Patent classifications
C07C39/17
METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILM USING THE SAME, TERTIARY ALKYLOXYCARBONYL GROUP-MODIFIED BISNAPHTHOL FLUORENE COMPOUND, AND METHOD FOR PRODUCING THE SAME
A metal oxide film-forming containing a tertiary alkyloxycarbonyl group-modified bisnaphthol fluorene compound represented by formula (1), a metal compound represented by formula L(R.sup.6).sub.n1(O).sub.n2, and a solvent. In the formulas, ring Z.sup.1 represents a naphthalene ring; R.sup.1a and R.sup.1b represent a halogen atom; R.sup.2a and R.sup.2b represent an alkyl group; R.sup.3a to R.sup.5b represent an alkyl group having 1 to 8 carbon atoms; k1 and k2 represent an integer of 0 to 4; m1 and m2 represent an integer of 0 to 6; R.sup.6 is OR.sup.7; R.sup.7 represents an organic group having 1 to 30 carbon atoms; n1 and n2 represent an integer of 0 or larger; and n1+2×n2 represents a valence depending on the type of L; and L represents Al
##STR00001##
METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILM USING THE SAME, TERTIARY ALKYLOXYCARBONYL GROUP-MODIFIED BISNAPHTHOL FLUORENE COMPOUND, AND METHOD FOR PRODUCING THE SAME
A metal oxide film-forming containing a tertiary alkyloxycarbonyl group-modified bisnaphthol fluorene compound represented by formula (1), a metal compound represented by formula L(R.sup.6).sub.n1(O).sub.n2, and a solvent. In the formulas, ring Z.sup.1 represents a naphthalene ring; R.sup.1a and R.sup.1b represent a halogen atom; R.sup.2a and R.sup.2b represent an alkyl group; R.sup.3a to R.sup.5b represent an alkyl group having 1 to 8 carbon atoms; k1 and k2 represent an integer of 0 to 4; m1 and m2 represent an integer of 0 to 6; R.sup.6 is OR.sup.7; R.sup.7 represents an organic group having 1 to 30 carbon atoms; n1 and n2 represent an integer of 0 or larger; and n1+2×n2 represents a valence depending on the type of L; and L represents Al
##STR00001##
Antibiotic Compounds
The present application provides compounds and methods of treating bacterial infection, including bacterial infection caused by P. acnes.
Antibiotic Compounds
The present application provides compounds and methods of treating bacterial infection, including bacterial infection caused by P. acnes.
Antibiotic compounds
The present application provides compounds and methods of treating bacterial infection, including bacterial infection caused by P. acnes.
Antibiotic compounds
The present application provides compounds and methods of treating bacterial infection, including bacterial infection caused by P. acnes.
BISPHENOL COMPOSITION AND POLYCARBONATE RESIN
A bisphenol composition includes 95% or more by mass of a bisphenol and 200 mass ppm or more of a compound represented by the following general formula (II):
##STR00001##
In formula (II), R.sup.21 and R.sup.22 denote a methyl group or a hydrogen atom; R.sup.22 is a methyl group when R.sup.21 is a hydrogen atom; R.sup.22 is a hydrogen atom when R.sup.21 is a methyl group; R.sup.23 to R.sup.25 independently denote a hydrogen atom or an alkyl group having 1 to 20 carbon atoms; and R.sup.23, R.sup.24, and R.sup.25 may be bonded or cross-linked between two of the groups. A method for producing a polycarbonate resin using the bisphenol composition is also described.
BISPHENOL COMPOSITION AND POLYCARBONATE RESIN
A bisphenol composition includes 95% or more by mass of a bisphenol and 200 mass ppm or more of a compound represented by the following general formula (II):
##STR00001##
In formula (II), R.sup.21 and R.sup.22 denote a methyl group or a hydrogen atom; R.sup.22 is a methyl group when R.sup.21 is a hydrogen atom; R.sup.22 is a hydrogen atom when R.sup.21 is a methyl group; R.sup.23 to R.sup.25 independently denote a hydrogen atom or an alkyl group having 1 to 20 carbon atoms; and R.sup.23, R.sup.24, and R.sup.25 may be bonded or cross-linked between two of the groups. A method for producing a polycarbonate resin using the bisphenol composition is also described.
BIS-PROPYLCATECHOL, METHOD FOR PRODUCING BIS-PROPYLCATECHOL, RESIN COMPOSITION AND CURED RESIN PRODUCT CONTAINING BIS-PROPYLCATECHOL, EPOXIDIZED BIS-PROPYLCATECHOL, METHOD FOR PRODUCING EPOXIDIZED BIS-PROPYLCATECHOL, AND CURABLE RESIN COMPOSITION AND CURED RESIN PRODUCT CONTAINING EPOXIDIZED BIS-PROPYLCATECHOL
A bis-propylcatechol having a structure represented by formula (1):
##STR00001## wherein R.sup.1 is a divalent aliphatic hydrocarbon group having two or more carbon atoms or a divalent aromatic hydrocarbon group.
PROCESSES FOR SOLVENT EXTRACTION OF CANNABINOIDS, TERPENES AND FLAVONOIDS FROM BIOMASS
In alternative embodiments, provided are industrial processes and methods for extracting or removing cannabinoids, flavonoids and terpenes from plant materials such as trichomes. In alternative embodiments, the cannabinoids, flavonoids and terpenes are extracted or removed from the plant materials using a non-polar, organic solvent, or a mixture of non-polar, organic solvent and polar, organic solvent.