The present invention relates to a cost-effective and efficient method for preparing treprostinil with high purity, and an intermediate therefor.

The present invention relates to a cost-effective and efficient method for preparing treprostinil with high purity, and an intermediate therefor.

Compounds and methods are provided for one-step functionalization of disulfide bonds in proteins.

The present invention relates in particular to a mixture comprising the compound of formula (Ia) as described herein, wherein the mixture is free or essentially free of the compound of formula (Ib) as described herein, preferably of the compounds of formulae (Ib) and furthermore (Ic) and/or (Id) as described herein. The invention further relates to a method for manufacturing said mixture, fragrance substance compositions containing or consisting of said mixture, perfumed products containing said mixtures or fragrance substance compositions, and various methods and uses for imparting, modifying and/or enhancing certain odour notes.

The present invention relates in particular to a mixture comprising the compound of formula (Ia) as described herein, wherein the mixture is free or essentially free of the compound of formula (Ib) as described herein, preferably of the compounds of formulae (Ib) and furthermore (Ic) and/or (Id) as described herein. The invention further relates to a method for manufacturing said mixture, fragrance substance compositions containing or consisting of said mixture, perfumed products containing said mixtures or fragrance substance compositions, and various methods and uses for imparting, modifying and/or enhancing certain odour notes.

In various embodiments, the present invention is directed to new low cost initiator compositions for use with the production of well-defined telechelic PIBs (by LC.sup.+P of isobutylene). In various other embodiments, the present invention is directed to methods for using these novel compositions as initiators for isobutylene (IB) and other cationically polymerizable monomers, such as styrene and its derivatives. In still other embodiments, the present invention is directed to structurally new, allyl (and chlorine) telechelic PIBs formed from these new initiator compositions and their derivatives (in particular, hydroxyl telechelic PIB and amine telechelic PIB). In yet other embodiments, the present invention is directed to structurally new polyurethanes, polyureas, and polyurethane ureas made using telechelic PIBs formed from these new initiator compositions.

Treprostinil is a synthetic prostacyclin derivative with thrombocyte aggregation inhibitory and vasodilatory activity. Treprostinil can be administered in subcutaneous, intravenous, inhalable, or oral forms. Disclosed is a method for the preparation of treprostinil of formula I and its amorphous form, anhydrate form, monohydrate form, and polyhydrate form salts with bases. In the disclosed method, the chiral center in the 3-hydroxyoctyl substituent is formed at the end of the synthesis, so that the method is robust and well scalable.

##STR00001##

Also disclosed are treprostinil intermediates and the preparation of the intermediates.

Treprostinil is a synthetic prostacyclin derivative with thrombocyte aggregation inhibitory and vasodilatory activity. Treprostinil can be administered in subcutaneous, intravenous, inhalable, or oral forms. Disclosed is a method for the preparation of treprostinil of formula I and its amorphous form, anhydrate form, monohydrate form, and polyhydrate form salts with bases. In the disclosed method, the chiral center in the 3-hydroxyoctyl substituent is formed at the end of the synthesis, so that the method is robust and well scalable.

##STR00001##

Also disclosed are treprostinil intermediates and the preparation of the intermediates.

A composition for resist underlayer film formation contains a compound having a group represented by formula (1), and a solvent. R.sup.1 represents an organic group having 2 to 10 carbon atoms and having a valency of (m+n), wherein the carbon atoms include two carbon atoms that are adjacent to each other, with a hydroxy group or an alkoxy group bonding to one of the two carbon atoms, and with a hydrogen atom bonding to another of the two carbon atoms; L.sup.1 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group; R.sup.2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; n is an integer of 1 to 3; * denotes a bonding site to a moiety other than the group represented by the formula (1) in the compound; and m is an integer of 1 to 3.

##STR00001##

A composition for resist underlayer film formation contains a compound having a group represented by formula (1), and a solvent. R.sup.1 represents an organic group having 2 to 10 carbon atoms and having a valency of (m+n), wherein the carbon atoms include two carbon atoms that are adjacent to each other, with a hydroxy group or an alkoxy group bonding to one of the two carbon atoms, and with a hydrogen atom bonding to another of the two carbon atoms; L.sup.1 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group; R.sup.2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; n is an integer of 1 to 3; * denotes a bonding site to a moiety other than the group represented by the formula (1) in the compound; and m is an integer of 1 to 3.

##STR00001##