A solar radiation shielding member includes a low radiation film sheet having a first dielectric film, a first metal film, a second dielectric film, a second metal film, a third dielectric film, a third metal film and a fourth dielectric film laminated in order of mention on a transparent substrate. The first dielectric film has: a dielectric layer A arranged directly above the transparent substrate and containing silicon and nitrogen; and a dielectric layer B arranged on the dielectric layer A and containing titanium and oxygen. The dielectric layer A has an optical thickness of 12 to 86 nm. The first, second and third dielectric films have respective crystalline dielectric layers as top layers thereof. The crystalline dielectric layers each have an optical thickness of 5 to 54 nm. The first, second and third metal films are Ag films directly below which the crystalline dielectric layers are arranged, respectively.

A flat glass is provided that includes a first side face, an opposite, second side face, and at least one edge face. The flat glass has a linear predetermined breaking location on the first or second side face. The flat glass also has two mutually separated points, where at least one of the two mutually separated points lies on the linear predetermined breaking location. The two mutually separated points are each configured as a point of attack for a force for breaking the flat glass. The two mutually separated points have breaking forces required to break the flat glass that differ from one another in magnitude and/or direction.

A chemical vapor deposition process for forming a silicon oxide coating includes providing a moving glass substrate. A gaseous mixture is formed and includes a silane compound, a first oxygen-containing molecule, a radical scavenger, and at least one of a phosphorus-containing compound and a boron-containing compound. The gaseous mixture is directed toward and along the glass substrate. The gaseous mixture is reacted over the glass substrate to form a silicon oxide coating on the glass substrate at a deposition rate of 150 nm*m/min or more.

Foldable apparatus can comprise a foldable substrate comprising a thickness (T) and a plurality of grooves extending through a first major surface. A groove spacing (Gs) is defined between a pair of grooves. A first groove of the plurality of grooves comprises a groove depth (Gd) and a groove width (Gw). In some embodiments, 7.93-6.19*(Gw/T) −9.52*(Gd/T) +6.05*(Gs/T) <0. In some embodiments, (Gw/T) ≥0.1, (Gs/T) ≤1.5, 0.3≤Gd/T 0.95. In some embodiments, a combined groove volume divided by a central volume can be about 0.3 or more. Methods of making a foldable apparatus comprise drawing a ribbon from a quantity of molten material off a forming device. Methods further comprising impinging a target location of the ribbon traveling in a draw direction with a laser beam to form a groove in the ribbon. In some embodiments, the groove can comprise a plurality of grooves.

A method of fabricating a cover glass includes preparing a base member including a first area and a second area, wherein a surface of the base member is substantially parallel to a direction in the first area and is inclined with respect to the direction in the second area, and forming an ink layer on the surface of the base member in the second area, and forming a first print layer by removing a portion of the ink layer and forming a second print layer on the first print layer.

A method for forming a glass stack, comprising: obtaining a glass sheet; selecting a plurality of portions of the glass sheet having a matching glass characteristic, wherein the glass characteristic is at least one of warp, bow, total thickness variation (TTV), and wedge; cutting a plurality of glass wafers from the selected portions of the glass sheet, and stacking the plurality of glass wafers to form a glass stack.

A process for depositing a coating on a glass substrate includes co-sputtered simultaneously by a plasma, in one and the same chamber of the vacuum deposition device, a first constituent made of a material consisting of an oxide, a nitride or an oxynitride of a first element and a second constituent consisting of the metallic form of a second element. The process also includes introducing a hydride, a halide or an organic compound of a third element, different than the first element, into the plasma, to recover the substrate covered with the coating comprising the first, second and third elements at the outlet of the device. The coating consists of metal nanoparticles of the second element dispersed in an inorganic matrix of the first and third elements. The coating displays a plasmon absorption peak in the visible region.

The invention discloses a method and an apparatus for drying and cooling a glass substrate. The method comprises the steps described below. The method delivers the glass substrate cleaned by a cleaner into a baking oven by a first roller device. It dries the glass substrate using an infrared heating plate installed in the baking oven. It delivers the dried glass substrate into a cooling chamber by a second roller device. It cools the dried glass substrate using a cooling plate installed in the cooling chamber. And it delivers the cooled glass substrate onto a platform of an air floating type coater, and coating the glass substrate. This invention also discloses an apparatus corresponding to the method. According to the embodiments of the present invention, it is possible to reduce the number of foreign particles on the glass substrate before coating, and the drying effect is excellent.

An article is described herein that includes: a glass, glass-ceramic or ceramic substrate comprising a primary surface; at least one of an optical film and a scratch-resistant film disposed over the primary surface; and an easy-to-clean (ETC) coating comprising a fluorinated material that is disposed over an outer surface of the at least one of an optical film and a scratch-resistant film. The at least one of an optical film and a scratch-resistant film comprises an average hardness of 10 GPa or more. Further, the outer surface of the at least one of an optical film and a scratch-resistant film comprises a surface roughness (R.sub.q) of less than 1.0 nm.

A method for manufacturing a laminated glazing includes a first and a second sheet of glass which are bonded together by an adhesive interlayer, that face of the first sheet of glass that faces toward the second including a first printed pattern; in which method the position of the first printed pattern is measured using a camera; a printing robot is positioned in a printing station relative to the measurement of the position of the first printed pattern and a second printed pattern is printed on the opposite face of the second sheet of glass from the first; and the sheets of glass are set down in a bending oven.