C03C3/06

Method for producing titanium-doped synthetic quartz glass

A method for producing titanium-doped synthetic quartz glass includes: (A) providing a liquid SiO.sub.2 feedstock material that comprises more than 60% by weight of the polyalkylsiloxane D4; (B) evaporating the liquid SiO.sub.2 feedstock material to produce a gaseous SiO.sub.2 feedstock vapor; (C) evaporating a liquid TiO2 feedstock material to produce a gaseous TiO2 feedstock vapor; (D) converting the SiO.sub.2 feedstock vapor and the TiO2 feedstock vapor into SiO2 particles and TiO2 particles, respectively; (E) depositing the SiO2 particles and the TiO2 particles on a deposition surface while forming a titanium-doped SiO.sub.2 soot body; (F) vitrifying the titanium-doped SiO.sub.2 soot body while forming the synthetic quartz glass, whereby the TiO2 concentration of the synthetic quartz glass is between 5% by weight and 11% by weight. The liquid SiO.sub.2 feedstock material comprises at least one additional component made of the polyalkylsiloxane D3 having a weight fraction of mD3 and one additional component made of the polyalkylsiloxane D5 having a weight fraction of mD5 at a weight ratio of mD3/mD5 in a range of 0.01 to 1, and the liquid SiO.sub.2 feedstock material provided is evaporated while maintaining the weight ratio of mD3/mD5 and at least 99% by weight thereof are evaporated to form the gaseous SiO.sub.2 feedstock vapor.

Burner design for particle generation

A method of producing bi-modal particles includes the steps of igniting a first precursor gas using a primary burner thereby producing a first plurality of particles of a first size, fluidly transporting the first plurality of particles down a particle tube, igniting a second precursor gas using a secondary burner thereby producing a second plurality of particles of a second size, flowing the second plurality of particles into the first plurality of particles, and capturing the first and second plurality of particles.

Burner design for particle generation

A method of producing bi-modal particles includes the steps of igniting a first precursor gas using a primary burner thereby producing a first plurality of particles of a first size, fluidly transporting the first plurality of particles down a particle tube, igniting a second precursor gas using a secondary burner thereby producing a second plurality of particles of a second size, flowing the second plurality of particles into the first plurality of particles, and capturing the first and second plurality of particles.

Method for the manufacture of synthetic quartz glass

One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment.

Method for the manufacture of synthetic quartz glass

One aspect relates to a method for the production of synthetic quartz glass. Moreover, one aspect relates to a polyalkylsiloxane compound, which includes certain specifications with respect to chlorine content, metallic impurities content, and residual moisture, as well as the use thereof for the production of synthetic quartz glass. One aspect also relates to a synthetic quartz glass that can be obtained according to the method of one embodiment.

Ultralow expansion titania-silica glass

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.

Ultralow expansion titania-silica glass

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.

OPTICAL FIBER PREFORM, OPTICAL FIBER, AND METHOD OF MANUFACTURING OPTICAL FIBER
20170285259 · 2017-10-05 · ·

An optical fiber preform includes: a core formed of silica glass which does not contain Ge, wherein the core has at least one of characteristics in spectrometry of (1) an absorption peak is present at a wavelength of 240 nm to 255 nm, and (2) a wavelength at which an ultraviolet transmittance is 50% or lower is longer than 170 nm.

QUARTZ ETCHING METHOD AND ETCHED SUBSTRATE
20220048811 · 2022-02-17 ·

A quartz etching method of the invention includes forming a mask on a quartz glass substrate and carrying out etching using a hydrofluoric acid-based etchant solution. The quartz etching method includes: preparing a quartz glass substrate; forming a mask having a predetermined pattern on the quartz glass substrate; and carrying out etching on the quartz glass substrate. When the quartz glass substrate is prepared, the quartz glass substrate is selected in accordance with a standard such that a concentration of hydroxyl groups included therein is less than or equal to 300 ppm.

Microfabrication method

A microfabrication method is provided with which it is possible to easily form a fine periodic structure on a surface of any substrate. A glass precursor is applied to a substrate, and the glass precursor is irradiated with short-pulse laser light. By the irradiation with short-pulse laser light, the glass precursor is activated to undergo a thermal reaction, and a fine periodic structure can be easily formed on the surface. Furthermore, by oxidizing the substrate on which the fine periodic structure has been formed, the hue of the surface can be improved while maintaining the fine periodic structure.