A low-E (low emissivity) coating includes a multilayer overcoat designed for reducing fingerprints. The multilayer overcoat includes a layer comprising an oxide of zirconium (e.g., ZrO.sub.2) sandwiched between and contacting first and second layers of or including silicon nitride (e.g., Si.sub.3N.sub.4, SiO.sub.xN.sub.y, SiZrO.sub.xN.sub.y, or the like). The uppermost layer comprising silicon nitride modifies the surface energy of the layer comprising the oxide of zirconium so as to make the uppermost surface of the coating more hydrophilic, thereby reducing or minimizing interaction between zirconium oxide and finger oil to reduce fingerprints on the uppermost surface of the coating.

Certain example embodiments relate to the use of a ceramic frit that dissolves an already-applied thin film coating (disposed via a physical vapor deposition (PVD) process such as sputtering, or other suitable process). In certain example embodiments, the ceramic frit is aggressive in chemically removing the coating on which it is disposed, e.g., when exposed to high temperatures. The frit advantageously fuses well with the glass, provides aesthetically desired colorations, and/or enables components (e.g., insulated glass (IG) unit spacers) to be reliably mounted thereon, in certain example embodiments. Associated coated articles, IG units, methods, etc., are also contemplated herein.

A panel like, double-sided coated substrate and a method for production are provided. The panel like substrate includes at least two layers applied by heating, the first layer being applied on a first side of the substrate and having at least a glass component and structure-forming particles, the particles producing elevations on the first layer, and the softening temperature or the melting temperature of the particles being greater than the softening temperature of the glass component, and the second layer being applied on a second side of the substrate.

A nanoparticle coater includes a housing; a nanoparticle discharge slot; a first combustion slot; and a second combustion slot.

Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, and a difference between D95 and D5 is 3 μm or more.

An apparatus for applying the film to the substrate includes a bed having a substrate placement surface and a selectively positionable tack bar, a roller support moveable over the span of the bed, and including the location of the positioning bar, and a roller rotatably supported to the positioning bar and moveable over the bed in response to movement of the roller support with respect to the bed. In another aspect, the tack bar is of the same thickness, or slightly less thick, as the substrate onto which the film is to be applied, such that a portion of the film to be applied can be secured thereto and not on the substrate before the backing is removed from additional portions of the film, such that the tack bar supports an end of the film in substantially the plane of, or slightly below the plane of, the substrate.

A glass-ceramic cooktop is provided that is made of glass-ceramic material with a flat upper side and an underside. The glass-ceramic material has transmittance values of greater than 0.1% in the visible light range in the total wavelength region greater than 420 nm, a light transmittance in the visible range of 0.8-2.5%, and a transmittance of 0-85% in the infrared at 1600 nm, and wherein the glass-ceramic material has high quartz mixed crystals as the prevalent crystal phase. The underside is flat, unstructured, and coplanar with the upper side.

A liquid processing apparatus includes a processing liquid supply including a nozzle configured to discharge a processing liquid; a nozzle mover configured to move the nozzle between a coating position and a standby position; a suction unit including a suction opening toward a leading end surface of the nozzle located at the standby position; a cleaning unit configured to clean the leading end surface of the nozzle located at the standby position with a cleaning liquid; and a control device. The control device controls the processing liquid supply to discharge the processing liquid in a state that the nozzle is located at the standby position. The control device controls the suction unit to suck the processing liquid. The control device controls the cleaning unit to supply the cleaning liquid toward the standby position to clean the nozzle. The control device controls the suction unit to suck the cleaning liquid.

Letting a particle diameter be Dx (μm) when a cumulative particle volume cumulated from the small particle diameter side reaches x (%) of the total particle volume in a particle size distribution obtained regarding cerium oxide included in a polishing liquid using a laser diffraction/scattering method, D5 is 1 μm or less, D100 is 3 μm or more, D50 is 0.8 to 2.4 μm, and Dpeak−D5 is less than D95−Dpeak.

A method for printing an image on a substrate is provided. The method includes: providing image template data; analyzing the image template data by identifying image components; printing the image using the image template data using a printing procedure based on printing parameters with a printer operating using printer configuration parameters; capturing the printed image; providing captured image data of the captured image; analyzing the captured image data. The analyzing including determining the region of interest within the captured image data based on definition parameters, identifying an image component and an image metric for the region of interest, relating the image metric to the image component, relating the identified image component to the identified image component of the region of interest, selecting parameters based on the image metric and/or the image component, and computing an actual correction parameter based on an optimization computing procedure using the image metric.