A ceramic composite material and a method for producing same. The ceramic composite material has a ceramic matrix comprising zirconium oxide and at least one secondary phase dispersed therein. The matrix is composed of zirconium oxide as at least 51 vol.-% of composite material, and the secondary phase is in a proportion of 1 to 49 vol.-% of composite material, wherein 90 to 99% of the zirconium oxide is present in the tetragonal phase based on the total zirconium oxide portion. The tetragonal phase of the zirconium oxide is stabilized by at least one member selected from the group consisting of chemical stabilization and mechanical stabilization. The ceramic composite is damage-tolerant.

We describe an apparatus for controlling a thickness of a workpiece element, the apparatus comprising: a lapping machine having a lapping plate; and a holder to hold a workpiece element; wherein said holder comprises: a workpiece element mount to mount a workpiece element to be lapped such that a surface of said workpiece element lies substantially flush with a lower face of said holder; an adjustable actuator to controllably move said surface of said workpiece element so that it remains substantially flush or projects beyond said lower face of said holder during lapping; means for urging said holder towards said lapping plate; and a sensor for sensing a displacement of the workpiece element towards said lapping plate.

Specific organometallic compounds of Formula I: Q.sub.x-Sn-(A.sup.1R.sup.1′.sub.z).sub.4-x or Formula II: Sn(NR.sup.2(CH.sub.2).sub.nA.sup.2).sub.2 useful for the deposition of high purity tin oxide, as well as methods of using such compounds are disclosed. Also disclosed are compositions of organometallic compounds useful for the deposition of high purity tin oxide that in combination improve stability. Also disclosed are processes for dry etching tin oxide with a particular etchant gas and/or a process for dry etching a substrate using a particular etchant gas with a specific additive.

The present invention relates to a kit of parts comprising a dental mill blank comprising a porous zirconia material and a colouring solution for colouring the porous zirconia material. The porous zirconia material comprises Zr oxide calculated as ZrO2: from 80 to 97 wt.-%, Al oxide calculated as Al2O3: from 0 to 0.15 wt.-%, Y oxide calculated as Y2O3: from 1 to 10 wt.-%, Bi oxide calculated as Bi2O3: from 0.01 to 0.2 wt.-%, the porous zirconia material not comprising Fe calculated as Fe2O3 in an amount of more than 0.01 wt.-%, wt.-% with respect to the weight of the porous zirconia material. The colouring solution comprises solvent(s), colouring agent(s) comprising metal ions selected from Tb, Er, Pr, Mn or combinations thereof, the solution not comprising Fe ions in an amount of more than 0.01 wt.-%, the solution not comprising Bi ions in an amount of more than 0.01 wt.-%, wt.-% with respect to the weight of the colouring solution. The invention also relates to a process of producing a dental restoration, the process comprising the steps: providing a dental mill blank comprising a porous zirconia material as described in any of the preceding claims, machining an article out of the porous zirconia material, the article having the shape of a dental restoration with an outer and inner surface, providing a colouring solution as described in any of the preceding claims, applying the colouring solution to at least portions of the surface of the article having the shape of a dental restoration.

The present invention relates to a kit of parts comprising a dental mill blank comprising a porous zirconia material and a colouring solution for colouring the porous zirconia material. The porous zirconia material comprises Zr oxide calculated as ZrO2: from 80 to 97 wt.-%, Al oxide calculated as Al2O3: from 0 to 0.15 wt.-%, Y oxide calculated as Y2O3: from 1 to 10 wt.-%, Bi oxide calculated as Bi2O3: from 0.01 to 0.2 wt.-%, the porous zirconia material not comprising Fe calculated as Fe2O3 in an amount of more than 0.01 wt.-%, wt.-% with respect to the weight of the porous zirconia material. The colouring solution comprises solvent(s), colouring agent(s) comprising metal ions selected from Tb, Er, Pr, Mn or combinations thereof, the solution not comprising Fe ions in an amount of more than 0.01 wt.-%, the solution not comprising Bi ions in an amount of more than 0.01 wt.-%, wt.-% with respect to the weight of the colouring solution. The invention also relates to a process of producing a dental restoration, the process comprising the steps: providing a dental mill blank comprising a porous zirconia material as described in any of the preceding claims, machining an article out of the porous zirconia material, the article having the shape of a dental restoration with an outer and inner surface, providing a colouring solution as described in any of the preceding claims, applying the colouring solution to at least portions of the surface of the article having the shape of a dental restoration.

Provided herein is a method for forming a periodic microstructure on a surface of zirconia-based ceramics, which are not easily mechanically workable, without causing thermal adverse effects. A zirconia-based ceramic having a surface periodic microstructure is also provided. A linearly or circularly polarized laser beam is irradiated to a zirconia-based ceramic surface, and periodic irregularities are formed in a spot of the laser beam. Stripe-pattern irregularities parallel to the direction of polarization can be formed in a spot of a laser beam by irradiating a linearly polarized ultrashort pulsed-laser beam to a zirconia-based ceramic surface. A mesh-like raised region and a dot-like recessed region can be periodically formed by irradiating a circularly polarized ultrashort pulsed-laser beam to a ceramic surface.

Provided herein is a method for forming a periodic microstructure on a surface of zirconia-based ceramics, which are not easily mechanically workable, without causing thermal adverse effects. A zirconia-based ceramic having a surface periodic microstructure is also provided. A linearly or circularly polarized laser beam is irradiated to a zirconia-based ceramic surface, and periodic irregularities are formed in a spot of the laser beam. Stripe-pattern irregularities parallel to the direction of polarization can be formed in a spot of a laser beam by irradiating a linearly polarized ultrashort pulsed-laser beam to a zirconia-based ceramic surface. A mesh-like raised region and a dot-like recessed region can be periodically formed by irradiating a circularly polarized ultrashort pulsed-laser beam to a ceramic surface.

A method for etching a light absorbing material permits directly writing a pattern of etching of silicon nitride and other light absorbing materials, without the need of a lithographic mask, and allows the creation of etched features of less than one micron in size. The method can be used for etching deposited silicon nitride films, freestanding silicon nitride membranes, and other light absorbing materials, with control over the thickness achieved by optical feedback. The etching is promoted by solvents including electron donor species, such as chloride ions. The method provides the ability to etch silicon nitride and other light absorbing materials, with fine spatial and etch rate control, in mild conditions, including in a biocompatible environment. The method can be used to create nanopores and nanopore arrays.

A method of manufacturing a metal-coated member includes: providing a composite ceramic member including a ceramic part, and a connection part connected to the ceramic part; disposing a precious metal layer on a surface region that includes at least a portion of a surface of the ceramic part and a portion of a surface of the connection part, the precious metal layer including a precious metal; and removing at least a portion of the precious metal layer that is on the surface of the ceramic part and delineated by the boundary between the ceramic part and the connection part. The connection part has stronger adhesion to the precious metal than the ceramic part.

Tin oxide films are used as mandrels in semiconductor device manufacturing. In one implementation the process starts by providing a substrate having a plurality of protruding tin oxide features (mandrels) residing on an exposed etch stop layer. Next, a conformal layer of spacer material is formed both on the horizontal surfaces and on the sidewalls of the mandrels. The spacer material is then removed from the horizontal surfaces exposing the tin oxide material of the mandrels, without fully removing the spacer material residing at the sidewalls of the mandrel (e.g., leaving at least 50%, such as at least 90% of initial height at the sidewall). Next, mandrels are selectively removed (e.g., using hydrogen-based etch chemistry), while leaving the spacer material that resided at the sidewalls of the mandrels. The resulting spacers can be used for patterning the etch stop layer and underlying layers.