The present disclosure relates to a variety of DHPP-based electrochromes. Such electrochromes include a DHPP scaffold with a variety of end groups coupled to the periphery of the scaffold. Such end groups can be substituted for other end groups if desired. End groups include groups of various electron-donating characters. DHPP-based electrochromes are useful as anodically coloring electrochromes capable of being incorporated into a variety of optoelectronic applications.

The present disclosure relates to a variety of DHPP-based electrochromes. Such electrochromes include a DHPP scaffold with a variety of end groups coupled to the periphery of the scaffold. Such end groups can be substituted for other end groups if desired. End groups include groups of various electron-donating characters. DHPP-based electrochromes are useful as anodically coloring electrochromes capable of being incorporated into a variety of optoelectronic applications.

Oxidizing a first aromatic compound in the presence of a metal salt to yield a second aromatic compound includes combining the first aromatic compound, the metal salt, and water to yield an aqueous mixture, and heating the aqueous mixture at a temperature exceeding 200 C. to yield a reaction product that includes the second aromatic compound.

Oxidizing a first aromatic compound in the presence of a metal salt to yield a second aromatic compound includes combining the first aromatic compound, the metal salt, and water to yield an aqueous mixture, and heating the aqueous mixture at a temperature exceeding 200 C. to yield a reaction product that includes the second aromatic compound.

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent ##STR00001##

A resist topcoat composition and a method of forming patterns using the resist topcoat composition. The resist topcoat composition includes an acrylic copolymer including a first structural unit represented by Chemical Formula M-1, and a second structural unit represented by Chemical Formula M-2; an acid compound; and a solvent ##STR00001##