Patent classifications
C04B35/03
Dielectric film and electronic component
A dielectric film containing an alkaline earth metal oxide having a NaCl type crystal structure as a main component, wherein the dielectric film has a (111)-oriented columnar structure in a direction perpendicular to the surface of the dielectric film, and in a CuK X-ray diffraction chart of the dielectric film, a half width of the diffraction peak of (111) is in a range of from 0.3 to 2.0.
Geopolymer-binder system for fire concretes, dry fire concrete mix containing the binder system and also the use of the mix
An alkaline-activated binder system for fire concretes includes at least one mineral binder and a mineral activator which, in a mixture with water, form a curing geopolymer, where a combination of at least two magnesium components (Mg components) which give an alkaline reaction with water and react with the binder at different times to form a geopolymer is present as activator, where the magnesium components have a different reactivity in respect of atmospheric moisture and/or in respect of the binder. A dry fire concrete mix contains the binder system and the mix may be used in, for example, facilities in the steel industry.
Geopolymer-binder system for fire concretes, dry fire concrete mix containing the binder system and also the use of the mix
An alkaline-activated binder system for fire concretes includes at least one mineral binder and a mineral activator which, in a mixture with water, form a curing geopolymer, where a combination of at least two magnesium components (Mg components) which give an alkaline reaction with water and react with the binder at different times to form a geopolymer is present as activator, where the magnesium components have a different reactivity in respect of atmospheric moisture and/or in respect of the binder. A dry fire concrete mix contains the binder system and the mix may be used in, for example, facilities in the steel industry.
METHOD FOR TREATING REFRACTORY CERAMIC PRODUCTS, USE OF THE TREATED PRODUCTS, AND A REFRACTORY CERAMIC PRODUCT
A method for treating refractory ceramic products is described herein. The method includes providing a refractory ceramic product, comprising magnesia and at least one of the following salts: one or more alkali salts and one or more alkaline earth salts. The method also includes providing a water-based liquid, combining the refractory ceramic product with the liquid, and separating the refractory ceramic product and the liquid.
METHOD FOR TREATING REFRACTORY CERAMIC PRODUCTS, USE OF THE TREATED PRODUCTS, AND A REFRACTORY CERAMIC PRODUCT
A method for treating refractory ceramic products is described herein. The method includes providing a refractory ceramic product, comprising magnesia and at least one of the following salts: one or more alkali salts and one or more alkaline earth salts. The method also includes providing a water-based liquid, combining the refractory ceramic product with the liquid, and separating the refractory ceramic product and the liquid.
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
Provided are: a sintered oxide which achieves low carrier density and high carrier mobility when configured as an oxide semiconductor thin-film by using the sputtering method; and a sputtering target using the same. This sintered oxide contains indium, gallium and magnesium as oxides. It is preferable for the gallium content to be 0.20-0.45, inclusive, in terms of an atomic ratio (Ga/(In+Ga)), the magnesium content to be at least 0.0001 and less than 0.05 in terms of an atomic ratio (Mg/(In+Ga+Mg)), and the sintering to occur at 1,200-1,550 C., inclusive. An amorphous oxide semiconductor thin-film obtained by forming this sintered oxide as a sputtering target is capable of achieving a carrier density of less than 3.010.sup.18 cm.sup.3, and a carrier mobility of 10 cm.sup.2V.sup.1 sec.sup.1 or higher.
Oxide sintered body, sputtering target, and oxide semiconductor thin film obtained using sputtering target
Provided are: a sintered oxide which achieves low carrier density and high carrier mobility when configured as an oxide semiconductor thin-film by using the sputtering method; and a sputtering target using the same. This sintered oxide contains indium, gallium and magnesium as oxides. It is preferable for the gallium content to be 0.20-0.45, inclusive, in terms of an atomic ratio (Ga/(In+Ga)), the magnesium content to be at least 0.0001 and less than 0.05 in terms of an atomic ratio (Mg/(In+Ga+Mg)), and the sintering to occur at 1,200-1,550 C., inclusive. An amorphous oxide semiconductor thin-film obtained by forming this sintered oxide as a sputtering target is capable of achieving a carrier density of less than 3.010.sup.18 cm.sup.3, and a carrier mobility of 10 cm.sup.2V.sup.1 sec.sup.1 or higher.
METHOD FOR FORMING LAYERED DOUBLE HYDROXIDE DENSE MEMBRANE
Provided is a method of forming a layered double hydroxide (LDH) dense membrane on the surface of a porous substrate. The LDH dense membrane is composed of an LDH represented by the formula: M.sup.2+.sub.1-xM.sup.3+.sub.x(OH).sub.2A.sup.n.sub.x/n.Math.mH.sub.2O where M.sup.2+ represents a divalent cation. M.sup.3+ represents a trivalent cation, A.sup.n represents an n-valent anion, n is an integer of 1 or more, and x is 0.1 to 0.4. This method includes (a) providing a porous substrate, (b) evenly depositing, on the porous substrate, a nucleation material capable of providing a nucleus from which the crystal growth of the LDH starts; and (c) hydrothermally treating the porous substrate in an aqueous stock solution containing a constituent element of the LDH to form the LDH dense membrane on the surface of the porous substrate. The method of the present invention can form a highly-densified LDH membrane evenly on the surface of a porous substrate.
METHOD FOR FORMING LAYERED DOUBLE HYDROXIDE DENSE MEMBRANE
Provided is a method of forming a layered double hydroxide (LDH) dense membrane on the surface of a porous substrate. The LDH dense membrane is composed of an LDH represented by the formula: M.sup.2+.sub.1-xM.sup.3+.sub.x(OH).sub.2A.sup.n.sub.x/n.Math.mH.sub.2O where M.sup.2+ represents a divalent cation. M.sup.3+ represents a trivalent cation, A.sup.n represents an n-valent anion, n is an integer of 1 or more, and x is 0.1 to 0.4. This method includes (a) providing a porous substrate, (b) evenly depositing, on the porous substrate, a nucleation material capable of providing a nucleus from which the crystal growth of the LDH starts; and (c) hydrothermally treating the porous substrate in an aqueous stock solution containing a constituent element of the LDH to form the LDH dense membrane on the surface of the porous substrate. The method of the present invention can form a highly-densified LDH membrane evenly on the surface of a porous substrate.
LAYERED DOUBLE HYDROXIDE-CONTAINING COMPOSITE MATERIAL
Provided is a layered-double-hydroxide-containing composite material including a porous substrate and a functional layer disposed on and/or in the porous substrate, the functional layer containing a layered double hydroxide represented by the formula M.sup.2+.sub.1xM.sup.3+.sub.x(OH).sub.2A.sup.n.sub.x/n.mH.sub.2O, where M.sup.2+ represents a divalent cation, M.sup.3+ represents a trivalent cation, A.sup.n represents an n-valent anion, n is an integer of 1 or more, and x is 0.1 to 0.4, and the functional layer further containing sulfur (S) at the interface between the functional layer and the porous substrate and in the vicinity of the interface. In the LDH-containing composite material of the present invention, the LDH-containing functional layer disposed on and/or in the porous substrate exhibits significantly improved conductivity.