The present invention pertains to a glass characterized by: containing 72-82% of Li.sup.+, 0-21% of Si.sup.4+, and 0-28% of B.sup.3+ in terms of cation %; and containing at least 70% and less than 100% of O.sup.2− and more than 0% and at most 30% of Cl.sup.−, containing at least 94% and less than 100% of O.sup.2− and more than 0% and at most 6% of S.sup.2−, or containing at least 64% and less than 100% of O.sup.2−, more than 0% and at most 30% of Cl.sup.−, and more than 0% and at most 6% of S.sup.2−, in terms of anion %.

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include silicon dioxide (SiO.sub.2) at 25 to 50 wt %; boron oxide (B.sub.2O.sub.3) at 1 to 15 wt %; one or more of lithium superoxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O) at 10 to 20 wt %; sodium fluoride (NaF) at 1 to 5 wt %; zinc oxide (ZnO) at 1 to 10 wt %; and one or more of titanium dioxide (TiO.sub.2), molybdenum trioxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), or cerium dioxide (CeO.sub.2) at 20 to 40 wt %, such that a heating time required for cleaning is shortened and cleaning is possible without carrying out a water soaking process.

A composition for sealing inorganic substrates, the composition comprising a glass frit and a filler material, wherein said glass frit comprises: 60 to 85 wt % Bi.sub.2O.sub.3; 3 to 15 wt % ZnO; 2 to 10 wt % B.sub.2O.sub.3; 0.6 to 5 wt % SiO.sub.2; 0.6 to 5 wt % Al.sub.2O.sub.3; and 0.1 to 0.5 wt % of a compound selected from NaF and BaF.sub.2.

A composition for sealing inorganic substrates, the composition comprising a glass frit and a filler material, wherein said glass frit comprises: 60 to 85 wt % Bi.sub.2O.sub.3; 3 to 15 wt % ZnO; 2 to 10 wt % B.sub.2O.sub.3; 0.6 to 5 wt % SiO.sub.2; 0.6 to 5 wt % Al.sub.2O.sub.3; and 0.1 to 0.5 wt % of a compound selected from NaF and BaF.sub.2.

A marking composition for forming marks or indicia on a substrate is provided for laser marking applications. The composition includes a glass frit, a carrier, and absorber particles. The glass frit includes alkali metal oxides, glass forming oxides, and one or more transition metal oxides. The glass frit is devoid of at least one of bismuth and zinc.

A marking composition for forming marks or indicia on a substrate is provided for laser marking applications. The composition includes a glass frit, a carrier, and absorber particles. The glass frit includes alkali metal oxides, glass forming oxides, and one or more transition metal oxides. The glass frit is devoid of at least one of bismuth and zinc.

Provided is a wavelength conversion member that can easily reduce the leakage of excitation light in an ultraviolet range to the outside. A wavelength conversion member for use to convert excitation light having a wavelength of 250 to 280 nm to visible light contains a glass matrix and a phosphor dispersed in the glass matrix, and a total light transmittance of the glass matrix at a thickness of 1 mm is 0.1 to 80% at a wavelength of 250 to 280 nm.

Provided is a glass composition comprising a glass frit containing P.sub.2O.sub.5, SiO.sub.2, B.sub.2O.sub.3, Al.sub.2O.sub.3, ZrO.sub.2 and a group I-based oxide, wherein the P.sub.2O.sub.5 is contained in an amount of 10 to 30% by weight based on a total weight of the glass frit, wherein the SiO.sub.2 is contained in an amount of 20 to 40% by weight based on the total weight of the glass frit, wherein the B.sub.2O.sub.3 is contained in an amount of 5 wt % to 18 wt % based on the total weight of the glass frit, wherein the Al.sub.2O.sub.3 is contained in an amount of 15 to 30% by weight based on the total weight of the glass frit, wherein the ZrO.sub.2 is contained in an amount of 1 wt % to 8 wt % based on the total weight of the glass frit, wherein the Group I-based oxide is contained in an amount of 15 to 30% by weight based on the total weight of the glass frit.

Provided is a glass composition comprising a glass frit containing P.sub.2O.sub.5, SiO.sub.2, B.sub.2O.sub.3, Al.sub.2O.sub.3, ZrO.sub.2 and a group I-based oxide, wherein the P.sub.2O.sub.5 is contained in an amount of 10 to 30% by weight based on a total weight of the glass frit, wherein the SiO.sub.2 is contained in an amount of 20 to 40% by weight based on the total weight of the glass frit, wherein the B.sub.2O.sub.3 is contained in an amount of 5 wt % to 18 wt % based on the total weight of the glass frit, wherein the Al.sub.2O.sub.3 is contained in an amount of 15 to 30% by weight based on the total weight of the glass frit, wherein the ZrO.sub.2 is contained in an amount of 1 wt % to 8 wt % based on the total weight of the glass frit, wherein the Group I-based oxide is contained in an amount of 15 to 30% by weight based on the total weight of the glass frit.

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include phosphorus pentoxide (P.sub.2O.sub.5) at 15 to 50 wt %; silicon dioxide (SiO.sub.2) at 10 to 20 wt %; boron oxide (B.sub.2O.sub.3) at 1 to 15 wt %; one or more of lithium oxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O) at 5 to 20 wt %; one or more of sodium fluoride (NaF), calcium fluoride (CaF.sub.2), or aluminum fluoride (AlF.sub.3) at 1 to 5 wt %; one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO) at 1 to 35 wt %; and one or more of titanium dioxide (TiO.sub.2), cerium dioxide (CeO.sub.2), molybdenum trioxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), or copper oxide (CuO) at 10 to 25 wt %, such that a heating time required for cleaning may be shortened and oil contaminants may be completely removed.