Patent classifications
C07C39/225
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN
The present invention is a compound represented by the following general formula (1).
##STR00001##
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN
The present invention is a compound represented by the following general formula (1).
##STR00001##
SOLID FORMS OF MENAQUINOLS
Disclosed are solid forms of menaquinol and processes for obtaining them by chemical or enzymatic reduction of menaquinone. Said solid forms possess high stability to oxidation which allows effective use of menaquinol in the most common formulations wherein vitamin K2 is used.
SOLID FORMS OF MENAQUINOLS
Disclosed are solid forms of menaquinol and processes for obtaining them by chemical or enzymatic reduction of menaquinone. Said solid forms possess high stability to oxidation which allows effective use of menaquinol in the most common formulations wherein vitamin K2 is used.
SOLID FORMS OF MENAQUINOLS
Disclosed are solid forms of menaquinol and processes for obtaining them by chemical or enzymatic reduction of menaquinone. Said solid forms possess high stability to oxidation which allows effective use of menaquinol in the most common formulations wherein vitamin K2 is used.
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.
MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION
Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same.
##STR00001##
In Chemical Formula 1, A, A, L and n are the same as in the detailed description.
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM
A resist composition containing a compound represented by the general formulas (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, an alcoholic compound that can be derived therefrom, and a method for producing an alcoholic compound represented by general formulas (6) or (7) are described.
VINYLBENZYLATED PHENOL COMPOUND, METHOD OF MANUFACTURING VINYLBENZYLATED PHENOL COMPOUND, ACTIVATED ESTER RESIN, METHOD OF MANUFACTURING ACTIVATED ESTER RESIN, THERMOSET RESIN COMPOSITION, HARDENED MATERIAL OF THERMOSET RESIN COMPOSITION, INTERLAYER INSULATING MATERIAL, PREPREG, AND METHOD OF MANUFACTURING PREPREG
A vinylbenzylated phenol compound represented by General Formula (1) below is provided.
##STR00001##
(In General Formula (1), Ar.sup.0 is a bifunctional phenol compound residue having one or more monocyclic or polycyclic aromatic nuclei, R.sup.1 to R.sup.5 may be the same or different and are each hydrogen or a methyl group, and p is an integer of 1 to 4.)