An azeotropic or quasi-azeotropic composition including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more (hydro)halocarbon compounds including 1 to 3 carbon atoms. The (hydro) halocarbon compounds are preferably selected among tetrachlorofluoropropanes, trichlorodifluoropropanes, dichlorotrifluoropropanes, chlorotetrafluoropropanes, pentafluoropropanes, dichlorodifluoropropenes, chlorotrifluoropropenes and tetrafluoropropenes. A process for producing a main (hydro)halocarbon compound, including the formation of a mixture of compounds including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more other (hydro)halocarbon compounds, distillation of this mixture making it possible to collect, firstly, an azeotropic composition, and, secondly, at least one of the compounds of the mixture.

An azeotropic or quasi-azeotropic composition including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more (hydro)halocarbon compounds including 1 to 3 carbon atoms. The (hydro) halocarbon compounds are preferably selected among tetrachlorofluoropropanes, trichlorodifluoropropanes, dichlorotrifluoropropanes, chlorotetrafluoropropanes, pentafluoropropanes, dichlorodifluoropropenes, chlorotrifluoropropenes and tetrafluoropropenes. A process for producing a main (hydro)halocarbon compound, including the formation of a mixture of compounds including hydrogen fluoride, Z-3,3,3-trifluoro-1-chloropropene and one or more other (hydro)halocarbon compounds, distillation of this mixture making it possible to collect, firstly, an azeotropic composition, and, secondly, at least one of the compounds of the mixture.

The invention relates to a process for the preparation of compound of formula (I) wherein R.sub.1 is halogen and R.sub.2 is halogen or hydrogen; comprising a) reacting the compound of formula (II) in an aprotic organic solvent in the presence of an aprotic polar co-solvent with a magnesium amide base followed by a halogenating agent, to the compound of formula I wherein R.sub.1 is halogen and R.sub.2 is hydrogen, and b) reacting the compound of formula (I), wherein R.sub.1 is chloro and R.sub.2 is hydrogen, in an aprotic organic solvent in the presence of an aprotic polar co-solvent with a magnesium amide base followed by a halogenating agent to a compound of formula I, wherein R.sub.1 is chloro and R.sub.2 is halogen.

##STR00001##

The invention relates to a process for the preparation of compound of formula (I) wherein R.sub.1 is halogen and R.sub.2 is halogen or hydrogen; comprising a) reacting the compound of formula (II) in an aprotic organic solvent in the presence of an aprotic polar co-solvent with a magnesium amide base followed by a halogenating agent, to the compound of formula I wherein R.sub.1 is halogen and R.sub.2 is hydrogen, and b) reacting the compound of formula (I), wherein R.sub.1 is chloro and R.sub.2 is hydrogen, in an aprotic organic solvent in the presence of an aprotic polar co-solvent with a magnesium amide base followed by a halogenating agent to a compound of formula I, wherein R.sub.1 is chloro and R.sub.2 is halogen.

##STR00001##

The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.

The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.

The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.

The present disclosure provides high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze). More specifically, the present disclosure provides E-1,3,3,3-tetrafluoropropene (HFO-234ze) in at least 99.99% purity, containing less than 3 ppm 1,1,3,3,3-pentafluoropropene (HFO-1225zc). The present disclosure further provides a method of making high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze).

The present disclosure provides high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze). More specifically, the present disclosure provides E-1,3,3,3-tetrafluoropropene (HFO-234ze) in at least 99.99% purity, containing less than 3 ppm 1,1,3,3,3-pentafluoropropene (HFO-1225zc). The present disclosure further provides a method of making high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze).

The present disclosure provides high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze). More specifically, the present disclosure provides E-1,3,3,3-tetrafluoropropene (HFO-234ze) in at least 99.99% purity, containing less than 3 ppm 1,1,3,3,3-pentafluoropropene (HFO-1225zc). The present disclosure further provides a method of making high purity E-1,3,3,3-tetrafluoropropene (HFO-1234ze).