Articles may be protected against halide plasma, by applying a rare earth-containing glaze to the surface of the article. The glaze may be a coating comprising; 20 to 90 mol % SiO.sub.2, 0 to 60 mol % Al.sub.2O.sub.3, 10 to 80 mol % rare earth oxides and/or rare earth fluorides (REX), wherein SiO.sub.2+Al.sub.2O.sub.3+REX≥60 mol %.

An environmental barrier coating, comprising a substrate containing silicon; an environmental barrier layer applied to said substrate; said environmental barrier layer comprising a rare earth composition.

Process for treating a porous dental zirconia block with a coloring solution, the process comprising the steps of providing a porous dental zirconia block having two opposing surfaces, surface U and surface L, treating the upper surface U of the porous dental zirconia block with a coloring solution A.sub.1, wherein the coloring solution is provided with a volume VA.sub.1, turning the porous dental zirconia block around, treating the lower surface L with a coloring solution A.sub.2 which is provided with a volume VA.sub.2. wherein the coloring solutions A.sub.1 and A.sub.2 comprise a solvent and coloring ions, wherein the volume of at least one of the coloring solutions A.sub.1 or A.sub.2 is applied in portions, wherein the following condition is met: Vo=ΣV.sub.AX, with x≥2, with Vo being the overall amount of coloring solution used to infiltrate the porous dental zirconia block.

A coating method includes depositing a slurry including a coarsely particulate ceramic and a finely particulate ceramic on a base material configured with an oxide-based ceramics matrix composite such that a proportion of coarse particles decreases towards a surface of the base material; forming a bond coating by performing a heat treatment on the base material on which the slurry has been deposited; and forming a top coating by thermally spraying a ceramic onto the bond coating. The oxide-based ceramics matrix composite is an alumina silica type oxide-based ceramics matrix composite. The coarsely particulate ceramic and the finely particulate ceramic are alumina-based powder.

Provided is a ZrO.sub.2—CaO—C based refractory material which is capable of maintaining high adhesion resistance over a long period of time, while exhibiting significant slaking resistance, and suppressing self-fluxing, i.e., exhibiting corrosion-erosion resistance. The refractory material comprises a CaO—ZrO.sub.2 composition containing a CaO component in an amount of 40% by mass to 60% by mass, wherein a mass ratio of the CaO component to a ZrO.sub.2 component is 0.67 to 1.5, and wherein the CaO—ZrO.sub.2 composition includes a eutectic microstructure of CaO crystals and CaZrO.sub.3 crystals, wherein a width of each of the CaO crystals observable in a cross-sectional microstructure is 50 μm or less.

A ceramic joined body (1) includes: a pair of ceramic plates (2,3) that include a conductive material; and a conductive layer (4) and an insulating layer (5) that are interposed between the pair of ceramic plates (2, 3), a porosity at an interface between the pair of ceramic plates (2, 3) and the insulating layer (5) is 4% or less, and a ratio of an average primary particle diameter of an insulating material which forms the insulating layer (5) to an average primary particle diameter of an insulating material which forms the ceramic plates (2, 3) is more than 1.

A method for forming a high temperature coating includes applying carbon powder to a surface of a carbon/carbon (C/C) composite substrate to force the carbon powder into one or more surface voids of the surface of the C/C composite substrate. The carbon powder has a substantially same composition and morphology as a surface portion of the C/C composite substrate. The method includes applying a metal slurry to the surface of the C/C composite substrate following the application of the carbon powder and reacting a metal of the metal slurry with carbon of the carbon powder and carbon of the surface portion of the C/C composite substrate to form a metal-rich antioxidant layer of a metal carbide on the C/C composite substrate.

Disclosed is a sanitary ware having not only a practical antivirus property but also a property which allows a pollution to be difficultly attached to, and to be easily removed from the sanitary ware. A sanitary ware comprising a pottery substrate and a glaze layer formed on a surface of the pottery substrate, wherein the glaze layer contains a metal element as an antivirus agent, and the metal element is present in a state of a spinodal phase separation in at least a surface region of the glaze layer, has a practical antivirus property as well as a property which allows a pollution to be difficultly attached to, and to be easily removed from, the sanitary ware.

Disclosed is a sanitary ware having not only a practical antivirus property but also a property which allows a pollution to be difficultly attached to, and to be easily removed from the sanitary ware. A sanitary ware comprising a pottery substrate and a glaze layer formed on a surface of the pottery substrate, wherein the glaze layer contains a metal element as an antivirus agent, and the metal element is present in a state of a spinodal phase separation in at least a surface region of the glaze layer, has a practical antivirus property as well as a property which allows a pollution to be difficultly attached to, and to be easily removed from, the sanitary ware.

A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 μm or more and 0.1 μm or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 μm or more and 48 μm or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.