An enamel paste composition includes glass frit; a pigment; and an organic carrier medium; wherein the glass frit includes at least two glass frits including a first glass frit and a second glass frit, and wherein the first glass frit has a larger particle size and a higher glass transition temperature than the second glass frit. Also described is a method of forming an enamel coating by depositing the enamel paste composition on a substrate; and firing the enamel paste to form an enamel coating on the substrate, the enamel coating having a heterogeneous frit microstructure with particles of the first frit embedded in a matrix of second frit.

An enamel paste composition includes glass frit; a pigment; and an organic carrier medium; wherein the glass frit includes at least two glass frits including a first glass frit and a second glass frit, and wherein the first glass frit has a larger particle size and a higher glass transition temperature than the second glass frit. Also described is a method of forming an enamel coating by depositing the enamel paste composition on a substrate; and firing the enamel paste to form an enamel coating on the substrate, the enamel coating having a heterogeneous frit microstructure with particles of the first frit embedded in a matrix of second frit.

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of phosphorus pentoxide (P.sub.2O.sub.5); 5 to 20 wt % of one or more of lithium oxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF.sub.2), or aluminum fluoride (AlF.sub.3); 1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO); and 5 to 30 wt % of one or more of manganese dioxide (MnO.sub.2), molybdenum trioxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), or nickel oxide (NiO). The enamel composition may be cleaned without being putting it into water.

An enamel composition, a method for preparing an enamel composition, and a cooking appliance are provided. The enamel composition may include 15 to 50 wt % of phosphorus pentoxide (P.sub.2O.sub.5); 5 to 20 wt % of one or more of lithium oxide (Li.sub.2O), sodium oxide (Na.sub.2O), or potassium oxide (K.sub.2O); 1 to 5 wt % of one or more of sodium fluoride (NaF), calcium fluoride (CaF.sub.2), or aluminum fluoride (AlF.sub.3); 1 to 35 wt % of one or more of magnesium oxide (MgO), barium oxide (BaO), or calcium oxide (CaO); and 5 to 30 wt % of one or more of manganese dioxide (MnO.sub.2), molybdenum trioxide (MoO.sub.3), bismuth oxide (Bi.sub.2O.sub.3), or nickel oxide (NiO). The enamel composition may be cleaned without being putting it into water.

Modified copper chromite spinel pigments exhibit lower coefficients of thermal expansion than unmodified structures. Three methods exist to modify the pigments: (1) the incorporation of secondary modifiers into the pigment core composition, (2) control of the pigment firing profile, including both the temperature and the soak time, and (3) control of the pigment core composition.

The present invention relates to a glass-ceramic article comprising at least one substrate, such as a plate, made of glass-ceramic, said substrate being coated in at least one area with at least one enamel coating such that: 1) the enamel has a gloss at 60° of less than 40, 2) the coverage rate of said enamel in said area coated with said coating is 40 to 80%, 3) said enamel comprises pigments in the form of mica and/or aluminum oxide and/or silica particles coated with metal oxides or combinations of metal oxides, 4) said enamel has a roughness Ra greater than or equal to 0.4 μm, 5) said enamel has a roughness Rt greater than 4 μm.

Disclosed is an inkjet ink that is jettable through standard inkjet nozzles, yet creates a non-abrasive non-porous three-dimensional glass structure on a 1-100 micron-scale without the need for additional processes beyond those normally used for the inkjet decoration of glass substrates. Such an inkjet ink can avoid the drawbacks noted above and is described herein.

A method of making a display area and a glass tile as well as a display area that includes the glass tile. Prior to assembling the glass tile into the array, an edge treatment is performed on the glass tile, the edge treatment increasing an edge strength of the glass tile, as measured by the four point bend test, to at least about 200 MPa. The edge treatment can, for example, include at least one of plasma jet treatment and protective material application.

A method of making a display area and a glass tile as well as a display area that includes the glass tile. Prior to assembling the glass tile into the array, an edge treatment is performed on the glass tile, the edge treatment increasing an edge strength of the glass tile, as measured by the four point bend test, to at least about 200 MPa. The edge treatment can, for example, include at least one of plasma jet treatment and protective material application.

A mineral ink for inkjet printing on a mineral substrate, includes a glass frit, an organic solvent, a dispersant, a surfactant and a glass fit including the following constituents in the weight limits defined below expressed as percentages by weight of the glass frit: 35 to 50% of SiO.sub.2, 15 to 25% of Al.sub.2O.sub.3, 1.5 to 4% of Li.sub.2O, 22 to 32% of B.sub.2O.sub.3, 0 to 2% of Na.sub.2O, 2 to 5% of K.sub.2O, 1 to 5% of CaO, 1 to 4% of ZrO.sub.2.