Patent classifications
C07C51/64
Processes for preparing aldaric, aldonic, and uronic acids
Various processes for preparing aldaric acids, aldonic acids, uronic acids, and/or lactone(s) thereof are described. For example, processes for preparing a C.sub.5-C.sub.6 aldaric acid and/or lactone(s) thereof by the catalytic oxidation of a C.sub.5-C.sub.6 aldonic acid and/or lactone(s) thereof and/or a C.sub.5-C.sub.6 aldose are described.
Processes for preparing aldaric, aldonic, and uronic acids
Various processes for preparing aldaric acids, aldonic acids, uronic acids, and/or lactone(s) thereof are described. For example, processes for preparing a C.sub.5-C.sub.6 aldaric acid and/or lactone(s) thereof by the catalytic oxidation of a C.sub.5-C.sub.6 aldonic acid and/or lactone(s) thereof and/or a C.sub.5-C.sub.6 aldose are described.
Distillation process comprising at least two distillation steps to obtain purified halogenated carboxylic acid halide, and use of the purified halogenated carboxylic acid halide
The present invention concerns a process for the obtention of a halogenated carboxylic halide having a reduced content of impurities, a fraction of the halogenated carboxylic halide having a reduced content of impurities, and its use in the manufacture of agriculturally and pharmaceutically active compounds.
Distillation process comprising at least two distillation steps to obtain purified halogenated carboxylic acid halide, and use of the purified halogenated carboxylic acid halide
The present invention concerns a process for the obtention of a halogenated carboxylic halide having a reduced content of impurities, a fraction of the halogenated carboxylic halide having a reduced content of impurities, and its use in the manufacture of agriculturally and pharmaceutically active compounds.
Distillation process comprising at least two distillation steps to obtain purified halogenated carboxylic acid halide, and use of the purified halogenated carboxylic acid halide
The present invention concerns a process for the obtention of a halogenated carboxylic halide having a reduced content of impurities, a fraction of the halogenated carboxylic halide having a reduced content of impurities, and its use in the manufacture of agriculturally and pharmaceutically active compounds.
Method for producing dry etching gas
Provided is a method for producing fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride ((CF.sub.3).sub.2CHCOF), which are useful as dry etching gases etc., safely and inexpensively with high purity. According to the method in which 1,1,3,3,3-pentafluoro-2-trifluoromethylpropyl methyl ether is pyrolyzed in a gas phase in the presence of a catalyst, the desired fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride can be obtained with high selectivity and high conversion of the starting material by a simple process in which a pyrolysis reaction is performed in a gas phase using the inexpensive starting material.
Method for producing dry etching gas
Provided is a method for producing fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride ((CF.sub.3).sub.2CHCOF), which are useful as dry etching gases etc., safely and inexpensively with high purity. According to the method in which 1,1,3,3,3-pentafluoro-2-trifluoromethylpropyl methyl ether is pyrolyzed in a gas phase in the presence of a catalyst, the desired fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride can be obtained with high selectivity and high conversion of the starting material by a simple process in which a pyrolysis reaction is performed in a gas phase using the inexpensive starting material.
Method for producing dry etching gas
Provided is a method for producing fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride ((CF.sub.3).sub.2CHCOF), which are useful as dry etching gases etc., safely and inexpensively with high purity. According to the method in which 1,1,3,3,3-pentafluoro-2-trifluoromethylpropyl methyl ether is pyrolyzed in a gas phase in the presence of a catalyst, the desired fluoromethane and 3,3,3-trifluoro-2-(trifluoromethyl)propanoyl fluoride can be obtained with high selectivity and high conversion of the starting material by a simple process in which a pyrolysis reaction is performed in a gas phase using the inexpensive starting material.
COMPOSITION CONTAINING ACRYLIC ACID DERIVATIVE, AND METHOD FOR STABILIZING ACRYLIC ACID DERIVATIVE
An object of the present invention is to provide a method for stabilizing an acrylic acid derivative, and a composition containing an acrylic acid derivative in which the acrylic acid derivative is stabilized. The present invention provides a composition comprising: (A) an acrylic acid derivative represented by Formula (I):
##STR00001##
(wherein, R.sup.1 and R.sup.2 are the same or different, and each represents alkyl, fluoroalkyl, aryl that may have one or more substituents, halogen, or hydrogen; R.sup.c represents a group: OR.sup.3 (wherein R.sup.3 represents alkyl, fluoroalkyl, aryl that may have one or more substituents, or hydrogen) or halogen; and X represents fluoroalkyl, alkyl, hydrogen, or halogen); and (B) amide, wherein the content of acrylic acid derivative (A) is 30% (w/w) or more.
COMPOSITION CONTAINING ACRYLIC ACID DERIVATIVE, AND METHOD FOR STABILIZING ACRYLIC ACID DERIVATIVE
An object of the present invention is to provide a method for stabilizing an acrylic acid derivative, and a composition containing an acrylic acid derivative in which the acrylic acid derivative is stabilized. The present invention provides a composition comprising: (A) an acrylic acid derivative represented by Formula (I):
##STR00001##
(wherein, R.sup.1 and R.sup.2 are the same or different, and each represents alkyl, fluoroalkyl, aryl that may have one or more substituents, halogen, or hydrogen; R.sup.c represents a group: OR.sup.3 (wherein R.sup.3 represents alkyl, fluoroalkyl, aryl that may have one or more substituents, or hydrogen) or halogen; and X represents fluoroalkyl, alkyl, hydrogen, or halogen); and (B) amide, wherein the content of acrylic acid derivative (A) is 30% (w/w) or more.