrate with a multi-layered, flexible, and anti-scratch metal oxides protective coating being deposited onto the substrate is provided in the present invention, wherein the top most layer of the coating comprises Al.sub.2O.sub.3 or a mixture thereof such that the top most layer acts as an anti-scratching layer. The multi-layered, flexible and anti-scratch metal oxides protective coating also retains the flexibility of the underlying substrate.
ACTIVE MATERIAL, METHOD OF MANUFACTURING THE SAME, ELECTRODE, AND SECONDARY BATTERY
An active material includes silicon, oxygen, a first element, a second element, and a third element. The first element includes boron, phosphorus, or both. The second element includes at least one of an alkali metal element, a transition element, or a typical element. The third element includes the alkaline earth metal element. A content of silicon is greater than or equal to 60 at % and less than or equal to 98 at %. A content of the first element is greater than or equal to 1 at % and less than or equal to 25 at %. A content of the second element is greater than or equal to 1 at % and less than or equal to 34 at %. A content of the third element is greater than or equal to 0 at % and less than or equal to 6 at %.
ACTIVE MATERIAL, METHOD OF MANUFACTURING THE SAME, ELECTRODE, AND SECONDARY BATTERY
An active material includes silicon, oxygen, a first element, a second element, and a third element. The first element includes boron, phosphorus, or both. The second element includes at least one of an alkali metal element, a transition element, or a typical element. The third element includes the alkaline earth metal element. A content of silicon is greater than or equal to 60 at % and less than or equal to 98 at %. A content of the first element is greater than or equal to 1 at % and less than or equal to 25 at %. A content of the second element is greater than or equal to 1 at % and less than or equal to 34 at %. A content of the third element is greater than or equal to 0 at % and less than or equal to 6 at %.
OPTICAL ELEMENT AND LITHOGRAPHY SYSTEM
An optical element reflects radiation, such as EUV radiation. The optical element includes a substrate with a surface to which a reflective coating is applied. The substrate has at least one channel through which a coolant can flow. The substrate is formed from fused silica, such as titanium-doped fused silica, or a glass ceramic. The channel has a length of at least 10 cm below the surface to which the reflective coating is applied. The cross-sectional area of the channel varies by no more than +/−20% over the length of the channel.
Method for figure control of optical surfaces
A method for figuring an optical surface of an optical element to achieve a target profile for the optical surface includes: applying a removal process to an extended region of the optical surface extending along a first direction to remove material from the extended region of the optical surface; adjusting a position of the optical surface relative to the removal process along a second direction perpendicular to the first direction to remove material from additional extended regions of the optical surface extending along the first direction at each of different positions of the optical surface along the second direction; and repeating the applying of the removal process and the adjusting of the optical surface relative to the removal process for each of multiple rotational orientations of the optical surface about a third direction perpendicular to the first and second directions to achieve the target profile of the optical surface.
GLASS AND METHOD FOR MANUFACTURING THE SAME
A glass includes a first glass portion and a second glass portion. The first glass portion has a higher ion packing density than the second glass portion (has a composition that forms a glass in which, out of plastic deformation characteristics, plastic flow is dominant). The second glass has a lower ion packing density than the first glass portion (has a composition that forms a glass in which, out of the plastic deformation characteristics, densification is dominant).
Diffuser material of synthetically produced quartz glass and method for the manufacture of a molded body consisting fully or in part thereof
A diffuser material of synthetically produced, pore-containing quartz glass and a method for the manufacture of a molded body consisting fully or in part thereof. The diffuser material has a chemical purity of at least 99.9% SiO.sub.2, a cristobalite content of not more than 1%, and a density in the range of 2.0 to 2.18 g/cm.sup.3. Starting therefrom, to indicate a diffuser material which is improved with respect to diffuse reflectivity with Lambertian behavior over a wide wavelength range, high material homogeneity and UV radiation resistance, the quartz glass has a hydroxyl group content in the range of at least 200 wt. ppm and at least 80% of the pores have a maximum pore dimension of less than 20 μm.