A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, in which the resist composition contains a compound represented by General Formula (d0) in which R.sup.Ar represents an aromatic hydrocarbon group; t represents an integer of 1 or greater; R.sup.01 and R.sup.02 represent a chain hydrocarbon group; R.sup.03 represents a chain hydrocarbon group or a hydrogen atom; or two or more of R.sup.01, R.sup.02, and R.sup.03 are bonded to each other to form a ring structure; m represents an integer of 1 or greater; and M.sup.m+ represents an m-valent organic cation

##STR00001##

Object of the present invention is an improved process for the preparation of key intermediates for the synthesis of Eltrombopag, passing through/using intermediate 5-Chloro-2-hydroxy[1,1-biphenyl]-3-carboxylic acid alkaline metal salt of formula: wherein A is an alkaline metal. ##STR00001##

Object of the present invention is an improved process for the preparation of key intermediates for the synthesis of Eltrombopag, passing through/using intermediate 5-Chloro-2-hydroxy[1,1-biphenyl]-3-carboxylic acid alkaline metal salt of formula: wherein A is an alkaline metal. ##STR00001##

Object of the present invention is an improved process for the preparation of key intermediates for the synthesis of Eltrombopag, passing through/using intermediate 5-Chloro-2-hydroxy[1,1-biphenyl]-3-carboxylic acid alkaline metal salt of formula: wherein A is an alkaline metal. ##STR00001##