The present invention relates to a process for the preparation of crisaborole of formula (I): ##STR00001##
by preparing intermediates of formulas (II) and (III): ##STR00002##

The present disclosure describes methods for silylating aromatic organic substrates, and associated chemical systems, said methods comprising or consisting essentially of contacting the aromatic organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate.

The present disclosure describes methods for silylating aromatic organic substrates, and associated chemical systems, said methods comprising or consisting essentially of contacting the aromatic organic substrate with a mixture of (a) at least one organosilane and (b) at least one strong base, under conditions sufficient to silylate the aromatic substrate.

This invention relates to a process for preparing a calixarene compound by reacting a phenolic compound and an aldehyde in the presence of at least one nitrogen-containing base as a catalyst to form the calixarene compound. The invention also relates to processes for high-yield, high solid-content production of a calixarene compound, with high selectivity toward a high-purity calix[8]arene compound, without carrying out a recrystallization step.

This invention relates to a process for preparing a calixarene compound by reacting a phenolic compound and an aldehyde in the presence of at least one nitrogen-containing base as a catalyst to form the calixarene compound. The invention also relates to processes for high-yield, high solid-content production of a calixarene compound, with high selectivity toward a high-purity calix[8]arene compound, without carrying out a recrystallization step.

The present disclosure provides a method for decomposing a phenolic by-product, the method including: a step S10 of injecting and mixing a bisphenol A by-product produced in a bisphenol A production process, a mixed by-product stream of phenol by-products produced in a phenol production process, a decomposition apparatus side discharge stream, and a process water stream in a mixing apparatus; a step S20 of injecting a mixing apparatus discharge stream discharged from the mixing apparatus into a phase separation apparatus and phase-separating the mixing apparatus discharge stream into an oil-phase stream and a liquid-phase stream; a step S30 of feeding the oil-phase stream, which is phase-separated in the step S20 and discharged from the phase separation apparatus, to a decomposition apparatus to decompose the oil-phase stream; and a step S40 of circulating the decomposition apparatus side discharge stream obtained by the decomposition in the step S30 to the mixing apparatus in the step S10.

The present disclosure provides a method for decomposing a phenolic by-product, the method including: a step S10 of injecting and mixing a bisphenol A by-product produced in a bisphenol A production process, a mixed by-product stream of phenol by-products produced in a phenol production process, a decomposition apparatus side discharge stream, and a process water stream in a mixing apparatus; a step S20 of injecting a mixing apparatus discharge stream discharged from the mixing apparatus into a phase separation apparatus and phase-separating the mixing apparatus discharge stream into an oil-phase stream and a liquid-phase stream; a step S30 of feeding the oil-phase stream, which is phase-separated in the step S20 and discharged from the phase separation apparatus, to a decomposition apparatus to decompose the oil-phase stream; and a step S40 of circulating the decomposition apparatus side discharge stream obtained by the decomposition in the step S30 to the mixing apparatus in the step S10.

An object of the present invention is to provide a new compound that is useful as a film forming material for lithography and the like. The above object can be achieved by a compound represented by the following formula (1). ##STR00001##

An object of the present invention is to provide a new compound that is useful as a film forming material for lithography and the like. The above object can be achieved by a compound represented by the following formula (1). ##STR00001##

An object is to provide a semiconductor material and coating having high solubility in solvents and having advantageous filling property, high heat resistance, and/or high etching resistance. Another object is to provide a method for manufacturing a semiconductor using the semiconductor material. Still another object is to provide a novel compound. Provided are: a semiconductor material consisting of a specific aromatic hydrocarbon ring derivative; methods for manufacturing a coating and a semiconductor using the semiconductor material; and a compound consisting of a specific aromatic hydrocarbon ring derivative.