Methods for preparing multi-layer optical laminates include placing an optical film that is free form an adhesive layer between first and second glass substrates that are free of an adhesive layer, placing this laminate under vacuum, and then heating the laminate under pressure to a temperature above the softening temperature of the optical film. The glass substrates are free of an adhesive layer but may include a silane surface treatment. The resulting multi-layer laminate is optically clear and does not show scattering of reflected light by the optical film.

Methods for preparing multi-layer optical laminates include placing an optical film that is free form an adhesive layer between first and second glass substrates that are free of an adhesive layer, placing this laminate under vacuum, and then heating the laminate under pressure to a temperature above the softening temperature of the optical film. The glass substrates are free of an adhesive layer but may include a silane surface treatment. The resulting multi-layer laminate is optically clear and does not show scattering of reflected light by the optical film.

A method of manufacture of an optical element for focusing electromagnetic radiation, comprising the steps of:•(a) providing a first light-transmissive glass substrate (20) having a front surface on which the electromagnetic radiation is incident in use and a back surface opposite to the front surface;•(b) applying a liquid silicone resin (30) to the back and/or the front surface of the glass substrate;•(c) contacting the liquid silicone resin with a mould such that the liquid silicone resin adopts the form of the mould and forms microstructures extending over the surface(s) of the glass substrate to which the liquid silicone resin has been applied;•(d) curing the liquid silicone resin to form a microstructured light-transmissive silicone coating wherein the glass surface has been

C roughened before application of the silicone.

A method of manufacture of an optical element for focusing electromagnetic radiation, comprising the steps of:•(a) providing a first light-transmissive glass substrate (20) having a front surface on which the electromagnetic radiation is incident in use and a back surface opposite to the front surface;•(b) applying a liquid silicone resin (30) to the back and/or the front surface of the glass substrate;•(c) contacting the liquid silicone resin with a mould such that the liquid silicone resin adopts the form of the mould and forms microstructures extending over the surface(s) of the glass substrate to which the liquid silicone resin has been applied;•(d) curing the liquid silicone resin to form a microstructured light-transmissive silicone coating wherein the glass surface has been

C roughened before application of the silicone.

A decorative glass element including a transparent glass substrate with an outer surface exposed to an outer environment and separated from an inner surface by a substrate thickness, a structured coating made of a transparent polymer that is applied over all or part of the inner surface of the transparent glass substrate to form a coated substrate and a structured free surface with an R.sub.Z roughness between 0.1 and 4 mm, and a base support coupled to the coated substrate with an interior surface facing with or without contact the free surface of the structured coating and protecting the free surface from direct access from the outer environment.

A decorative glass element including a transparent glass substrate with an outer surface exposed to an outer environment and separated from an inner surface by a substrate thickness, a structured coating made of a transparent polymer that is applied over all or part of the inner surface of the transparent glass substrate to form a coated substrate and a structured free surface with an R.sub.Z roughness between 0.1 and 4 mm, and a base support coupled to the coated substrate with an interior surface facing with or without contact the free surface of the structured coating and protecting the free surface from direct access from the outer environment.

As described herein, a polyimide chemical composition may be used for coating glass articles. According to embodiments, a coated glass article may include a glass container which may include a first surface and a second surface opposite the first surface, and a low-friction coating bonded to at least a portion of the first surface of the glass container. The low-friction coating may include a polyimide chemical composition. The polyimide chemical composition may be halogenated and the polyimide chemical composition may include a siloxane moiety.

As described herein, a polyimide chemical composition may be used for coating glass articles. According to embodiments, a coated glass article may include a glass container which may include a first surface and a second surface opposite the first surface, and a low-friction coating bonded to at least a portion of the first surface of the glass container. The low-friction coating may include a polyimide chemical composition. The polyimide chemical composition may be halogenated and the polyimide chemical composition may include a siloxane moiety.

A textured glass article that includes: a glass substrate comprising a thickness, a primary surface and a bulk composition at the midpoint of the thickness; and a textured region defined by the primary surface and comprising a textured region composition. The textured region comprises a sparkle of 2% or less. Further, the bulk composition comprises about 40 mol % to 80 mol % silica and the textured region composition comprises at least about 40 mol % silica.

A textured glass article that includes: a glass substrate comprising a thickness, a primary surface and a bulk composition at the midpoint of the thickness; and a textured region defined by the primary surface and comprising a textured region composition. The textured region comprises a sparkle of 2% or less. Further, the bulk composition comprises about 40 mol % to 80 mol % silica and the textured region composition comprises at least about 40 mol % silica.