An environmental barrier coating, comprising a substrate containing silicon; an environmental barrier layer applied to the substrate; the environmental barrier layer comprising an oxide matrix; an oxidant getter phase interspersed throughout the oxide matrix; and a self-healing phase interspersed throughout the oxide matrix.

An environmental barrier coating, comprising a substrate containing silicon; an environmental barrier layer applied to the substrate; the environmental barrier layer comprising an oxide matrix; an oxidant getter phase interspersed throughout the oxide matrix; and a self-healing phase interspersed throughout the oxide matrix.

An environmental barrier coating includes a barrier layer which includes a matrix, diffusive particles, and gettering particles; and a calcium-magnesia alumina-silicate (CMAS)-resistant component. The CMAS-resistant component includes hafnium silicate and a rare earth hafnate. An article and a method of fabricating an article are also disclosed.

An environmental barrier coating includes a barrier layer which includes a matrix, diffusive particles, and gettering particles; and a calcium-magnesia alumina-silicate (CMAS)-resistant component. The CMAS-resistant component includes hafnium silicate and a rare earth hafnate. An article and a method of fabricating an article are also disclosed.

Methods for forming a coated component, along with the resulting coated components, are provided. The method may include forming a silicon-based bond coating on a surface of a substrate and forming a barrier coating on the silicon-based bond coating. The silicon-based bond coating comprises columnar grains of crystalline silicon. Chemical vapor depositing (CVD) may be used to form the silicon-based bond coating through CVD of a silicon-containing precursor at a deposition temperature and deposition pressure that causes crystallization of the silicon material during the deposition of the silicon-based bond coating. The silicon-containing precursor may be silane, monochlorosilane, dichlorosilane, and/or trichlorosilane.

Methods for forming a coated component, along with the resulting coated components, are provided. The method may include forming a silicon-based bond coating on a surface of a substrate and forming a barrier coating on the silicon-based bond coating. The silicon-based bond coating comprises columnar grains of crystalline silicon. Chemical vapor depositing (CVD) may be used to form the silicon-based bond coating through CVD of a silicon-containing precursor at a deposition temperature and deposition pressure that causes crystallization of the silicon material during the deposition of the silicon-based bond coating. The silicon-containing precursor may be silane, monochlorosilane, dichlorosilane, and/or trichlorosilane.

An environmental barrier coating, comprising a substrate containing silicon; an environmental barrier layer applied to said substrate; said environmental barrier layer comprising a rare earth composition.

An environmental barrier coating, comprising a substrate containing silicon; an environmental barrier layer applied to said substrate; said environmental barrier layer comprising a rare earth composition.

A method for fabricating multi-layer ceramic broadband radome includes thermal-spraying layers of coating materials on the radome. The assembled structure exhibits tuned RF transparency response depending on the thickness and the dielectric constant of the deposited layers. Sub-micron thick ceramic layers, which are essential for broadband performance and hard to produce due to their fragile nature, can be deposited on big and complex objects by a fast and automated process.

A method for fabricating multi-layer ceramic broadband radome includes thermal-spraying layers of coating materials on the radome. The assembled structure exhibits tuned RF transparency response depending on the thickness and the dielectric constant of the deposited layers. Sub-micron thick ceramic layers, which are essential for broadband performance and hard to produce due to their fragile nature, can be deposited on big and complex objects by a fast and automated process.