Patent classifications
C07C39/14
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
The present invention provides a material for forming an underlayer film for lithography, containing at least any of a compound represented by following formula (1) or a resin including a structural unit derived from a compound represented by the following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having a 1 to 60 carbon atoms, or a single bond, each R.sup.2 independently represents a halogen atom, a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, or a hydroxyl group, and may be the same or different in the same naphthalene ring or benzene ring, n is an integer of 1 to 4, structural formulae of n's structural units in square brackets [ ] may be the same or different when n is an integer of 2 or more, X represents an oxygen atom, a sulfur atom, or a non-bridging group, each m2 is independently an integer of 0 to 7, in which at least one m.sup.2 is an integer of 1 to 7, and each q is independently 0 or 1, provided that at least one selected from the group consisting of R.sup.1 and R.sup.2 is a group having an iodine atom.
Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and production method thereof, and resist pattern forming method
The present invention provides a material for forming an underlayer film for lithography, containing at least any of a compound represented by following formula (1) or a resin including a structural unit derived from a compound represented by the following formula (1), ##STR00001##
wherein R.sup.1 represents a 2n-valent group having a 1 to 60 carbon atoms, or a single bond, each R.sup.2 independently represents a halogen atom, a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, or a hydroxyl group, and may be the same or different in the same naphthalene ring or benzene ring, n is an integer of 1 to 4, structural formulae of n's structural units in square brackets [ ] may be the same or different when n is an integer of 2 or more, X represents an oxygen atom, a sulfur atom, or a non-bridging group, each m2 is independently an integer of 0 to 7, in which at least one m.sup.2 is an integer of 1 to 7, and each q is independently 0 or 1, provided that at least one selected from the group consisting of R.sup.1 and R.sup.2 is a group having an iodine atom.
Compound, resin, composition, resist pattern formation method, and circuit pattern formation method
The present invention employs a compound represented by the following formula (0): ##STR00001## wherein R.sup.Y is a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms or an aryl group of 6 to 30 carbon atoms; R.sup.Z is an N-valent group of 1 to 60 carbon atoms or a single bond; each R.sup.T is independently an alkyl group of 1 to 30 carbon atoms optionally having a substituent, an aryl group of 6 to 40 carbon atoms optionally having a substituent, an alkenyl group of 2 to 30 carbon atoms optionally having a substituent, an alkoxy group of 1 to 30 carbon atoms optionally having a substituent, a halogen atom, a nitro group, an amino group, a cyano group, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, wherein the alkyl group, the alkenyl group, and the aryl group each optionally contain an ether bond, a ketone bond, or an ester bond, wherein at least one R.sup.T is a hydroxy group or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; X is an oxygen atom, a sulfur atom, or not a crosslink; each m is independently an integer of 0 to 9, wherein at least one m is an integer of 1 to 9; N is an integer of 1 to 4, wherein when N is an integer of 2 or larger, N structural formulas within the parentheses [ ] are the same or different; and each r is independently an integer of 0 to 2.
Compound, resin, composition, resist pattern formation method, and circuit pattern formation method
The present invention employs a compound represented by the following formula (0): ##STR00001## wherein R.sup.Y is a linear, branched, or cyclic alkyl group of 1 to 30 carbon atoms or an aryl group of 6 to 30 carbon atoms; R.sup.Z is an N-valent group of 1 to 60 carbon atoms or a single bond; each R.sup.T is independently an alkyl group of 1 to 30 carbon atoms optionally having a substituent, an aryl group of 6 to 40 carbon atoms optionally having a substituent, an alkenyl group of 2 to 30 carbon atoms optionally having a substituent, an alkoxy group of 1 to 30 carbon atoms optionally having a substituent, a halogen atom, a nitro group, an amino group, a cyano group, a thiol group, a hydroxy group, or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group, wherein the alkyl group, the alkenyl group, and the aryl group each optionally contain an ether bond, a ketone bond, or an ester bond, wherein at least one R.sup.T is a hydroxy group or a group in which a hydrogen atom of a hydroxy group is replaced with an acid dissociation group; X is an oxygen atom, a sulfur atom, or not a crosslink; each m is independently an integer of 0 to 9, wherein at least one m is an integer of 1 to 9; N is an integer of 1 to 4, wherein when N is an integer of 2 or larger, N structural formulas within the parentheses [ ] are the same or different; and each r is independently an integer of 0 to 2.
COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD
The present invention provides a compound having a specific structure represented by the following formula (0), a resin having a constituent unit derived from the compound, various compositions containing the compound and/or the resin, and various methods using the compositions.
##STR00001##
NOVEL COMPOUNDS WHICH ACTIVATE ESTROGEN RECEPTORS AND COMPOSITIONS AND METHODS OF USING THE SAME
Provided are compounds of formulae provided herein. The compounds may include pathway-preferential estrogens (PaPEs) derivatives with tissue-selective activities. Also provided are pharmaceutical compositions comprising the compounds, as well as methods of treating a disease or condition including administering the compounds. The disease or condition may include postmenopausal symptoms, cardiovascular disease, stroke, vascular disease, bone disease, metabolic disease, arthritis, osteoporosis, obesity, vasomotor/hot flush, cognitive decline, cancer including breast cancer.
NOVEL COMPOUNDS WHICH ACTIVATE ESTROGEN RECEPTORS AND COMPOSITIONS AND METHODS OF USING THE SAME
Provided are compounds of formulae provided herein. The compounds may include pathway-preferential estrogens (PaPEs) derivatives with tissue-selective activities. Also provided are pharmaceutical compositions comprising the compounds, as well as methods of treating a disease or condition including administering the compounds. The disease or condition may include postmenopausal symptoms, cardiovascular disease, stroke, vascular disease, bone disease, metabolic disease, arthritis, osteoporosis, obesity, vasomotor/hot flush, cognitive decline, cancer including breast cancer.
METHOD FOR PURIFYING COMPOUND OR RESIN AND METHOD FOR PRODUCING COMPOSITION
A method for purifying a material, the method comprising: a step of preparing a solution comprising a solvent and at least one material selected from the group consisting of a compound represented by the following formula (1A) and a resin having a structure represented by the following formula (2A); and a step of purification in which the solution is passed through a filter:
##STR00001## wherein, X represents an oxygen atom, a sulfur atom, a single bond, or non-crosslinked state; R.sup.a represents a 2n-valent group having 1 to 40 carbon atoms or a single bond; each R.sup.b independently represents one of various functional groups; each m is independently an integer of 0 to 9; n is an integer of 1 to 4; and each p is independently an integer of 0 to 2; provided that at least one R.sup.b represents a group comprising one selected from a hydroxyl group and a thiol group, and all m cannot be 0 at the same time;
##STR00002## wherein, X, R.sup.a, R.sup.b, n and p are the same as defined in the formula (1A); R.sup.c represents a single bond or an alkylene group having 1 to 40 carbon atoms; each m.sup.2 is independently an integer of 0 to 8; provided that at least one R.sup.b represents a group comprising one or more selected from a hydroxyl group and a thiol group, and all m.sup.2 cannot be 0 at the same time.
METHOD FOR PURIFYING COMPOUND OR RESIN AND METHOD FOR PRODUCING COMPOSITION
A method for purifying a material, the method comprising: a step of preparing a solution comprising a solvent and at least one material selected from the group consisting of a compound represented by the following formula (1A) and a resin having a structure represented by the following formula (2A); and a step of purification in which the solution is passed through a filter:
##STR00001## wherein, X represents an oxygen atom, a sulfur atom, a single bond, or non-crosslinked state; R.sup.a represents a 2n-valent group having 1 to 40 carbon atoms or a single bond; each R.sup.b independently represents one of various functional groups; each m is independently an integer of 0 to 9; n is an integer of 1 to 4; and each p is independently an integer of 0 to 2; provided that at least one R.sup.b represents a group comprising one selected from a hydroxyl group and a thiol group, and all m cannot be 0 at the same time;
##STR00002## wherein, X, R.sup.a, R.sup.b, n and p are the same as defined in the formula (1A); R.sup.c represents a single bond or an alkylene group having 1 to 40 carbon atoms; each m.sup.2 is independently an integer of 0 to 8; provided that at least one R.sup.b represents a group comprising one or more selected from a hydroxyl group and a thiol group, and all m.sup.2 cannot be 0 at the same time.
Amination and hydroxylation of arylmetal compounds
In one aspect, the present disclosure provides methods of preparing a primary or secondary amine and hydroxylated aromatic compounds. In some embodiments, the aromatic compound may be unsubstituted, substituted, or contain one or more heteroatoms within the rings of the aromatic compound. The methods described herein may be carried out without the need for transition metal catalysts or harsh reaction conditions.