C07C63/70

Resist composition and patterning process

A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Resist composition and patterning process

A resist composition comprising a base polymer and a quencher containing a sulfonium salt having an iodized benzene ring offers a high sensitivity, minimal LWR and improved CDU independent of whether it is of positive or negative tone.

Metal-free catalytic oxidation system, an oxygenation method and a method for producing benzoic acid derivatives
11084013 · 2021-08-10 · ·

A metal-free catalytic oxidation system, an oxygenation method and a method for producing benzoic acid derivatives. The system includes a feed device; a tubular reactor; a plurality of venturi nozzles mounted on the tubular reactor at intervals; a tubular filter; a discharge device for a solid phase product; and an intermediate tank for reaction mixture. A low-pressure zone is formed at an output end of each of the plurality of venturi nozzles, and an oxygen inlet corresponds to the low-pressure zone; the tubular filter comprises an inner tube and an outer tube connected to each other, where the inner tube is provided with small holes for solid-liquid separation; the discharge device for the solid phase product is located at an end of the inner tube; and the intermediate tank for reaction mixture is connected to the outer tube of the tubular filter through a pipeline.

Metal-free catalytic oxidation system, an oxygenation method and a method for producing benzoic acid derivatives
11084013 · 2021-08-10 · ·

A metal-free catalytic oxidation system, an oxygenation method and a method for producing benzoic acid derivatives. The system includes a feed device; a tubular reactor; a plurality of venturi nozzles mounted on the tubular reactor at intervals; a tubular filter; a discharge device for a solid phase product; and an intermediate tank for reaction mixture. A low-pressure zone is formed at an output end of each of the plurality of venturi nozzles, and an oxygen inlet corresponds to the low-pressure zone; the tubular filter comprises an inner tube and an outer tube connected to each other, where the inner tube is provided with small holes for solid-liquid separation; the discharge device for the solid phase product is located at an end of the inner tube; and the intermediate tank for reaction mixture is connected to the outer tube of the tubular filter through a pipeline.

Method for Producing an Organic Electronic Component, and Organic Electronic Component

A metal complex is disclosed. In an embodiment a metal complex includes at least one metal atom M and at least one ligand L attached to the metal atom M, wherein the ligand L has the following structure:

##STR00001## wherein E.sup.1 and E.sup.2 are oxygen, wherein the substituent R.sup.1 is selected from the group consisting of branched or unbranched, fluorinated aliphatic hydrocarbons with 1 to 10 C atoms, wherein n=1 to 5, wherein the substituent R.sup.2 is selected from the group consisting of branched or unbranched aliphatic hydrocarbons with 1 to 10 C atoms, aryl and heteroaryl, wherein m>0 to at most 5−n, and wherein the metal M is a main group metal of groups 13 to 15 of the periodic table of elements.

METHOD FOR PREPARING BENZOFURAN DERIVATIVE
20210188822 · 2021-06-24 ·

Disclosed is a method for preparing a benzofuran derivative. In particular, provided is a method for preparing a benzofuran derivative, wherein according to the method provided, reaction steps required to synthesize the benzofuran substance in the prior art can be effectively shortened.

METHOD FOR PREPARING BENZOFURAN DERIVATIVE
20210188822 · 2021-06-24 ·

Disclosed is a method for preparing a benzofuran derivative. In particular, provided is a method for preparing a benzofuran derivative, wherein according to the method provided, reaction steps required to synthesize the benzofuran substance in the prior art can be effectively shortened.

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Disclosed is a resist composition including a compound represented by formula (I), a resin having an acid-labile group and an acid generator:

##STR00001##

wherein, in formula (I), R.sup.1 represents a halogen atom or an alkyl fluoride group having 1 to 6 carbon atoms, m1 represents an integer of 1 to 5, and when m1 is 2 or more, a plurality of R.sup.1 may be the same or different from each other.

RESIST COMPOSITION AND PATTERN FORMING PROCESS

A resist composition comprising a quencher containing a sulfonium salt having the formula (A).

##STR00001##

RESIST COMPOSITION AND PATTERN FORMING PROCESS

A resist composition comprising a quencher containing a sulfonium salt having the formula (A).

##STR00001##