Patent classifications
C07C49/175
A METHOD FOR PREPARING OPTICALLY ACTIVE CARBONYL COMPOUND
The present invention discloses a method for preparing optically active carbonyl compound, comprising the following steps: under the catalysis of chiral amine salt and transition metal catalysts, with hydrogen and catalytic amount of dihydropyridine compound as hydrogen source, use , -unsaturated aldehydes or , -unsaturated troponoid compounds to conduct asymmetric catalytic reaction to obtain the optically active carbonyl compound. This method comes in moderate reaction condition, simple operation, and catalytic amount of dihydropyridine compounds usage, the target product is easy to be separated and purified from the reaction system, and the metal catalyst can be recycled, it is economical.
LIQUID CRYSTAL COMPOUND, LIQUID CRYSTAL COMPOSITION, COMPOSITE MATERIAL WITH ENCAPSULATED LIQUID CRYSTAL, AND LIQUID CRYSTAL DISPLAY DEVICE USING SAME
Shown is a bimesogenic compound having high solubility in a liquid crystal compound, a liquid crystal composition, a chiral dopant, an additive including an antioxidant or an ultraviolet light absorber, and a polymerizable liquid crystal compound, each of which is used in other bimesogenic compounds or a liquid crystal display device, while maintaining desired physical properties.
A compound is represented by formula (1), a liquid crystal composition contains the compound, conjugate fibers with an encapsulated liquid crystal obtained from the liquid crystal composition, and a liquid crystal display device is obtained from the conjugate fibers with the encapsulated liquid crystal.
MG.sup.1-Z.sup.a-Sp-Z.sup.b-MG.sup.2(1)
Resist composition and method for producing resist pattern
A resist composition includes a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: ##STR00001##
wherein, in formula (3), R.sup.a10 represents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.
Resist composition and method for producing resist pattern
A resist composition includes a novolak resin in which a hydroxy group is substituted with a group represented by formula (3), an acid generator, a quencher, and a solvent: ##STR00001##
wherein, in formula (3), R.sup.a10 represents a hydrocarbon group having 1 to 20 carbon atoms (e.g., a chain hydrocarbon group such as an alkyl group, an alkenyl group and an alkynyl group, an alicyclic hydrocarbon group, an aromatic hydrocarbon group, groups formed by combining these groups, etc.) and * represents a bond.
Compounds for solubilizing polymers
Disclosed are compounds and methods for solubilizing polymers and oligomers. The compounds have the formula: ##STR00001## wherein R.sup.1, Q.sup.1 and Q.sup.2 are defined herein.
Compounds for solubilizing polymers
Disclosed are compounds and methods for solubilizing polymers and oligomers. The compounds have the formula: ##STR00001## wherein R.sup.1, Q.sup.1 and Q.sup.2 are defined herein.