A process for preparing a low-molecular weight fluoropolyether containing an acid fluoride by decomposing a triflate or trifluoroacetate of a fluoropolyether having a hydroxyl group in the presence of a Lewis acid.

An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition forms a pattern having minimal defects and excellent lithography performance factors such as CDU, LWR and DOF.

##STR00001##

An aim of the present disclosure is to provide a method for producing a fluoroalkoxide, said method being more useful than conventional methods, and the like. The aim can be achieved by a method for producing a compound represented by the following formula (1):

##STR00001## (wherein R.sup.1 is a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or a fluoroalkoxy group optionally containing an oxygen atom between carbon atoms, and each R.sup.2 is identical to or different from each other and is a hydrocarbon group), the method comprising the step of reacting a compound represented by the following formula (2):

##STR00002## with a compound represented by the following formula (3):

.sup.⊖F.sup.⊕NR.sup.2).sub.4  (3).

An aim of the present disclosure is to provide a method for producing a fluoroalkoxide, said method being more useful than conventional methods, and the like. The aim can be achieved by a method for producing a compound represented by the following formula (1):

##STR00001## (wherein R.sup.1 is a fluoroalkyl group optionally containing an oxygen atom between carbon atoms, or a fluoroalkoxy group optionally containing an oxygen atom between carbon atoms, and each R.sup.2 is identical to or different from each other and is a hydrocarbon group), the method comprising the step of reacting a compound represented by the following formula (2):

##STR00002## with a compound represented by the following formula (3):

.sup.⊖F.sup.⊕NR.sup.2).sub.4  (3).

A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

A polybrominated flame-retardant compound, a process for forming a flame-retardant material, and an article of manufacture are disclosed. The polybrominated flame-retardant compound includes a cyclododecane moiety, at least two bromo groups, and at least one substituent having a reactive functional group. The process includes forming a polybromocyclododecane (PBCD) compound having at least one reactive functional group and incorporating the PBCD compound into a polymer in a process that includes covalent binding of the PBCD compound. The article of manufacture includes a flame-retardant material that comprises a polymer with a covalently-bound PBCD compound.

Provided is a method of manufacturing a trifluoropyruvyl fluoride dimer, including a reaction step of reacting hexafluoropropylene oxide and aldehyde.

Provided is a method of manufacturing a trifluoropyruvyl fluoride dimer, including a reaction step of reacting hexafluoropropylene oxide and aldehyde.

Provided herein are novel compounds (e.g., Formula I), pharmaceutical compositions, and methods of using related to GPR40. The compounds herein are typically GPR40 agonists, which can be used for treating a variety of disorders, conditions or diseases such as Type 2 diabetes.

##STR00001##