Patent classifications
C03C17/42
Methods for preparing a superomniphobic coating
A method for preparing an optically transparent, superomniphobic coating on a substrate, such as an optical substrate, is disclosed. The method includes providing a glass layer disposed on a substrate, the glass layer having a first side adjacent the substrate and an opposed second side, the glass layer comprising 45-85 wt. % silicon oxide in a first glass phase and 10-40 wt. % boron oxide in a second glass phase, such that a glass layer has a composition in a spinodal decomposition region. The method further includes heating the second side of the glass layer to form a phase-separated portion of the layer, the phase-separated portion comprising an interpenetrating network of silicon oxide domains and boron oxide domains, and removing at least a portion of the boron oxide domains from the phase-separated portion to provide a graded layer disposed on the substrate. The graded layer has a first side disposed adjacent the substrate, the first side comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide, and opposite the first side, a porous second side comprising at least 45 wt. % silicon oxide and no more than 5 wt. % boron oxide.
TRANSPARENT SUBSTRATE PROVIDED WITH MULTILAYER FILM
A transparent substrate provided with a multilayer film includes: a transparent substrate having two main surfaces; and a multilayer film obtained by laminating a metal oxide layer and a silicon oxide layer in order on at least one of the main surfaces of the transparent substrate. SiO.sub.x in at least one silicon oxide layer in the multilayer film satisfies a relationship 1.55≤x<2.00. The multilayer film has a luminous transmittance of 20% to 89% and a resistance value of 10.sup.4 Ω/sq or higher. x in SiO.sub.x is a value determined by depth direction composition analysis in X-ray photoelectron spectroscopy (XPS) using argon ion sputtering. When the silicon oxide layer is an outermost layer, the value of x is determined excluding a point where a sputtering time is 0 minute.
Coated cover substrates and electronic devices including the same
In one or more embodiments disclosed herein, an electronic device may include a display device operable to project an image, a front cover substrate positioned over the display device and including a transparent material, and a protective coating disposed on at least a portion of the non-display area of the front cover substrate. The front cover substrate may include a display area over the display device and a non-display area around at least the perimeter of the front cover substrate. The protective coating may include an inorganic material. The protective coating may not be positioned over the display area.
Coated cover substrates and electronic devices including the same
In one or more embodiments disclosed herein, an electronic device may include a display device operable to project an image, a front cover substrate positioned over the display device and including a transparent material, and a protective coating disposed on at least a portion of the non-display area of the front cover substrate. The front cover substrate may include a display area over the display device and a non-display area around at least the perimeter of the front cover substrate. The protective coating may include an inorganic material. The protective coating may not be positioned over the display area.
TRANSPARENT SUBSTRATE WITH ANTI-REFLECTIVE FILM
An anti-reflective film-attached transparent substrate includes a transparent substrate having two main surfaces and, on at least one of the main surfaces, a multilayer film in which at least two layers having different refractive indices are laminated. At least one silicon oxide layer among the layers in the multilayer film has a moisture permeability of 300 g/m.sup.2/day or less.
Composition for forming water repellent film, water repellent film, substrate with water repellent film, and article
There are provided: a composition for forming a water repellent film that can form a water repellent film not only excellent in water repellency but also excellent in abrasion resistance, particularly in abrasion resistance evaluated under close-to-actual-use conditions where a light resistance test is combined; a water repellent film formed by using the composition for forming a water repellent film; a substrate with a water repellent film including the water repellent film provided on at least part of a substrate; and an article including the substrate with a water repellent film. The composition for forming a water repellent film contains, at a predetermined quantitative ratio of a hydrolyzable silane compound (1) having a perfluoroalkyl group and having no ether bond; and a compound (21) that has a poly(oxyfluoroalkylene) group and a plurality of hydrolyzable silyl groups with a specific structure and that has a number average molecular weight of 3000 or more.
Glass resin laminate, composite laminate, and manufacturing method thereof
To provide a glass resin laminate of the present invention, in which the glass substrate and the resin layer containing a TFE polymer are strongly laminated, is hardly warped and is excellent in the electrical properties, a composite laminate further having a metal foil, and methods for producing them. A glass resin laminate comprising a glass substrate 10 having an uneven surface 12 with an arithmetic mean roughness of at least 5 nm, and a resin layer containing a tetrafluoroethylene polymer in contact with the uneven surface 12, wherein the uneven surface 12 has specific convex portions 21 and 22 which narrow at at least a part of the root portion as compared with the tip portion.
Substrate Having a Burnable Coating Mask
A substrate having a burnable coating mask includes: a substrate having a first section and a second section; a mask coating layer over the first section of the substrate; and a functional coating layer over at least a portion of the mask coating layer and over the second section of the substrate. A method of segmenting a substrate having a layer thereover, a method of preparing a segmented substrate having a layer thereover, a segmented substrate, and a transparency are also disclosed.
FLEXIBLE DISPLAYING SUBSTRATE AND FABRICATING METHOD THEREOF, AND DISPLAYING DEVICE
A flexible displaying substrate includes: a first flexible film layer; a first barrier layer provided on a first surface of the first flexible film layer, and the first barrier layer is a constant-thickness film layer; a second barrier layer provided on one side of the first barrier layer away from the first flexible film layer; and a second flexible film layer is provided between the first barrier layer and the second barrier layer; wherein a surface of the second barrier layer closer to the first flexible film layer is provided with a slot, and a first orthographic projection of the second flexible film layer on the first flexible film layer and a second orthographic projection of the slot on the first flexible film layer at least partially overlap.
FLEXIBLE DISPLAYING SUBSTRATE AND FABRICATING METHOD THEREOF, AND DISPLAYING DEVICE
A flexible displaying substrate includes: a first flexible film layer; a first barrier layer provided on a first surface of the first flexible film layer, and the first barrier layer is a constant-thickness film layer; a second barrier layer provided on one side of the first barrier layer away from the first flexible film layer; and a second flexible film layer is provided between the first barrier layer and the second barrier layer; wherein a surface of the second barrier layer closer to the first flexible film layer is provided with a slot, and a first orthographic projection of the second flexible film layer on the first flexible film layer and a second orthographic projection of the slot on the first flexible film layer at least partially overlap.