The invention relates to a composition comprising 0.01% to 15% resveratrol and 0.01% to 15% of melatonin. In a preferred embodiment, the composition comprises 5% resveratrol and 0.1% melatonin. The invention also relates to the use of the said composition to reduce hair loss and/or increase regrowth of hair in a human subject.

The present invention is directed to the intranasal delivery of curcumin adapted so as to target the brain.

Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. ##STR00001##
In Chemical Formula 1, A, A′, L and n are the same as in the detailed description.

Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. ##STR00001##
In Chemical Formula 1, A, A′, L and n are the same as in the detailed description.

It discloses a compound of formula I that inhibits the activities of numerous of protein kinases involving the signaling of inflammatory cytokines, therefore, the compound can be used for treating cancers, autoimmune diseases and inflammatory diseases.

It discloses a compound of formula I that inhibits the activities of numerous of protein kinases involving the signaling of inflammatory cytokines, therefore, the compound can be used for treating cancers, autoimmune diseases and inflammatory diseases.

Provided is a novel compound having a selective activating effect on ERβ. The present invention provides a compound represented by the following formula (1) wherein R.sup.1 represents a cycloalkyl group having 3 to 8 carbon atoms, an alkenyl group having 2 to 6 carbon atoms and optionally substituted with a halogen atom, a 5-membered nitrogen-containing heteroaryl group, a 4- to 6-membered cyclic amino group, an alkanoylamino group having 2 to 6 carbon atoms and optionally substituted with a halogen atom, a 1-trifluoromethyl-1-hydroxymethyl group, or a 1-methylpropyl group; R.sup.2 to R.sup.5 are the same or different and each represent a hydrogen atom or a fluorine atom; and R.sup.6 represents a hydrogen atom or an alkanoyl group having 2 to 5 carbon atoms, or a salt thereof. ##STR00001##

The present invention relates to compounds that modify low density lipoprotein receptor (LDLR) expression. The compounds have the structural formula I shown below:

##STR00001##

wherein m, R.sub.1, n, R.sub.2 and R.sub.3 are each as defined herein. The present invention also relates to processes for the preparation of these compounds, to pharmaceutical compositions comprising them, and to their use in the treatment of diseases or disorders associated with elevated levels of low density lipoprotein cholesterol (LDL-C).

The present invention relates to compounds that modify low density lipoprotein receptor (LDLR) expression. The compounds have the structural formula I shown below:

##STR00001##

wherein m, R.sub.1, n, R.sub.2 and R.sub.3 are each as defined herein. The present invention also relates to processes for the preparation of these compounds, to pharmaceutical compositions comprising them, and to their use in the treatment of diseases or disorders associated with elevated levels of low density lipoprotein cholesterol (LDL-C).

The present invention provides a positive photosensitive resin composition containing (A) a polymer compound containing a siloxane chain, the polymer compound having a repeating unit shown by the general formula (1) and a weight average molecular weight of 3,000 to 500,000, (B) a photosensitive material capable of generating an acid by light and increasing a dissolution rate in an aqueous alkaline solution, (C) a crosslinking agent, and (D) a solvent. There can be provided a positive photosensitive resin composition that can remedy the problem of delamination caused on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern having a forward tapered shape without generating a scum and a footing profile in the pattern bottom and on the substrate when a widely used 2.38% TMAH aqueous solution is used as the developer.

##STR00001## ##STR00002##