The present invention is drawn to a raw material for chemical deposition for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, containing an organoruthenium compound represented by the following formula 1, and further containing -diketone that is the same as a ligand of the organoruthenium compound. The raw material for chemical deposition of the present invention is inhibited in discoloration/precipitation even when heated at a high temperature, and enables to form a stable ruthenium thin film or ruthenium compound thin film.

##STR00001## wherein substituents R.sub.1 and R.sub.2 are each hydrogen, or a linear or branched alkyl group.

The present invention relates to a process for the preparation of diketones and pyrrole derivatives, optionally substituted in the 2 and/or 5 positions, from furans.

The present invention relates to a process for the preparation of diketones and pyrrole derivatives, optionally substituted in the 2 and/or 5 positions, from furans.

The invention relates to the use of substances for the production of anions suitable for charge transfer reactions in mass spectrometers, particularly for the fragmentation of multiply positively charged biopolymer ions by electron transfer or for charge reduction by proton transfer. Diketones, particularly -diketones, are proposed as a newly found class of substances which can be used both for the production of radical anions for electron transfer dissociations (ETD) with a high yield of fragment ions and also for the production of non-radical anions for the charge reduction of multiply charged analyte ions by proton transfer reactions (PTR). These substances have favorable properties in terms of their handling and the associated analytical methods: they are largely nontoxic, cover a favorable range of molecular masses, and their volatility means that they can be stored in unheated containers outside of the vacuum system, which facilitates the refilling of the containers.

Provided are a composition selected from a composition for removing edge beads from metal-containing resists and a developer composition of metal-containing resists, and a method of forming patterns using the same, the composition includes a compound including at least two ketone groups; and an organic solvent including at least one selected from an acetate-based solvent and an alcohol-based solvent, wherein the compound including at least two ketone groups is included in an amount of about 10 to about 70 wt % based on the total weight of the composition, and the organic solvent is included in an amount of about 30 to about 90 wt % based on a total weight of the composition.

Provided are a composition selected from a composition for removing edge beads from metal-containing resists and a developer composition of metal-containing resists, and a method of forming patterns using the same, the composition includes a compound including at least two ketone groups; and an organic solvent including at least one selected from an acetate-based solvent and an alcohol-based solvent, wherein the compound including at least two ketone groups is included in an amount of about 10 to about 70 wt % based on the total weight of the composition, and the organic solvent is included in an amount of about 30 to about 90 wt % based on a total weight of the composition.