Provided is a film-covered transparent base plate having an excellent aesthetic appearance even during turn-off of a light source. A film-covered transparent base plate 1includes a transparent base plate 2 and a light-absorbing film 3 provided on one principal surface 2a of the transparent base plate 2 and the light-absorbing film 3 includes a dielectric phase made of a material having a band gap of not less than 2.0 eV and not more than 2.7 eV and a metallic phase.

A method is provided for manufacturing ceramic glass, including sapphire glass, for use in display covers in smartphones, computers, and watches, as well as for use as substrates on which semiconductor films can be deposited for a wide range of electronic applications, including solar cells, LEDs, and FETs.

A method to deposit a layer of harder thin film substrate onto a softer substrate. In particular, the present invention provides a method to deposit a layer of sapphire thin film on to a softer substrate e.g. quartz, fused silica, silicon and (toughen) glass. This combination is better than pure sapphire substrate.

The disclosure relates to a metal nanowire structure. The metal nanowire structure includes a substrate and a metal nanowire film located on the substrate. The metal nanowire film includes a number of first metal nanowires parallel with and spaced from each other. A width of each of the plurality of first metal nanowires is in a range from about 0.5 nanometers to about 50 nanometers. Each of the plurality of first metal nanowires is a solid structure and consists of metal material.

A wavelength conversion element according to the invention includes: a base material; a wavelength conversion layer supported by one surface of the base material and containing a wavelength conversion material and an inorganic binder; a light transmitting layer provided in a side of the wavelength conversion layer opposite to the base material and made of an inorganic material; and an antireflection film provided in a side of the light transmitting layer opposite to the wavelength conversion layer.

The disclosure relates to a metal nanowire film. The metal nanowire film includes a substrate and a number of first metal nanowire bundles located on the substrate. The number of first metal nanowire bundles are parallel with and spaced from each other. Each of the number of first metal nanowire bundles includes a number of first metal nanowires parallel with each other. The first distance between adjacent two of the number of first metal nanowires is less than the second distance between adjacent two of the number of first metal nanowire bundles.

This disclosure relates to a method and an apparatus for sealing a double-walled glass tube in a vacuum-tight manner, in particular a production method for manufacturing of solar collectors. By means of a vacuum chamber, inside of which a holding element is fixed and inside of which a heating conductor is arranged, an electro-conductively heating and a subsequent deforming of the double-walled glass tube can be achieved. No additional materials, such as metallic auxiliary element, solders are required. A simple installation inside the vacuum chamber is possible and a minimum vacuum feedthrough for the power supply of a heating conductor is required. The direct heat transfer onto the double walled glass tube and a resulting quick process control allows to reliably seal a double-walled glass tube of a thermal solar collector under vacuum with simple means.

A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11 in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, and a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end. A solution including two or more kinds of materials including a first material (S1) and a second material (S2) having a higher vapor pressure (P2) than a vapor pressure (P1) of the Si is used as the coating agent 21. The coating agent 21 is ejected to the substrate in an atmosphere with a pressure higher than P1 and lower than P2.

A method for forming a thin film having durability at a low cost is provided. A film formation apparatus 1 is used in the film formation method. The apparatus 1 comprises a vacuum container 11 in which a substrate 100 is placed at a lower part, a vacuum pump 15 for exhaust inside the container 11, a storage container 23 for storing a coating agent 21 provided outside the container 11, and a nozzle having an ejection part 19 capable of ejecting the coating agent 21 at its one end. A solution including two or more kinds of materials is used as the coating agent 21. The solution is ejected to the substrate in an atmosphere at a pressure set based on vapor pressures of respective materials composing the solution.

The invention relates to a method for partially coating a surface of an object, comprising the following steps: (a) optional hydrophobization of the surface of the object; (b) partial application of (b1) a liquid and subsequent application of a powderous or granular substance or (b2) a solution or suspension of said powderous or granular substance in a liquid; (c) drying the surface to form spatially-delimited salt or powder crusts; (d) coating the surface with at least one layer of a metal or a metal compound; and (e) removing the salt or powder crusts that have been produced. The invention also relates to products that have been produced according to the claimed method.