A method for preparing an optically transparent, superomniphobic coating on a substrate, such as an optical substrate, is disclosed. The method includes providing a glass layer disposed on a substrate, the glass layer having a first side adjacent the substrate and an opposed second side, the glass layer comprising 45-85 wt. % silicon oxide in a first glass phase and 10-40 wt. % boron oxide in a second glass phase, such that a glass layer has a composition in a spinodal decomposition region. The method further includes heating the second side of the glass layer to form a phase-separated portion of the layer, the phase-separated portion comprising an interpenetrating network of silicon oxide domains and boron oxide domains, and removing at least a portion of the boron oxide domains from the phase-separated portion to provide a graded layer disposed on the substrate. The graded layer has a first side disposed adjacent the substrate, the first side comprising 45-85 wt. % silicon oxide and 10-40 wt. % boron oxide, and opposite the first side, a porous second side comprising at least 45 wt. % silicon oxide and no more than 5 wt. % boron oxide.

Disclosed herein are coated articles which may include a substrate and an optical coating that includes one or more layers of deposited material. At least a portion of the optical coating may include a residual compressive stress of more than 100 MPa. The coated article may include a strain-to-failure of 0.4% or more as measured by a Ring-on-Ring Tensile Testing Procedure. The optical coating may include a maximum hardness of 8 GPa or more and an average photopic transmission of 50% or greater.

A glass article is provided (and methods of making the same) that includes: a glass substrate comprising a thickness and a first primary surface; and a porosity-graded layer that extends from the first primary surface of the substrate to a first depth within the substrate. The first depth is from about 250 nm to about 3000 nm. The porosity-graded layer comprises a plurality of pores having an average pore size from about 5 nm to 100 nm. The article comprises a single-side average reflectance of less than 9% at an incident angle of 60 degrees across a spectrum from 350 nm to 2000 nm. Further, the porosity-graded layer comprises a surface porosity at the first primary surface and a bulk porosity at the first depth, the surface porosity greater than the bulk porosity.

Various embodiments herein relate to electrochromic devices and electrochromic device precursors, as well as methods and apparatus for fabricating such electrochromic devices and electrochromic device precursors. In certain embodiments, the electrochromic device or precursor may include one or more particular materials such as a particular electrochromic material and/or a particular counter electrode material. In various implementations, the electrochromic material includes tungsten titanium molybdenum oxide. In these or other implementation, the counter electrode material may include nickel tungsten oxide, nickel tungsten tantalum oxide, nickel tungsten niobium oxide, nickel tungsten tin oxide, or another material.

An article is described herein that includes: a substrate having a glass, glass-ceramic or a ceramic composition and comprising a primary surface; and a protective film disposed on the primary surface. The protective film comprises a thickness of greater than 1.5 microns and a maximum hardness of greater than 15 GPa at a depth of 500 nanometers, as measured on the film disposed on the substrate. Further, the protective film comprises a metal oxynitride that is graded such that an oxygen concentration in the film varies by 1.3 or more atomic %. In addition, the substrate comprises an elastic modulus less than an elastic modulus of the film.

One or more aspects of the disclosure pertain to an article including an optical film structure disposed on an inorganic oxide substrate, which may include a strengthened or non-strengthened substrate that may be amorphous or crystalline, such that the article exhibits scratch resistance and retains the same or improved optical properties as the inorganic oxide substrate, without the optical film structure disposed thereon. In one or more embodiments, the article exhibits an average transmittance of 85% or more, over the visible spectrum (e.g., 380 nm-780 nm). Embodiments of the optical film structure include aluminum-containing oxides, aluminum-containing oxy-nitrides, aluminum-containing nitrides (e.g., AlN) and combinations thereof. The optical film structures disclosed herein also include a transparent dielectric including oxides such as silicon oxide, germanium oxide, aluminum oxide and a combination thereof. Methods of forming such articles are also provided.

A layered structure for an organic light-emitting diode (OLED) device, the layered structure including a light-transmissive substrate and an internal extraction layer formed on one side of the light-transmissive substrate, in which the internal extraction layer includes (1) a scattering area containing scattering elements composed of solid particles and pores, the solid particles having a density that decreases as it goes away from the interface with the light-transmissive substrate, and the pores having a density that increases as it goes away from the interface with the light-transmissive substrate, and (2) a free area where no scattering elements are present, formed from the surface of the internal extraction layer, which is opposite to the interface, to a predetermined depth.

Methods and apparatus are provide for: a substrate having first and second opposing surfaces, and an elastic modulus; and layer(s) having a thickness between first and second opposing surfaces thereof, the first surface of the layer contacting the second surface of the substrate, forming an interface. The layer may exhibit one or more of: a first elastic modulus proximate to the first surface thereof and a second elastic modulus proximate to the second surface thereof, the second elastic modulus being substantially higher than the elastic modulus value, the first elastic modulus being lower than the elastic modulus of the substrate, the second elastic modulus being higher than the elastic modulus of the substrate, and the layer exhibiting an increasing elastic modulus gradient through the thickness thereof from the first elastic modulus to the second elastic modulus.

A coated article includes a substrate having a major surface, and an optical coating disposed on the major surface of the substrate. At least a portion of the optical coating includes a residual compressive stress of about 50 MPa or more. The coated article has strain-to-failure of about 0.5% or more as measured by a Ring-on-Ring Tensile Testing Procedure. The coated article has an average photopic transmission of about 80% or greater.

A method for preparing a laminate substrate for a light emitting device includes providing a glass substrate having a refraction index, at 550 nm, of between 1.45 and 1.65, coating a glass frit having a refractive index, at 550 nm, of at least 1.7 onto the glass substrate, firing the resulting frit coated glass substrate at a temperature above the Littleton temperature of the glass frit thereby forming a first high index enamel layer, coating a metal oxide layer onto the first high index enamel layer, and firing the resulting coated glass substrate at a temperature above the Littleton temperature of the glass frit, thereby making react the metal oxide with the underlying first high index enamel layer and forming a second high index enamel layer with a plurality of spherical voids embedded in the upper section of the second high index enamel layer near the interface with air.