C03C2218/34

METHOD FOR PROCESSING A TRANSPARENT COVER PLATE AND COVER PLATE

A method for processing a transparent cover plate for a flat body includes the following steps of providing the transparent cover plate having an outer side and an opposite inner side, wherein the transparent cover plate includes a structured area with a light-scattering structure, forming of at least one optical interference layer on a cover plate side including applying a mask to the transparent cover plate, wherein the mask does not cover a first area of a cover plate surface and covers a second area of the cover plate side, and the first area and the second area are arranged to overlap the structured area, the at least one optical interference layer is applied in overlap with the mask, and removing of the mask, whereby the at least one optical interference layer is also removed.

ARTICLES WITH PATTERNED COATINGS
20170217831 · 2017-08-03 ·

Embodiments of an article including a substrate and a patterned coating are provided. In one or more embodiments, when a strain is applied to the article, the article exhibits a failure strain of 0.5% or greater. Patterned coating may include a particulate coating or may include a discontinuous coating. The patterned coating of some embodiments may cover about 20% to about 75% of the surface area of the substrate. Methods for forming such articles are also provided.

Asymmetric chemical strengthening

Asymmetrically strengthened glass articles, methods for producing the same, and use of the articles in portable electronic device is disclosed. Using a budgeted amount of compressive stress and tensile stress, asymmetric chemical strengthening is optimized for the utility of a glass article. In some aspects, the strengthened glass article can be designed for reduced damage, or damage propagation, when dropped.

Coated articles and methods of making same

A coated substrate. The coated substrate includes a unitary substrate having a major surface. A first coating is applied to a first surface segment of the major surface. A second coating applied to a second surface segment of the major surface. The first coating is different than the second coating.

Manufacturing process and structure of edge-chamfered one-glass-solution touch panel
09766731 · 2017-09-19 · ·

A method for manufacturing an edge-chamfered OGS touch panel is disclosed. Before a pre-prepared glass substrate is subjected to etching, an upper lamination film and a lower lamination film are respectively laminated on upper and lower surfaces of the glass substrate. The upper lamination film is smaller than the lower lamination film so that when the upper lamination film is laminated on the surface of the glass substrate, an edge exposure zone is preserved on the glass substrate at a location adjacent to a substrate edge. When the substrate edge of the glass substrate is subjected to etching, a chamfered edge is formed on the touch operation surface of the glass substrate that is adjacent to the substrate edge.

GLASS ROLL PRODUCTION METHOD

A production method for a glass roll includes a start preparation step (S1) of feeding-out a first lead film (LF1) coupled to a starting end portion (GFa) of a first glass film (GF1) from an unwinding device (3) and allowing a winding device (8) to wind the first lead film (LF1 after passing of the first lead film (LF1) through a thermal film-forming device (4),). The start preparation step (S1) includes a temperature increasing step of causing the thermal film-forming device (4) to be increased in temperature to a film-forming temperature. The first glass film (GF1) reaches the thermal film-forming device (4) before the thermal film-forming device (4) is increased in temperature to the film-forming temperature.

2D & 3D RF Lumped Element Devices for RF System in a Package Photoactive Glass Substrates
20220239270 · 2022-07-28 ·

The present invention includes a method for creating a system-in-package in or on photodefinable glass including: providing a photodefinable glass substrate; masking a design layout comprising one or more structures to form one or more integrated lumped element devices as the system-in-package on or in a photodefinable glass substrate; transforming at least a portion of the photodefinable glass substrate to form a glass-crystalline substrate; etching the glass-crystalline substrate to form one or more channels in the glass-crystalline substrate; depositing, growing, or selectively etching a seed layer on a surface of the glass-crystalline substrate to enable electroplating of copper; and electroplating the copper to fill the one or more channels and to deposit copper on the surface of the photodefinable glass to form the one or more integrated lumped element devices.

Patterning of high refractive index glasses by plasma etching

Plasma etching processes for forming patterns in high refractive index glass substrates, such as for use as waveguides, are provided herein. The substrates may be formed of glass having a refractive index of greater than or equal to about 1.65 and having less than about 50 wt % SiO.sub.2. The plasma etching processes may include both chemical and physical etching components. In some embodiments, the plasma etching processes can include forming a patterned mask layer on at least a portion of the high refractive index glass substrate and exposing the mask layer and high refractive index glass substrate to a plasma to remove high refractive index glass from the exposed portions of the substrate. Any remaining mask layer is subsequently removed from the high refractive index glass substrate. The removal of the glass forms a desired patterned structure, such as a diffractive grating, in the high refractive index glass substrate.

METHOD FOR ISOLATING A CONDUCTIVE VIA FROM A GLASS SUBSTRATE

A method for isolating at least one conductive via from a surrounding glass substrate is provided. A support layer is formed over at least one surface of the glass substrate. Thereafter, the glass substrate is removed. As a result, the at least one conductive via can be analyzed without interference from the glass substrate.

CYLINDRICAL BASE, MASTER AND MASTER MANUFACTURING METHOD

Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base.