A fire suppression composition comprises CF.sub.3I and CO.sub.2, wherein said CF.sub.3I is present in an amount of from 23 mol. % to 39 mol. %, based on the total moles of CF.sub.3I and CO.sub.2 present in the fire suppression composition. Alternatively, the fire suppression composition comprises CF.sub.3I and CO.sub.2, wherein said CF.sub.3I is present in an amount of from 53 mol. % to 85 mol. %, based on the total moles of CF.sub.3I and CO.sub.2 present in the fire suppression composition.

A dry etching method according to one embodiment of the present disclosure includes plasmatizing a dry etching agent and etching a silicon oxide or a silicon nitride with the plasmatized dry etching agent, wherein the dry etching agent comprises CF.sub.3I and a C2-C3 fluorine-containing linear nitrile compound, and wherein the concentration of the C2-C3 fluorine-containing linear nitrile compound relative to the CF.sub.3I is higher than or equal to 1 vol. ppm and lower than or equal to 1 vol %.

The present disclosure provides a composition including trifluoroacetyl iodide, at least one organic impurity and at least one inorganic impurity. The at least one organic impurity includes at least one of: difluoroiodomethane, pentafluoroiodoethane, iodomethane, iodopropane, dichlorotetrafluoroethane, dichlorotrifluoroethane, trichlorotrifluoroethane, methyltrifluoroacetate, trifluoroacetic anhydride, difluorobutane and methyl propane. The at least one inorganic impurity includes at least one of: hydrogen iodide, hydrogen chloride, iodine and hydrogen triiodide.

The present disclosure provides a composition including trifluoroacetyl iodide, at least one organic impurity and at least one inorganic impurity. The at least one organic impurity includes at least one of: difluoroiodomethane, pentafluoroiodoethane, iodomethane, iodopropane, dichlorotetrafluoroethane, dichlorotrifluoroethane, trichlorotrifluoroethane, methyltrifluoroacetate, trifluoroacetic anhydride, difluorobutane and methyl propane. The at least one inorganic impurity includes at least one of: hydrogen iodide, hydrogen chloride, iodine and hydrogen triiodide.

A method of producing trifluoroiodomethane (CF.sub.3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI), passing the feedstock through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI.sub.3) and iodine (I.sub.2) from the feedstock, and providing the feedstock to a reactor to produce a trifluoroiodomethane product stream.

Another method of producing trifluoroiodomethane (CF3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI) to a reactor to produce a trifluoroiodomethane product stream, and passing the trifluoroiodomethane product stream from the reactor through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI3) and iodine (I2) from the trifluoroiodomethane product stream.

A method of producing trifluoroiodomethane (CF.sub.3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI), passing the feedstock through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI.sub.3) and iodine (I.sub.2) from the feedstock, and providing the feedstock to a reactor to produce a trifluoroiodomethane product stream.

Another method of producing trifluoroiodomethane (CF3I) includes providing a feedstock comprising trifluoroacetyl iodide (TFAI) to a reactor to produce a trifluoroiodomethane product stream, and passing the trifluoroiodomethane product stream from the reactor through at least one column charged with carbonaceous materials to remove hydrogen iodide (HI), hydrogen triiodide (HI3) and iodine (I2) from the trifluoroiodomethane product stream.

Heterogeneous azeotrope or azeotrope-like compositions comprising trifluoroiodomethane (CF.sub.3I) and water which may include from about 47.7 wt. % to about 99.0 wt. % trifluoroiodomethane (CF.sub.3I) and from about 1.0 wt. % to about 52.3 wt. % water and having a boiling point between about 18.0° C. and about 19.0° C. at a pressure of between about 58.0 psia and about 60.0 psia. The azeotrope or azeotrope-like compositions may be used to separate impurities from trifluoroiodomethane (CF.sub.3I).

Heterogeneous azeotrope or azeotrope-like compositions comprising trifluoroiodomethane (CF.sub.3I) and water which may include from about 47.7 wt. % to about 99.0 wt. % trifluoroiodomethane (CF.sub.3I) and from about 1.0 wt. % to about 52.3 wt. % water and having a boiling point between about 18.0° C. and about 19.0° C. at a pressure of between about 58.0 psia and about 60.0 psia. The azeotrope or azeotrope-like compositions may be used to separate impurities from trifluoroiodomethane (CF.sub.3I).

The present disclosure addresses the problem of providing a novel method for producing a fluorinated iodinated organic compound.

The problem can be solved by a method for producing a fluorinated iodinated organic compound, comprising reacting a compound represented by formula (1):

##STR00001##

wherein R.sup.1 and R.sup.2 are each independently a hydrogen atom, a halogen atom, or an organic group, or R.sup.1 and R.sup.2 optionally form a ring together with the two adjacent carbon atoms; and n is 1 or 2, with a fluorine source, an iodine source, and an oxidizing agent or radical generator to add fluorine and iodine to the double bond or triple bond.

The present disclosure addresses the problem of providing a novel method for producing a fluorinated iodinated organic compound.

The problem can be solved by a method for producing a fluorinated iodinated organic compound, comprising reacting a compound represented by formula (1):

##STR00001##

wherein R.sup.1 and R.sup.2 are each independently a hydrogen atom, a halogen atom, or an organic group, or R.sup.1 and R.sup.2 optionally form a ring together with the two adjacent carbon atoms; and n is 1 or 2, with a fluorine source, an iodine source, and an oxidizing agent or radical generator to add fluorine and iodine to the double bond or triple bond.