Provided is a compound containing a phenolic hydroxy group which has excellent heat resistance, a resist composition which has excellent thermal decomposition resistance, optical sensitivity and resolution, and a composition for a resist underlayer coating which has excellent thermal decomposition resistance and dry etching resistance. The compound containing a phenolic hydroxy group has a molecular structure represented by Structural Formula (1) below: ##STR00001##
wherein R.sup.1 is a hydrogen atom, an alkyl group or an aryl group, n is an integer of 2 to 10, R.sup.2 is any one of an alkyl group, an alkoxy group, an aryl group, an aralkyl group and a halogen atom, m is an integer of 0 to 4, and when m is 2 or greater, a plurality of R.sup.2's may be the same as or different from each other and may be bonded to either one of two aromatic rings of the naphthylene skeleton.

Provided is a compound containing a phenolic hydroxy group which has excellent heat resistance, a resist composition which has excellent thermal decomposition resistance, optical sensitivity and resolution, and a composition for a resist underlayer coating which has excellent thermal decomposition resistance and dry etching resistance. The compound containing a phenolic hydroxy group has a molecular structure represented by Structural Formula (1) below: ##STR00001##
wherein R.sup.1 is a hydrogen atom, an alkyl group or an aryl group, n is an integer of 2 to 10, R.sup.2 is any one of an alkyl group, an alkoxy group, an aryl group, an aralkyl group and a halogen atom, m is an integer of 0 to 4, and when m is 2 or greater, a plurality of R.sup.2's may be the same as or different from each other and may be bonded to either one of two aromatic rings of the naphthylene skeleton.

A phenolic hydroxyl-containing compound is provided. The compound dissolves well in solvents and can be formulated into compositions that give coatings superior in thermal decomposition resistance, alkali developability, resolution, and dry-etch resistance. Specifically, the compound is a phenolic hydroxyl-containing calixarene represented by structural formula (1):

##STR00001##

(where A is a structural unit including a dihydroxynaphthalene- or naphthol-derived structure optionally with a substituent alkyl, alkoxy, aryl, or aralkyl group or halogen atom on the aromatic rings and a methylene group optionally having an alkyl or aryl group in place of one of the hydrogen atoms) and obtained using a dihydroxynaphthalene in combination with a naphthol, with the total repeat number p being an integer of 2 to 10.

The present invention relates to a phosphonium-based compound represented by chemical formula 1, an epoxy resin composition containing the same, and a semiconductor device manufactured by using the same.

A resin of the present disclosure includes a resin and a compound represented by General Formula I below. ##STR00001## wherein each of R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 represents a hydrogen atom, a halogen atom, a hydroxyl group, or an aliphatic hydrocarbon group having a carbon number within a range from 1 to 8, and X represents a divalent linking group constituted by at least one species selected from among a single bond, an ether bond, and an alkylene group having a carbon number within a range from 1 to 15.

A resin of the present disclosure includes a resin and a compound represented by General Formula I below. ##STR00001## wherein each of R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 represents a hydrogen atom, a halogen atom, a hydroxyl group, or an aliphatic hydrocarbon group having a carbon number within a range from 1 to 8, and X represents a divalent linking group constituted by at least one species selected from among a single bond, an ether bond, and an alkylene group having a carbon number within a range from 1 to 15.

There is provided a (meth)acrylic resin composition containing a (meth)acrylic resin, and a compound denoted by General Formula (1) described below, a film formed by using the (meth)acrylic resin composition, and a polarizing plate and a liquid crystal display device including the film: ##STR00001##
wherein R.sup.1 to R.sup.8 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, or a hydrocarbon group having 1 to 12 carbon atoms, X represents a divalent alicyclic group having 4 to 20 carbon atoms, the alicyclic group represented by X may have at least one substituent group selected from a halogen atom, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, and an aromatic hydrocarbon group having 6 to 15 carbon atoms.

There is provided a (meth)acrylic resin composition containing a (meth)acrylic resin, and a compound denoted by General Formula (1) described below, a film formed by using the (meth)acrylic resin composition, and a polarizing plate and a liquid crystal display device including the film: ##STR00001##
wherein R.sup.1 to R.sup.8 each independently represent a hydrogen atom, a halogen atom, a hydroxyl group, or a hydrocarbon group having 1 to 12 carbon atoms, X represents a divalent alicyclic group having 4 to 20 carbon atoms, the alicyclic group represented by X may have at least one substituent group selected from a halogen atom, an aliphatic hydrocarbon group having 1 to 12 carbon atoms, and an aromatic hydrocarbon group having 6 to 15 carbon atoms.

Provided are an electrophotographic photosensitive member which satisfies wear resistance and electrical characteristics, and in which image deletion is satisfactorily suppressed, and a process cartridge and an electrophotographic apparatus each including the electrophotographic photosensitive member. The electrophotographic photosensitive member comprises a surface layer which includes a polymerized product of a hole transporting substance having a reactive functional group, in which a structure other than the reactive functional group of the hole transporting substance is one of: a structure consisting of a carbon atom and a hydrogen atom; and a structure consisting of a carbon atom, a hydrogen atom and an oxygen atom, and the structure other than the reactive functional group of the hole transporting substance comprises a specific conjugate structure.

Provided are an electrophotographic photosensitive member which satisfies wear resistance and electrical characteristics, and in which image deletion is satisfactorily suppressed, and a process cartridge and an electrophotographic apparatus each including the electrophotographic photosensitive member. The electrophotographic photosensitive member comprises a surface layer which includes a polymerized product of a hole transporting substance having a reactive functional group, in which a structure other than the reactive functional group of the hole transporting substance is one of: a structure consisting of a carbon atom and a hydrogen atom; and a structure consisting of a carbon atom, a hydrogen atom and an oxygen atom, and the structure other than the reactive functional group of the hole transporting substance comprises a specific conjugate structure.