A method for preparing an optically transparent, superomniphobic glass composition is described. In one aspect, the present disclosure provides a method for preparing a glass composition, including heating a borosilicate glass comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide to form a phase-separated glass comprising an interpenetrating network of silicon oxide domains and boron oxide domains. The method includes removing at least a portion of the boron oxide domains from the phase-separated glass and depositing a hydrophobic silane to provide a porous glass having a hydrophobic silane layer disposed on a portion of the surface thereof, a total pore volume of 15-50 vol. %, and an average pore diameter of 20-300 nm. The method includes, within at least a portion of the volume of the porous glass, forming an aerogel precursor, and converting at least a portion of the aerogel precursor to an aerogel.

A surface-treating agent including a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH═CH.sub.2 or —C≡CH, which is able to form a layer having higher alkaline resistance.

A surface-treating agent including a fluorine-containing compound having a carbon-carbon unsaturated bond at its molecular terminal as a group of —Y-A wherein Y is a single bond, an oxygen atom or a divalent organic group, and A is —CH═CH.sub.2 or —C≡CH, which is able to form a layer having higher alkaline resistance.

Glass substrates comprising an A-side upon which silicon thin film transistor devices can be fabricated and a B-side having a substantially homogeneous organic film thereon are described. The organic film includes a moiety that reduces voltage generation by contact electrification or triboelectrification. Methods of manufacturing the glass substrates and example devices incorporating the glass substrates are also described.

Glass substrates comprising an A-side upon which silicon thin film transistor devices can be fabricated and a B-side having a substantially homogeneous organic film thereon are described. The organic film includes a moiety that reduces voltage generation by contact electrification or triboelectrification. Methods of manufacturing the glass substrates and example devices incorporating the glass substrates are also described.

The present invention includes a mixed composition of an organosilicon compound (A) represented by formula (a1), an organosilicon compound (B) represented by formula (b1) and a curing inhibitor (C), and a mixed composition of the organosilicon compound (A) represented by formula (a1), the organosilicon compound (B) represented by formula (b1), the curing inhibitor (C) and water (D).

R.sup.a1—Si(X.sup.a1).sub.3  (a1)

Si(R.sup.b1).sub.b20(X.sup.b1).sub.4-b20  (b1)

The present invention includes a mixed composition of an organosilicon compound (A) represented by formula (a1), an organosilicon compound (B) represented by formula (b1) and a curing inhibitor (C), and a mixed composition of the organosilicon compound (A) represented by formula (a1), the organosilicon compound (B) represented by formula (b1), the curing inhibitor (C) and water (D).

R.sup.a1—Si(X.sup.a1).sub.3  (a1)

Si(R.sup.b1).sub.b20(X.sup.b1).sub.4-b20  (b1)

A treating liquid vaporizing apparatus includes a buffer tank for storing a treating liquid, a vaporizing container connected to the buffer tank for vaporizing the treating liquid, a further vaporizing container connected to the buffer tank in parallel with the vaporizing container for vaporizing the treating liquid, a switch valve for opening and closing a flow path of the treating liquid between the buffer tank and the vaporizing container, and a switch valve for opening and closing a flow path of the treating liquid between the buffer tank and the further vaporizing container.

A treating liquid vaporizing apparatus includes a buffer tank for storing a treating liquid, a vaporizing container connected to the buffer tank for vaporizing the treating liquid, a further vaporizing container connected to the buffer tank in parallel with the vaporizing container for vaporizing the treating liquid, a switch valve for opening and closing a flow path of the treating liquid between the buffer tank and the vaporizing container, and a switch valve for opening and closing a flow path of the treating liquid between the buffer tank and the further vaporizing container.

A fluorochemical surface treating agent comprising a hydrolyzable group-containing silane modified with a fluorooxyalkylene-containing polymer and/or a partial hydrolytic condensate thereof forms a water/oil repellent layer having chemical resistance and mar resistance.