A glass frit includes a glass which contains: Li; at least one selected from the group consisting of B, Si, P, Ge, and Te; O; and at least one selected from the group consisting of F, Cl, Br, and I. The glass is to turn into a crystallized glass including an amorphous phase and a crystalline phase, the crystalline phase precipitated by a heat treatment at a temperature equal to or higher than a glass transition temperature and equal to or lower than a glass crystallization temperature. The crystallized glass shows diffraction peaks at 2θ=22.8±0.5°, 2θ=32.1±0.5° and 2θ=39.6±0.5° in a powder X-ray diffraction pattern using Cu—Kα radiation.

A glass frit includes a glass which contains: Li; at least one selected from the group consisting of B, Si, P, Ge, and Te; O; and at least one selected from the group consisting of F, Cl, Br, and I. The glass is to turn into a crystallized glass including an amorphous phase and a crystalline phase, the crystalline phase precipitated by a heat treatment at a temperature equal to or higher than a glass transition temperature and equal to or lower than a glass crystallization temperature. The crystallized glass shows diffraction peaks at 2θ=22.8±0.5°, 2θ=32.1±0.5° and 2θ=39.6±0.5° in a powder X-ray diffraction pattern using Cu—Kα radiation.

A sealing glass is provided that includes SiO.sub.2, Al.sub.2O.sub.3 having a content of less than 2% by weight, is free of PbO except for unavoidable impurities, a coefficient of linear thermal expansion (∝.sub.20-300 of more than 10*10.sup.−6/K, a dielectric constant (ε.sub.r) in the range from at least 7.10 to not more than 7.80 at a measurement frequency of 1 MHz and a temperature of 25° C., and a glass transition temperature (T.sub.g) in a range from 400 to 550° C.

A sealing glass is provided that includes SiO.sub.2, Al.sub.2O.sub.3 having a content of less than 2% by weight, is free of PbO except for unavoidable impurities, a coefficient of linear thermal expansion (∝.sub.20-300 of more than 10*10.sup.−6/K, a dielectric constant (ε.sub.r) in the range from at least 7.10 to not more than 7.80 at a measurement frequency of 1 MHz and a temperature of 25° C., and a glass transition temperature (T.sub.g) in a range from 400 to 550° C.

The invention involves a silky, fine-grained matte ceramic tile and its preparation method. A blank material for the ceramic tile consists of the following components: nepheline powder: 10%-15%; high-carbon mud: 10%-15%; low-carbon mud: 15%-22%; medium-high-carbon mud: 10%-15%; recycled waste blank: 5%-10%; feldspar powder: 5%-10%; albite powder for paving: 12%-20%; waste porcelain powder: 5%-10%; desulfurized waste: 0%-7%; waste from edging and polishing: 15%-26%; liquid gel remover: 0.3%-1.0%; liquid reinforcing agent: 0.2%-0.8%. Its preparation method comprises the following steps: preparing raw materials for a blank body and ball milling.fwdarw.spray drying.fwdarw.aging.fwdarw.pressing and molding of the blank body.fwdarw.drying.fwdarw.polishing the blank body.fwdarw.spraying water.fwdarw.applying a glaze.fwdarw.applying a decorative pattern.fwdarw.firing.

A composition for enamel may include 20 to 45 wt % of SiO.sub.2; 1 to 15 wt % of B.sub.2O.sub.3, 10 to 20 wt % of one or more of Na.sub.2O, K.sub.2O, and Li.sub.2O, 1 to 5 wt % of NaF, 1 to 10 wt % of ZnO, 5 to 15 wt % of TiO.sub.2, 3 to 7 wt % of MoO.sub.3,; 5 to 15 wt % of Bi.sub.2O.sub.3, 1 to 5 wt % of CeO.sub.2, and 1 to 10 wt % of one or more of MnO.sub.2, Fe.sub.2O.sub.3, and Co.sub.3O.sub.4. The composition may be used to coat a cooking appliance for easy removal of contaminants at room temperature.

A composition for enamel may include 10 to 45 wt % of SiO.sub.2; 1 to 10 wt % of B.sub.2O.sub.3, 10 to 20 wt % of one or more of Na.sub.2O, K.sub.2O, and/or Li.sub.2O, 1 to 5 wt % of NaF, 1 to 10 wt % of ZnO, 5 to 15 wt % of TiO.sub.2, 3 to 7 wt % of MoO.sub.3, 5 to 15 wt % of Bi.sub.2O.sub.3, 1 to 5 wt % of CeO.sub.2, and 0.5 to 10 wt % of one or more of MnO.sub.2, Fe.sub.2O.sub.3, and/or Co.sub.3O.sub.4. The composition may be used to make a coating layer provided on a cooking appliance so that contaminants may be easily cleaned from the cooking appliance at a room temperature.

A composition for enamel may include 10 to 45 wt % of SiO.sub.2; 1 to 10 wt % of B.sub.2O.sub.3, 10 to 20 wt % of one or more of Na.sub.2O, K.sub.2O, and/or Li.sub.2O, 1 to 5 wt % of NaF, 1 to 10 wt % of ZnO, 5 to 15 wt % of TiO.sub.2, 3 to 7 wt % of MoO.sub.3, 5 to 15 wt % of Bi.sub.2O.sub.3, 1 to 5 wt % of CeO.sub.2, and 0.5 to 10 wt % of one or more of MnO.sub.2, Fe.sub.2O.sub.3, and/or Co.sub.3O.sub.4. The composition may be used to make a coating layer provided on a cooking appliance so that contaminants may be easily cleaned from the cooking appliance at a room temperature.

Certain example embodiments relate to improved seals for glass articles. Certain example embodiments relate to a composition used for sealing an insulted glass unit. In certain example embodiments the composition includes vanadium oxide, barium oxide, zinc oxide, and at least one additional additive. For instance, another additive that is a different metal oxide or different metal chloride may be provided. In certain example embodiments, a vacuum insulated glass unit includes first and second glass substrates that are sealed together with a seal that includes the above-described composition.

Certain example embodiments relate to improved seals for glass articles. Certain example embodiments relate to a composition used for sealing an insulted glass unit. In certain example embodiments the composition includes vanadium oxide, barium oxide, zinc oxide, and at least one additional additive. For instance, another additive that is a different metal oxide or different metal chloride may be provided. In certain example embodiments, a vacuum insulated glass unit includes first and second glass substrates that are sealed together with a seal that includes the above-described composition.