Phosphate glasses and glass-ceramics exhibit a positive percent kill as measured by United States EPA Test Method for Efficacy of Copper Alloy Surfaces as a Sanitizer and/or have a CIELAB L* value below 35, CIELAB a* and b* values within 5 of zero.

A material platform with controllable emissivity and fabrication methods are provided that permit the manipulation of thermal radiation detection and IR signal modulation and can be adapted to a variety of uses including infrared camouflage, thermal IR decoys, thermo-reflectance imaging and IR signal modulation. The platform is a multilayer W.sub.xV.sub.1-xO.sub.2 film with different W doping levels (x values) and layer thicknesses, forming a graded W-doped construct. In WVO.sub.2 films with a total thickness <100 nm, the graded doping of W spreads the originally sharp metal-insulator phase transition (MIT) to a broad temperature range, greatly expanding the temperature window for emissivity modulation.

A toughenable glass article includes a glass and has a thickness of less than 100 μm and a cooling state which is such that, after chemical toughening to a depth of 30% of the thickness, the glass article has a relative thermal length change potential in a range from −1500 ppm to ≤0 ppm.

A method for producing rare earth metal-doped quartz glass includes the steps of (a) providing a blank of the rare earth metal-doped quartz glass, and (b) homogenizing the blank by softening the blank zone by zone in a heating zone and by twisting the softened zone along a rotation axis. Some rare earth metals, however, show a discoloration of the quartz glass, which hints at an unforeseeable and undesired change in the chemical composition or possibly at an inhomogeneous distribution of the dopants. To avoid this drawback and to provide a modified method which ensures the production of rare earth metal-doped quartz glass with reproducible properties, during homogenization according to method step (b), the blank is softened under the action of an oxidizingly acting or a neutral plasma.

The invention provides a novel method of coating the inside of a capillary with a polymeric material. The method can include introducing a catalyst-free solution of a monomer and initiator, wherein the monomer is present in about 1-10% (w/v) and the initiator is present in 0.1-1% (w/v), into a capillary and thermally initiating polymerization of the monomer thereby providing a capillary comprising an internal polymeric coating for separating, identifying, and quantifying components of an analyte.

A wafer including a glass substrate is provided. The glass substrate includes a first surface defining a plane and including a surface roughness R.sub.a of approximately 0.3 nm in an outer via region and a second surface. The glass substrate defines a plurality of vias extending from the first surface. The plurality of vias each include an entrance defined by the first surface.

A method for manufacturing an SiO.sub.2—TiO.sub.2 based glass upon a target by a direct method, includes a first process of preheating the target and a second process of growing an SiO.sub.2—TiO.sub.2 based glass ingot to a predetermined length upon the target which has been preheated, wherein the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature.

A method of modifying a substrate comprising an etching step comprising contacting one or more primary surfaces of a glass, glass-ceramic, or ceramic substrate with a solution for a time period of 20 minutes to 8 hours to generate one or more etched primary surfaces, the solution comprising over 10 percent by weight of one or more alkali hydroxides, the solution having a temperature within the range of 100° C. to 150° C., the substrate having a thickness between the primary surfaces that decreases during the time period by 5 μm to 100 μm at a rate of 2 μm per hour or greater. The solution of the etching step does not comprise hydrogen fluoride. The one or more alkali hydroxides of the solution of the etching step can be sodium hydroxide (NaOH), potassium hydroxide (KOH), or a combination of both sodium hydroxide and potassium hydroxide.

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.

A method of manufacturing a partially textured glass article that includes (a) providing partially textured mother glass substrate that includes a first main surface and a second main surface which are opposed to each other; (b) irradiating the first main surface of the glass substrate with a laser to form a separating line on the first main surface that defines contour lines and extends from the first main surface to the second main surface dividing the glass article from the glass substrate, the glass article being a size smaller than the mother glass substrate; and (c) separating the partially textured glass article is separated from the mother glass substrate by the separating line. The method allows cutting a large partially textured mother glass substrate, with high precision, into smaller articles of partially textured glass at a requested size.