Patent classifications
C07C15/50
Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound
A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R.sup.1, R.sup.2 and R.sup.3 each independently represent a group represented by the formula (a). In the formula (a), R.sup.A represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. R.sup.B represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring. ##STR00001##
Polyether compound, method for preparing same and photoresist composition
A polyether compound which is as shown in Formula (I), wherein R.sub.1 is a polyether backbone of the polyether polyol; R.sub.2 is hydrogen or C.sub.1C.sub.5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage. ##STR00001##
Polyether compound, method for preparing same and photoresist composition
A polyether compound which is as shown in Formula (I), wherein R.sub.1 is a polyether backbone of the polyether polyol; R.sub.2 is hydrogen or C.sub.1C.sub.5 alkyl; n is 3, 4 or 5. Furthermore, a photoresist composition comprising the polyether compound is disclosed. This photoresist composition is used to make the colored layer in a colored film substrate, in which the polymer film layer thus obtained has a small edge slope angle and is not prone to light leakage. ##STR00001##
Compound, mixture, curable resin composition and cured product thereof, and method for producing compound
A compound of formula 1: ##STR00001##
where X and Y are each a different optional organic group. When there is a plurality of X, each X in the plurality of X may be the same as or different from each other. When there is a plurality of Y, each Y in the plurality of Y may be the same as or different from each other. R represents a hydrocarbon group having 1 to 10 carbon atoms or a halogenated alkyl group. When there is a plurality of R, each R in the plurality of R may be the same as or different from each other. Variable m is an integer of 0 to 3, n is a repeating unit and satisfies 1n20, and p is a repeating unit and satisfies 0p20.