The present invention is directed to a method of treating a subject for a disease or disorder associated with Trpv2 activity. The present invention also relates to a compound having the following structure: where substituents A and Rx-R5 are as defined herein. Also disclosed is a composition and a method of increasing Trpv2 activity in a cell or tissue.

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The present invention is directed to a method of treating a subject for a disease or disorder associated with Trpv2 activity. The present invention also relates to a compound having the following structure: where substituents A and Rx-R5 are as defined herein. Also disclosed is a composition and a method of increasing Trpv2 activity in a cell or tissue.

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The present invention relates to fluorine substituted CBD compounds, compositions thereof and uses thereof for the preparation of medicaments.

The present invention relates to fluorine substituted CBD compounds, compositions thereof and uses thereof for the preparation of medicaments.

The present invention relates to fluorine substituted CBD compounds, compositions thereof and uses thereof for the preparation of medicaments.

The present invention relates to fluorine substituted CBD compounds, compositions thereof and uses thereof for the preparation of medicaments.

The present invention relates to fluorine substituted CBD compounds, compositions thereof and uses thereof for the preparation of medicaments.

The present invention relates to fluorine substituted CBD compounds, compositions thereof and uses thereof for the preparation of medicaments.

Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below: ##STR00001##

Provided are a fluoreneol-based monomer, a polymer for preparing a resist underlayer film obtained therefrom, a resist underlayer film composition containing the polymer, and a method for forming a resist underlayer film using the resist underlayer film composition, wherein the fluoreneol-based monomer is represented by Chemical Formula 2 below: ##STR00001##